JPS6214218B2 - - Google Patents

Info

Publication number
JPS6214218B2
JPS6214218B2 JP57217496A JP21749682A JPS6214218B2 JP S6214218 B2 JPS6214218 B2 JP S6214218B2 JP 57217496 A JP57217496 A JP 57217496A JP 21749682 A JP21749682 A JP 21749682A JP S6214218 B2 JPS6214218 B2 JP S6214218B2
Authority
JP
Japan
Prior art keywords
main chamber
holder
chamber
carousel assembly
horizontally
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57217496A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59107071A (ja
Inventor
Hirotatsu Takeuchi
Toshio Mikitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Kohki Co Ltd
Original Assignee
Nitto Kohki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Kohki Co Ltd filed Critical Nitto Kohki Co Ltd
Priority to JP57217496A priority Critical patent/JPS59107071A/ja
Publication of JPS59107071A publication Critical patent/JPS59107071A/ja
Publication of JPS6214218B2 publication Critical patent/JPS6214218B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP57217496A 1982-12-12 1982-12-12 被処理物の外表面にスパッタリング膜を形成する装置 Granted JPS59107071A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57217496A JPS59107071A (ja) 1982-12-12 1982-12-12 被処理物の外表面にスパッタリング膜を形成する装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57217496A JPS59107071A (ja) 1982-12-12 1982-12-12 被処理物の外表面にスパッタリング膜を形成する装置

Publications (2)

Publication Number Publication Date
JPS59107071A JPS59107071A (ja) 1984-06-21
JPS6214218B2 true JPS6214218B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-04-01

Family

ID=16705143

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57217496A Granted JPS59107071A (ja) 1982-12-12 1982-12-12 被処理物の外表面にスパッタリング膜を形成する装置

Country Status (1)

Country Link
JP (1) JPS59107071A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2587731B1 (fr) * 1985-09-23 1988-01-08 Centre Nat Rech Scient Procede et dispositif de depot chimique de couches minces uniformes sur de nombreux substrats plans a partir d'une phase gazeuse
JP2013040357A (ja) * 2011-08-11 2013-02-28 Optorun Co Ltd 成膜装置
WO2019124098A1 (ja) * 2017-12-22 2019-06-27 株式会社村田製作所 成膜装置
JP6965942B2 (ja) 2017-12-22 2021-11-10 株式会社村田製作所 成膜装置
WO2019124101A1 (ja) * 2017-12-22 2019-06-27 株式会社村田製作所 成膜装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS572272A (en) * 1980-06-04 1982-01-07 Sumitomo Chem Co Ltd Preparation of n-phenylcyclopropanedicarboxylic acid imide derivative
JPS5917192B2 (ja) * 1980-08-05 1984-04-19 日本真空技術株式会社 真空処理装置

Also Published As

Publication number Publication date
JPS59107071A (ja) 1984-06-21

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