JPS6213812B2 - - Google Patents
Info
- Publication number
- JPS6213812B2 JPS6213812B2 JP14649676A JP14649676A JPS6213812B2 JP S6213812 B2 JPS6213812 B2 JP S6213812B2 JP 14649676 A JP14649676 A JP 14649676A JP 14649676 A JP14649676 A JP 14649676A JP S6213812 B2 JPS6213812 B2 JP S6213812B2
- Authority
- JP
- Japan
- Prior art keywords
- ring
- reaction tube
- reaction
- connecting ring
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012495 reaction gas Substances 0.000 claims description 8
- 239000007789 gas Substances 0.000 description 16
- 239000000498 cooling water Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 239000000376 reactant Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14649676A JPS5371567A (en) | 1976-12-08 | 1976-12-08 | Reaction equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14649676A JPS5371567A (en) | 1976-12-08 | 1976-12-08 | Reaction equipment |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12600585A Division JPS6127624A (ja) | 1985-06-12 | 1985-06-12 | 反応装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5371567A JPS5371567A (en) | 1978-06-26 |
JPS6213812B2 true JPS6213812B2 (enrdf_load_stackoverflow) | 1987-03-28 |
Family
ID=15408929
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14649676A Granted JPS5371567A (en) | 1976-12-08 | 1976-12-08 | Reaction equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5371567A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5944821A (ja) * | 1982-09-07 | 1984-03-13 | Toshiba Corp | 半導体熱処理容器 |
JPS6027690A (ja) * | 1983-07-25 | 1985-02-12 | Ulvac Corp | 気相エピタキシヤル成長用化学反応装置 |
-
1976
- 1976-12-08 JP JP14649676A patent/JPS5371567A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5371567A (en) | 1978-06-26 |
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