JPH0253967U - - Google Patents
Info
- Publication number
- JPH0253967U JPH0253967U JP13260188U JP13260188U JPH0253967U JP H0253967 U JPH0253967 U JP H0253967U JP 13260188 U JP13260188 U JP 13260188U JP 13260188 U JP13260188 U JP 13260188U JP H0253967 U JPH0253967 U JP H0253967U
- Authority
- JP
- Japan
- Prior art keywords
- ozone gas
- etching solution
- aeration pipe
- oxygen supply
- adjusting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 238000005273 aeration Methods 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 230000001172 regenerating effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
Description
第１図は本考案の一実施例を示す全体構成図お
よび第２図は再生処理作用を説明するための図で
ある。
１…液槽、２…酸素供給手段、３…オゾンガス
発生手段、８…散気管、１０…調整手段。
FIG. 1 is an overall configuration diagram showing an embodiment of the present invention, and FIG. 2 is a diagram for explaining the regeneration processing operation. DESCRIPTION OF SYMBOLS 1...Liquid tank, 2...Oxygen supply means, 3...Ozone gas generation means, 8...Aeration pipe, 10...Adjustment means.
Claims (1)
れた酸素に酸化してオゾンガスを発生させるオゾ
ンガス発生手段と、発生されたオゾンガスを槽内
の過マンガン酸系エツチング液中に散気する散気
管と、この散気管から散気するオゾンガスの濃度
および流量の少なくともいずれか一方を調整する
調整手段とを備えてなる過マンガン酸系エツチン
グ液の再生装置。 an oxygen supply means, an ozone gas generation means for generating ozone gas by oxidizing the oxygen supplied from the oxygen supply means, and an aeration pipe for diffusing the generated ozone gas into a permanganate-based etching solution in a tank; A regenerating device for a permanganic acid etching solution, comprising adjusting means for adjusting at least one of the concentration and flow rate of ozone gas diffused from the aeration pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13260188U JPH0253967U (en) | 1988-10-11 | 1988-10-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13260188U JPH0253967U (en) | 1988-10-11 | 1988-10-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0253967U true JPH0253967U (en) | 1990-04-18 |
Family
ID=31389713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13260188U Pending JPH0253967U (en) | 1988-10-11 | 1988-10-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0253967U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014525680A (en) * | 2011-08-26 | 2014-09-29 | アトテツク・ドイチユラント・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Method for processing a plastic substrate and apparatus for at least partially regenerating a processing solution |
| JP5830807B2 (en) * | 2013-10-22 | 2015-12-09 | 奥野製薬工業株式会社 | Composition for etching treatment of resin material |
-
1988
- 1988-10-11 JP JP13260188U patent/JPH0253967U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014525680A (en) * | 2011-08-26 | 2014-09-29 | アトテツク・ドイチユラント・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Method for processing a plastic substrate and apparatus for at least partially regenerating a processing solution |
| JP5830807B2 (en) * | 2013-10-22 | 2015-12-09 | 奥野製薬工業株式会社 | Composition for etching treatment of resin material |
| US9657226B2 (en) | 2013-10-22 | 2017-05-23 | Okuno Chemical Industries Co., Ltd. | Composition for etching treatment of resin material |
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