JPS6212947U - - Google Patents
Info
- Publication number
- JPS6212947U JPS6212947U JP10436785U JP10436785U JPS6212947U JP S6212947 U JPS6212947 U JP S6212947U JP 10436785 U JP10436785 U JP 10436785U JP 10436785 U JP10436785 U JP 10436785U JP S6212947 U JPS6212947 U JP S6212947U
- Authority
- JP
- Japan
- Prior art keywords
- heat treatment
- wafer
- treatment chamber
- semiconductor manufacturing
- model registration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 claims description 11
- 230000002265 prevention Effects 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims 3
- 239000004065 semiconductor Substances 0.000 claims 3
- 239000011521 glass Substances 0.000 claims 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985104367U JPH0510354Y2 (US20090163788A1-20090625-C00002.png) | 1985-07-08 | 1985-07-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985104367U JPH0510354Y2 (US20090163788A1-20090625-C00002.png) | 1985-07-08 | 1985-07-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6212947U true JPS6212947U (US20090163788A1-20090625-C00002.png) | 1987-01-26 |
| JPH0510354Y2 JPH0510354Y2 (US20090163788A1-20090625-C00002.png) | 1993-03-15 |
Family
ID=30977798
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985104367U Expired - Lifetime JPH0510354Y2 (US20090163788A1-20090625-C00002.png) | 1985-07-08 | 1985-07-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0510354Y2 (US20090163788A1-20090625-C00002.png) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001060565A (ja) * | 1999-08-20 | 2001-03-06 | Lintec Corp | 光照射装置及びこれを用いたピックアップ装置 |
| WO2006087777A1 (ja) * | 2005-02-16 | 2006-08-24 | Youtec Co., Ltd. | 加圧式ランプアニール装置、加圧式ランプアニール処理方法、薄膜及び電子部品 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS567436A (en) * | 1979-06-29 | 1981-01-26 | Sony Corp | High pressure treating device |
| JPS58143520A (ja) * | 1982-02-22 | 1983-08-26 | Toshiba Corp | 半導体結晶の熱処理方法 |
| JPS59178718A (ja) * | 1983-03-29 | 1984-10-11 | Sony Corp | 半導体基体の処理装置 |
| JPS60104366A (ja) * | 1983-10-24 | 1985-06-08 | Yokogawa Hewlett Packard Ltd | プリンタにおけるトラクタ駆動装置 |
-
1985
- 1985-07-08 JP JP1985104367U patent/JPH0510354Y2/ja not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS567436A (en) * | 1979-06-29 | 1981-01-26 | Sony Corp | High pressure treating device |
| JPS58143520A (ja) * | 1982-02-22 | 1983-08-26 | Toshiba Corp | 半導体結晶の熱処理方法 |
| JPS59178718A (ja) * | 1983-03-29 | 1984-10-11 | Sony Corp | 半導体基体の処理装置 |
| JPS60104366A (ja) * | 1983-10-24 | 1985-06-08 | Yokogawa Hewlett Packard Ltd | プリンタにおけるトラクタ駆動装置 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001060565A (ja) * | 1999-08-20 | 2001-03-06 | Lintec Corp | 光照射装置及びこれを用いたピックアップ装置 |
| WO2006087777A1 (ja) * | 2005-02-16 | 2006-08-24 | Youtec Co., Ltd. | 加圧式ランプアニール装置、加圧式ランプアニール処理方法、薄膜及び電子部品 |
| JPWO2006087777A1 (ja) * | 2005-02-16 | 2008-08-07 | 株式会社ユーテック | 加圧式ランプアニール装置、加圧式ランプアニール処理方法、薄膜及び電子部品 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0510354Y2 (US20090163788A1-20090625-C00002.png) | 1993-03-15 |
