JPS6212309B2 - - Google Patents
Info
- Publication number
- JPS6212309B2 JPS6212309B2 JP9105980A JP9105980A JPS6212309B2 JP S6212309 B2 JPS6212309 B2 JP S6212309B2 JP 9105980 A JP9105980 A JP 9105980A JP 9105980 A JP9105980 A JP 9105980A JP S6212309 B2 JPS6212309 B2 JP S6212309B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- thin plate
- metal film
- etched
- anisotropic thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 claims description 77
- 239000002184 metal Substances 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 15
- 239000013078 crystal Substances 0.000 description 14
- 239000000463 material Substances 0.000 description 9
- 239000007788 liquid Substances 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 2
- 230000000593 degrading effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9105980A JPS5716171A (en) | 1980-07-03 | 1980-07-03 | Etching method of etching anisotropic wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9105980A JPS5716171A (en) | 1980-07-03 | 1980-07-03 | Etching method of etching anisotropic wafer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5716171A JPS5716171A (en) | 1982-01-27 |
| JPS6212309B2 true JPS6212309B2 (zh) | 1987-03-18 |
Family
ID=14015921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9105980A Granted JPS5716171A (en) | 1980-07-03 | 1980-07-03 | Etching method of etching anisotropic wafer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5716171A (zh) |
-
1980
- 1980-07-03 JP JP9105980A patent/JPS5716171A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5716171A (en) | 1982-01-27 |
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