JPS61146945U - - Google Patents
Info
- Publication number
- JPS61146945U JPS61146945U JP2779086U JP2779086U JPS61146945U JP S61146945 U JPS61146945 U JP S61146945U JP 2779086 U JP2779086 U JP 2779086U JP 2779086 U JP2779086 U JP 2779086U JP S61146945 U JPS61146945 U JP S61146945U
- Authority
- JP
- Japan
- Prior art keywords
- tube
- hydrogen
- furnace
- furnace core
- tip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000002485 combustion reaction Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 claims 1
- 239000007789 gas Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
Description
第１図は従来装置の縦断面図、第２図のａ，ｂ
は従来装置における水素を燃焼させない場合と燃
焼させた場合の温度分布をそれぞれ示すグラフ、
第３図は本考案の一実施例を示す縦断面図である
。
１…酸素、２…水素、３ａ，３ｂ…炉芯管、４
ａ，４ｂ…気体流入端、５…酸素流入管、６…水
素流入管、７…酸化炉、８…酸化炉の一端、９…
炎、１０…ボート、１１…ウエーハ、１２…ヒー
ター挿入用石英管、１３…ヒーター、１４…電源
。
Figure 1 is a longitudinal sectional view of the conventional device, and Figure 2 a and b.
are graphs showing the temperature distribution when hydrogen is not combusted and when hydrogen is combusted in the conventional device, respectively.
FIG. 3 is a longitudinal sectional view showing an embodiment of the present invention. 1... Oxygen, 2... Hydrogen, 3a, 3b... Furnace tube, 4
a, 4b... Gas inflow end, 5... Oxygen inflow pipe, 6... Hydrogen inflow pipe, 7... Oxidation furnace, 8... One end of oxidation furnace, 9...
Flame, 10...boat, 11...wafer, 12...quartz tube for heater insertion, 13...heater, 14...power supply.
Claims (1)
端から酸素と水素を流入し、該水素の燃焼により
発生する水蒸気で炉芯管内の半導体ウエーハを酸
化せしめる熱酸化装置において、前記炉芯管の一
端から炉芯管内に突出する水素流入管の先端を酸
化炉との間に一定距離を置いて位置させると共に
該水素流入管の先端近傍にヒーターを石英管で被
つてなる着火手段を設けたことを特徴とする熱酸
化装置。 In a thermal oxidation apparatus, oxygen and hydrogen are introduced from one end of a furnace core tube installed through the center of the oxidation furnace, and the semiconductor wafers in the furnace core tube are oxidized with steam generated by combustion of the hydrogen. The tip of a hydrogen inflow tube protruding into the furnace core tube from one end of the tube is positioned at a certain distance from the oxidation furnace, and ignition means is provided near the tip of the hydrogen inflow tube by covering a heater with a quartz tube. A thermal oxidation device characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2779086U JPS61146945U (en) | 1986-02-27 | 1986-02-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2779086U JPS61146945U (en) | 1986-02-27 | 1986-02-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61146945U true JPS61146945U (en) | 1986-09-10 |
Family
ID=30525067
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2779086U Pending JPS61146945U (en) | 1986-02-27 | 1986-02-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61146945U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53123667A (en) * | 1977-04-04 | 1978-10-28 | Mitsubishi Electric Corp | Generator for semiconuctor oxidized film |
-
1986
- 1986-02-27 JP JP2779086U patent/JPS61146945U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53123667A (en) * | 1977-04-04 | 1978-10-28 | Mitsubishi Electric Corp | Generator for semiconuctor oxidized film |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS61146945U (en) | ||
| JPH0171442U (en) | ||
| JPS6214131Y2 (en) | ||
| JPH01161326U (en) | ||
| JPS62118916U (en) | ||
| JPS6422031U (en) | ||
| JPS6273535U (en) | ||
| JPH01156545U (en) | ||
| JPS6293361U (en) | ||
| KR890007566Y1 (en) | Secondary-air heating device | |
| JPS6217475Y2 (en) | ||
| JPS60149132U (en) | Semiconductor heat treatment furnace | |
| JPH0220051U (en) | ||
| JPS62131225U (en) | ||
| JPS63155630U (en) | ||
| JPS62204112U (en) | ||
| JPS6311171U (en) | ||
| JPH0194757U (en) | ||
| JPS63179449U (en) | ||
| JPS6350873U (en) | ||
| JPS6175126U (en) | ||
| JPH02106822U (en) | ||
| JPS6312831U (en) | ||
| JPS63116737U (en) | ||
| JPS5497368A (en) | Thermal oxidizing unit |