JPS62147340U - - Google Patents
Info
- Publication number
- JPS62147340U JPS62147340U JP1806587U JP1806587U JPS62147340U JP S62147340 U JPS62147340 U JP S62147340U JP 1806587 U JP1806587 U JP 1806587U JP 1806587 U JP1806587 U JP 1806587U JP S62147340 U JPS62147340 U JP S62147340U
- Authority
- JP
- Japan
- Prior art keywords
- utility
- model registration
- substrate
- detachment mechanism
- mechanism described
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 10
- 239000007787 solid Substances 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910002804 graphite Inorganic materials 0.000 claims 1
- 239000010439 graphite Substances 0.000 claims 1
- 210000000078 claw Anatomy 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1806587U JPS62147340U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-02-10 | 1987-02-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1806587U JPS62147340U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-02-10 | 1987-02-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62147340U true JPS62147340U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-09-17 |
Family
ID=30811403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1806587U Pending JPS62147340U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-02-10 | 1987-02-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62147340U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH021951A (ja) * | 1988-06-09 | 1990-01-08 | Nissin Electric Co Ltd | 真空内処理における板状処理物の冷却方法 |
| JPH09195037A (ja) * | 1996-01-09 | 1997-07-29 | Ulvac Japan Ltd | 加熱冷却装置及びこれを用いた真空処理装置 |
| JP2009200241A (ja) * | 2008-02-21 | 2009-09-03 | Ulvac Japan Ltd | 基板保持装置、基板ホルダ、真空処理装置、基板の温度制御方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53106576A (en) * | 1977-02-28 | 1978-09-16 | Nec Corp | Ion etching device |
| JPS56131930A (en) * | 1980-03-19 | 1981-10-15 | Hitachi Ltd | Controlling device of wafer temperature |
| JPS5713738A (en) * | 1980-06-27 | 1982-01-23 | Mitsubishi Electric Corp | Vapor-phase growing apparatus |
| JPS57145321A (en) * | 1981-03-03 | 1982-09-08 | Nec Corp | Dry etching device |
-
1987
- 1987-02-10 JP JP1806587U patent/JPS62147340U/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53106576A (en) * | 1977-02-28 | 1978-09-16 | Nec Corp | Ion etching device |
| JPS56131930A (en) * | 1980-03-19 | 1981-10-15 | Hitachi Ltd | Controlling device of wafer temperature |
| JPS5713738A (en) * | 1980-06-27 | 1982-01-23 | Mitsubishi Electric Corp | Vapor-phase growing apparatus |
| JPS57145321A (en) * | 1981-03-03 | 1982-09-08 | Nec Corp | Dry etching device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH021951A (ja) * | 1988-06-09 | 1990-01-08 | Nissin Electric Co Ltd | 真空内処理における板状処理物の冷却方法 |
| JPH09195037A (ja) * | 1996-01-09 | 1997-07-29 | Ulvac Japan Ltd | 加熱冷却装置及びこれを用いた真空処理装置 |
| JP2009200241A (ja) * | 2008-02-21 | 2009-09-03 | Ulvac Japan Ltd | 基板保持装置、基板ホルダ、真空処理装置、基板の温度制御方法 |