JPS6212601B2 - - Google Patents

Info

Publication number
JPS6212601B2
JPS6212601B2 JP7065479A JP7065479A JPS6212601B2 JP S6212601 B2 JPS6212601 B2 JP S6212601B2 JP 7065479 A JP7065479 A JP 7065479A JP 7065479 A JP7065479 A JP 7065479A JP S6212601 B2 JPS6212601 B2 JP S6212601B2
Authority
JP
Japan
Prior art keywords
mesh
insulating material
dielectric
irradiated
conductive mesh
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7065479A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55163703A (en
Inventor
Tooru Toida
Tanji Hoshino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP7065479A priority Critical patent/JPS55163703A/ja
Publication of JPS55163703A publication Critical patent/JPS55163703A/ja
Publication of JPS6212601B2 publication Critical patent/JPS6212601B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Inorganic Insulating Materials (AREA)
JP7065479A 1979-06-07 1979-06-07 Method of manufacturing dielectric mesh Granted JPS55163703A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7065479A JPS55163703A (en) 1979-06-07 1979-06-07 Method of manufacturing dielectric mesh

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7065479A JPS55163703A (en) 1979-06-07 1979-06-07 Method of manufacturing dielectric mesh

Publications (2)

Publication Number Publication Date
JPS55163703A JPS55163703A (en) 1980-12-20
JPS6212601B2 true JPS6212601B2 (enExample) 1987-03-19

Family

ID=13437848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7065479A Granted JPS55163703A (en) 1979-06-07 1979-06-07 Method of manufacturing dielectric mesh

Country Status (1)

Country Link
JP (1) JPS55163703A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0667416U (ja) * 1993-03-05 1994-09-22 株式会社ジュニアー ハンガー商品の情報処理装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201432380A (zh) * 2013-02-06 2014-08-16 Univ Nat Taiwan 形成光阻結構之方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0667416U (ja) * 1993-03-05 1994-09-22 株式会社ジュニアー ハンガー商品の情報処理装置

Also Published As

Publication number Publication date
JPS55163703A (en) 1980-12-20

Similar Documents

Publication Publication Date Title
US3113896A (en) Electron beam masking for etching electrical circuits
DE2518451C2 (de) Aufzeichnungsmaterial zur Erzeugung von Metallbildern
JPH033378B2 (enExample)
US4619894A (en) Solid-transformation thermal resist
KR100626037B1 (ko) 마스크 세정방법
DE2726813C2 (de) Verfahren zur Herstellung eines mit einem Muster versehenen Substrats
US4195108A (en) Electrolithographic process which makes it possible to improve the sensitivity of masking resins, and a mask obtained by this kind of process
US5269890A (en) Electrochemical process and product therefrom
JPS6212601B2 (enExample)
US4045318A (en) Method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer
JPH08512170A (ja) 電子的絶縁材料の板内のパターンに従って配される孔の少なくとも内側をフォトリソグラフ的に金属化する方法
DE1521313A1 (de) Verfahren zum Herstellen duenner Schichten
US3272670A (en) Two-stable, high-resolution electronactuated resists
US3434940A (en) Process for making thin-film temperature sensors
JPS6137774B2 (enExample)
JPH0122976B2 (enExample)
US4647523A (en) Production of a resist image
JP3117687B2 (ja) 絞りプレートおよびその処理方法
SU1019017A1 (ru) Свободна маска дл напылени пленочных элементов и способ ее изготовлени
JPS58132927A (ja) パタ−ン形成方法
DE2416543A1 (de) Verfahren zum bilden eines elektronennegativlackmusters
CN116568124A (zh) 一种约瑟夫森结的制备方法
JPS63190396A (ja) 導電層の形成方法
JPH0762228B2 (ja) 電子線レジスト及びその製造方法
JPH0458170B2 (enExample)