JPS6212169B2 - - Google Patents
Info
- Publication number
- JPS6212169B2 JPS6212169B2 JP21318183A JP21318183A JPS6212169B2 JP S6212169 B2 JPS6212169 B2 JP S6212169B2 JP 21318183 A JP21318183 A JP 21318183A JP 21318183 A JP21318183 A JP 21318183A JP S6212169 B2 JPS6212169 B2 JP S6212169B2
- Authority
- JP
- Japan
- Prior art keywords
- hydrogen silicide
- monosilane
- ultra
- hydrogen
- silicide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000001257 hydrogen Substances 0.000 claims description 39
- 229910052739 hydrogen Inorganic materials 0.000 claims description 39
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 36
- 229910021332 silicide Inorganic materials 0.000 claims description 35
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 32
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 22
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- 239000010703 silicon Substances 0.000 claims description 12
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 claims description 11
- 239000012494 Quartz wool Substances 0.000 claims description 8
- 238000000746 purification Methods 0.000 claims description 7
- 238000000354 decomposition reaction Methods 0.000 claims description 6
- -1 hydrogen silicide compound Chemical class 0.000 claims description 4
- 239000000843 powder Substances 0.000 claims description 3
- 238000005979 thermal decomposition reaction Methods 0.000 claims 1
- 239000010453 quartz Substances 0.000 description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 23
- 239000007789 gas Substances 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000000945 filler Substances 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 238000004821 distillation Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000003463 adsorbent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Silicon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21318183A JPS60108312A (ja) | 1983-11-15 | 1983-11-15 | けい化水素の超精製方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21318183A JPS60108312A (ja) | 1983-11-15 | 1983-11-15 | けい化水素の超精製方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60108312A JPS60108312A (ja) | 1985-06-13 |
| JPS6212169B2 true JPS6212169B2 (enrdf_load_stackoverflow) | 1987-03-17 |
Family
ID=16634882
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21318183A Granted JPS60108312A (ja) | 1983-11-15 | 1983-11-15 | けい化水素の超精製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60108312A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4361713B2 (ja) * | 2002-03-29 | 2009-11-11 | 株式会社日立国際電気 | 基板処理装置 |
| CN102502653A (zh) * | 2011-12-14 | 2012-06-20 | 浙江赛林硅业有限公司 | 一种生产高纯乙硅烷的系统及其方法 |
-
1983
- 1983-11-15 JP JP21318183A patent/JPS60108312A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60108312A (ja) | 1985-06-13 |
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