JPS62123464A - 光メモリ素子基板製造用フオトマスク - Google Patents

光メモリ素子基板製造用フオトマスク

Info

Publication number
JPS62123464A
JPS62123464A JP60263316A JP26331685A JPS62123464A JP S62123464 A JPS62123464 A JP S62123464A JP 60263316 A JP60263316 A JP 60263316A JP 26331685 A JP26331685 A JP 26331685A JP S62123464 A JPS62123464 A JP S62123464A
Authority
JP
Japan
Prior art keywords
film
mask
photomask
ultra
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60263316A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0517542B2 (enrdf_load_stackoverflow
Inventor
Kenji Oota
賢司 太田
Junji Hirokane
順司 広兼
Akira Takahashi
明 高橋
Tetsuya Inui
哲也 乾
Hiroyuki Katayama
博之 片山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP60263316A priority Critical patent/JPS62123464A/ja
Priority to US06/930,157 priority patent/US4764441A/en
Publication of JPS62123464A publication Critical patent/JPS62123464A/ja
Publication of JPH0517542B2 publication Critical patent/JPH0517542B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Manufacturing Optical Record Carriers (AREA)
JP60263316A 1985-11-22 1985-11-22 光メモリ素子基板製造用フオトマスク Granted JPS62123464A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60263316A JPS62123464A (ja) 1985-11-22 1985-11-22 光メモリ素子基板製造用フオトマスク
US06/930,157 US4764441A (en) 1985-11-22 1986-11-12 Photo-mask for production of substrate for optical memory element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60263316A JPS62123464A (ja) 1985-11-22 1985-11-22 光メモリ素子基板製造用フオトマスク

Publications (2)

Publication Number Publication Date
JPS62123464A true JPS62123464A (ja) 1987-06-04
JPH0517542B2 JPH0517542B2 (enrdf_load_stackoverflow) 1993-03-09

Family

ID=17387785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60263316A Granted JPS62123464A (ja) 1985-11-22 1985-11-22 光メモリ素子基板製造用フオトマスク

Country Status (1)

Country Link
JP (1) JPS62123464A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01149243A (ja) * 1987-12-04 1989-06-12 Sharp Corp ディスク状光記録媒体の製造方法および製造用フォトマスク
JPH01243062A (ja) * 1988-03-24 1989-09-27 Nikon Corp フォトマスク

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5517152A (en) * 1978-07-25 1980-02-06 Fujitsu Ltd Photo mask

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5517152A (en) * 1978-07-25 1980-02-06 Fujitsu Ltd Photo mask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01149243A (ja) * 1987-12-04 1989-06-12 Sharp Corp ディスク状光記録媒体の製造方法および製造用フォトマスク
JPH01243062A (ja) * 1988-03-24 1989-09-27 Nikon Corp フォトマスク

Also Published As

Publication number Publication date
JPH0517542B2 (enrdf_load_stackoverflow) 1993-03-09

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees