JPS62135449U - - Google Patents

Info

Publication number
JPS62135449U
JPS62135449U JP2242686U JP2242686U JPS62135449U JP S62135449 U JPS62135449 U JP S62135449U JP 2242686 U JP2242686 U JP 2242686U JP 2242686 U JP2242686 U JP 2242686U JP S62135449 U JPS62135449 U JP S62135449U
Authority
JP
Japan
Prior art keywords
conductivity type
semiconductor substrate
barrier metal
contact region
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2242686U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2242686U priority Critical patent/JPS62135449U/ja
Publication of JPS62135449U publication Critical patent/JPS62135449U/ja
Pending legal-status Critical Current

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  • Electrodes Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例であるシヨツトキバ
リア半導体装置に使用されるチツプの断面図、第
2図は従来のシヨツトキバリア半導体装置に使用
されるチツプの断面図、第3図はシヨツトキバリ
ア半導体装置の等価回路図、第4図はシヨツトキ
バリア半導体装置に使用されるチツプをリードフ
レームに載置した時の概略図である。 1は半導体チツプ、2は半導体基板、3はエピ
タキシヤル層、4は分離領域、5は島領域、6は
ガード領域、7はコンタクト領域、8はバリアメ
タル電極、9,10,11は電極、12は基板支
持板である。
FIG. 1 is a sectional view of a chip used in a shot barrier semiconductor device which is an embodiment of the present invention, FIG. 2 is a sectional view of a chip used in a conventional shot barrier semiconductor device, and FIG. 3 is a sectional view of a chip used in a conventional shot barrier semiconductor device. The equivalent circuit diagram, FIG. 4, is a schematic diagram when a chip used in a shot barrier semiconductor device is mounted on a lead frame. 1 is a semiconductor chip, 2 is a semiconductor substrate, 3 is an epitaxial layer, 4 is an isolation region, 5 is an island region, 6 is a guard region, 7 is a contact region, 8 is a barrier metal electrode, 9, 10, 11 are electrodes, 12 is a substrate support plate.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 少なくとも一導電型の半導体基板と、該半導体
基板上に積層する逆導電型のエピタキシヤル層と
、該エピタキシヤル層に複数の島領域を形成する
一導電型の分離領域と、前記島領域それぞれに形
成するガード領域およびコンタクト領域と、前記
ガード領域間に形成されるバリアメタル電極と、
前記一方のコンタクト領域と他方のバリアメタル
電極とを接続する第1の電極と、前記他方のコン
タクト領域と接続する第2の電極と、前記一方の
バリアメタル電極と接続する第3の電極と、前記
第1乃至第3の電極にそれぞれ電気的に接続する
第1乃至第3のリードと、前記半導体基板を固着
する基板支持板とを具備することを特徴としたシ
ヨツトキバリア半導体装置。
a semiconductor substrate of at least one conductivity type; an epitaxial layer of an opposite conductivity type laminated on the semiconductor substrate; an isolation region of one conductivity type forming a plurality of island regions in the epitaxial layer; A guard region and a contact region to be formed, a barrier metal electrode to be formed between the guard regions,
a first electrode connecting the one contact region and the other barrier metal electrode, a second electrode connecting the other contact region, and a third electrode connecting the one barrier metal electrode; A shot barrier semiconductor device comprising first to third leads electrically connected to the first to third electrodes, respectively, and a substrate support plate to which the semiconductor substrate is fixed.
JP2242686U 1986-02-19 1986-02-19 Pending JPS62135449U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2242686U JPS62135449U (en) 1986-02-19 1986-02-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2242686U JPS62135449U (en) 1986-02-19 1986-02-19

Publications (1)

Publication Number Publication Date
JPS62135449U true JPS62135449U (en) 1987-08-26

Family

ID=30819797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2242686U Pending JPS62135449U (en) 1986-02-19 1986-02-19

Country Status (1)

Country Link
JP (1) JPS62135449U (en)

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