JPS621231A - Ｘ線露光転写用マスク - Google Patents

Ｘ線露光転写用マスク

Info

Publication number
JPS621231A
JPS621231A JP61109500A JP10950086A JPS621231A JP S621231 A JPS621231 A JP S621231A JP 61109500 A JP61109500 A JP 61109500A JP 10950086 A JP10950086 A JP 10950086A JP S621231 A JPS621231 A JP S621231A
Authority
JP
Japan
Prior art keywords
ray
shielding plate
exposure
thin film
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61109500A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6219055B2 (enExample
Inventor
Shoichi Tanimoto
谷本　昭一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP61109500A priority Critical patent/JPS621231A/ja
Publication of JPS621231A publication Critical patent/JPS621231A/ja
Publication of JPS6219055B2 publication Critical patent/JPS6219055B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP61109500A 1986-05-15 1986-05-15 Ｘ線露光転写用マスク Granted JPS621231A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61109500A JPS621231A (ja) 1986-05-15 1986-05-15 Ｘ線露光転写用マスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61109500A JPS621231A (ja) 1986-05-15 1986-05-15 Ｘ線露光転写用マスク

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP57142117A Division JPS5932131A (ja) 1982-08-18 1982-08-18 Ｘ線露光転写法および転写用マスク

Publications (2)

Publication Number Publication Date
JPS621231A true JPS621231A (ja) 1987-01-07
JPS6219055B2 JPS6219055B2 (enExample) 1987-04-25

Family

ID=14511832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61109500A Granted JPS621231A (ja) 1986-05-15 1986-05-15 Ｘ線露光転写用マスク

Country Status (1)

Country Link
JP (1) JPS621231A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02218992A (ja) * 1989-02-20 1990-08-31 Miyota Seimitsu Kk ペースチェッカー

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02218992A (ja) * 1989-02-20 1990-08-31 Miyota Seimitsu Kk ペースチェッカー

Also Published As

Publication number Publication date
JPS6219055B2 (enExample) 1987-04-25

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