JPS6212618Y2 - - Google Patents
Info
- Publication number
- JPS6212618Y2 JPS6212618Y2 JP16143281U JP16143281U JPS6212618Y2 JP S6212618 Y2 JPS6212618 Y2 JP S6212618Y2 JP 16143281 U JP16143281 U JP 16143281U JP 16143281 U JP16143281 U JP 16143281U JP S6212618 Y2 JPS6212618 Y2 JP S6212618Y2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- mask
- heating resistor
- alignment
- common electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 44
- 238000000206 photolithography Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 11
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
Landscapes
- Electronic Switches (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16143281U JPS5864453U (ja) | 1981-10-28 | 1981-10-28 | サ−マルヘツド用マスクパタ−ン |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16143281U JPS5864453U (ja) | 1981-10-28 | 1981-10-28 | サ−マルヘツド用マスクパタ−ン |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5864453U JPS5864453U (ja) | 1983-04-30 |
| JPS6212618Y2 true JPS6212618Y2 (enrdf_load_html_response) | 1987-04-01 |
Family
ID=29953802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16143281U Granted JPS5864453U (ja) | 1981-10-28 | 1981-10-28 | サ−マルヘツド用マスクパタ−ン |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5864453U (enrdf_load_html_response) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0737173B2 (ja) * | 1985-06-19 | 1995-04-26 | 大日本印刷株式会社 | 部分金属薄膜層を有する転写シ−トの製造方法 |
-
1981
- 1981-10-28 JP JP16143281U patent/JPS5864453U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5864453U (ja) | 1983-04-30 |
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