JPS62135449U - - Google Patents
Info
- Publication number
- JPS62135449U JPS62135449U JP2242686U JP2242686U JPS62135449U JP S62135449 U JPS62135449 U JP S62135449U JP 2242686 U JP2242686 U JP 2242686U JP 2242686 U JP2242686 U JP 2242686U JP S62135449 U JPS62135449 U JP S62135449U
- Authority
- JP
- Japan
- Prior art keywords
- conductivity type
- semiconductor substrate
- barrier metal
- contact region
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 10
- 230000004888 barrier function Effects 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 4
- 238000002955 isolation Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Electrodes Of Semiconductors (AREA)
Description
第1図は本考案の一実施例であるシヨツトキバ
リア半導体装置に使用されるチツプの断面図、第
2図は従来のシヨツトキバリア半導体装置に使用
されるチツプの断面図、第3図はシヨツトキバリ
ア半導体装置の等価回路図、第4図はシヨツトキ
バリア半導体装置に使用されるチツプをリードフ
レームに載置した時の概略図である。
1は半導体チツプ、2は半導体基板、3はエピ
タキシヤル層、4は分離領域、5は島領域、6は
ガード領域、7はコンタクト領域、8はバリアメ
タル電極、9,10,11は電極、12は基板支
持板である。
FIG. 1 is a sectional view of a chip used in a shot barrier semiconductor device which is an embodiment of the present invention, FIG. 2 is a sectional view of a chip used in a conventional shot barrier semiconductor device, and FIG. 3 is a sectional view of a chip used in a conventional shot barrier semiconductor device. The equivalent circuit diagram, FIG. 4, is a schematic diagram when a chip used in a shot barrier semiconductor device is mounted on a lead frame. 1 is a semiconductor chip, 2 is a semiconductor substrate, 3 is an epitaxial layer, 4 is an isolation region, 5 is an island region, 6 is a guard region, 7 is a contact region, 8 is a barrier metal electrode, 9, 10, 11 are electrodes, 12 is a substrate support plate.
Claims (1)
基板上に積層する逆導電型のエピタキシヤル層と
、該エピタキシヤル層に複数の島領域を形成する
一導電型の分離領域と、前記島領域それぞれに形
成するガード領域およびコンタクト領域と、前記
ガード領域間に形成されるバリアメタル電極と、
前記一方のコンタクト領域と他方のバリアメタル
電極とを接続する第1の電極と、前記他方のコン
タクト領域と接続する第2の電極と、前記一方の
バリアメタル電極と接続する第3の電極と、前記
第1乃至第3の電極にそれぞれ電気的に接続する
第1乃至第3のリードと、前記半導体基板を固着
する基板支持板とを具備することを特徴としたシ
ヨツトキバリア半導体装置。 a semiconductor substrate of at least one conductivity type; an epitaxial layer of an opposite conductivity type laminated on the semiconductor substrate; an isolation region of one conductivity type forming a plurality of island regions in the epitaxial layer; A guard region and a contact region to be formed, a barrier metal electrode to be formed between the guard regions,
a first electrode connecting the one contact region and the other barrier metal electrode, a second electrode connecting the other contact region, and a third electrode connecting the one barrier metal electrode; A shot barrier semiconductor device comprising first to third leads electrically connected to the first to third electrodes, respectively, and a substrate support plate to which the semiconductor substrate is fixed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2242686U JPS62135449U (en) | 1986-02-19 | 1986-02-19 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2242686U JPS62135449U (en) | 1986-02-19 | 1986-02-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62135449U true JPS62135449U (en) | 1987-08-26 |
Family
ID=30819797
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2242686U Pending JPS62135449U (en) | 1986-02-19 | 1986-02-19 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62135449U (en) |
-
1986
- 1986-02-19 JP JP2242686U patent/JPS62135449U/ja active Pending
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