JPS62120347U

JPS62120347U -

Info

Publication number: JPS62120347U
Application number: JP804186U
Authority: JP
Priority date: 1986-01-23
Filing date: 1986-01-23
Publication date: 1987-07-30
Also published as: JPH0342678Y2

Description

[Brief explanation of the drawing]

第１図は本考案による装置の要部を示す側面図
、第２図は本考案の装置を用いて半導体ウエハを
酸化するため代表的なタイムチヤートと各モード
に対応するバルブ操作の手順を示した表、第３図
、第４図は従来装置の要部を示した側面図である
。１，１ａ……純水、２……加熱槽、３……スチ
ーム導入管、４……キヤリアガス回路、５……三
方バルブ、６……反応管、７……ヒータ、８，１
３……給水管、８ａ，１３ａ……給水バルブ、９
，１４……排水管、９ａ，１４ａ……排水バルブ
、１０……予備槽、１１……ブローバルブ、１２
……連結管、１５，１６……不活性ガス導入管、
１５ａ，１６ａ……パージバルブ、１７……ベン
ト管。 Figure 1 is a side view showing the main parts of the apparatus according to the present invention, and Figure 2 is a typical time chart and valve operation procedures corresponding to each mode for oxidizing semiconductor wafers using the apparatus according to the present invention. Table 1, FIGS. 3 and 4 are side views showing the main parts of the conventional device. 1, 1a...Pure water, 2...Heating tank, 3...Steam introduction pipe, 4...Carrier gas circuit, 5...Three-way valve, 6...Reaction tube, 7...Heater, 8,1
3... Water supply pipe, 8a, 13a... Water supply valve, 9
, 14... Drain pipe, 9a, 14a... Drain valve, 10... Reserve tank, 11... Blow valve, 12
... Connecting pipe, 15, 16 ... Inert gas introduction pipe,
15a, 16a... purge valve, 17... vent pipe.

Claims

[Scope of utility model registration request]

A steam gas generator that oxidizes semiconductor wafers by guiding steam generated by heating pure water into a reaction tube containing semiconductor wafers at an oxidation temperature using a carrier gas, and which is connected to a heating tank by a connecting pipe having a blow valve. The heating tank consists of a water supply pipe and a drain pipe that circulate pure water, a heater that heats the pure water and generates steam, a steam introduction pipe, and a three-way valve connected to the steam introduction pipe, with one end connected to the reaction pipe. It is equipped with a carrier gas circuit to be connected, an inert gas introduction pipe that flows inert gas to prevent the intrusion of outside air using a purge valve, a water supply pipe and a drain pipe that circulate pure water, and a purge valve to prevent outside air from entering the reserve tank. A steam gas generator for oxidizing semiconductor wafers, comprising: an inert gas introduction pipe through which inert gas flows to prevent inert gas from entering; and a vent pipe through which steam introduced from a heating tank through a connecting pipe is discharged to the outside.