JPS62119263A - Epoxy resin composition for sealing semiconductor - Google Patents

Epoxy resin composition for sealing semiconductor

Info

Publication number
JPS62119263A
JPS62119263A JP25760885A JP25760885A JPS62119263A JP S62119263 A JPS62119263 A JP S62119263A JP 25760885 A JP25760885 A JP 25760885A JP 25760885 A JP25760885 A JP 25760885A JP S62119263 A JPS62119263 A JP S62119263A
Authority
JP
Japan
Prior art keywords
epoxy resin
parts
polypropylene powder
resin composition
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25760885A
Other languages
Japanese (ja)
Inventor
Azuma Matsuura
東 松浦
Kota Nishii
耕太 西井
Yasuhiro Yoneda
泰博 米田
Kazumasa Saito
斎藤 和正
Masashi Miyagawa
昌士 宮川
Shunichi Fukuyama
俊一 福山
Shoji Shiba
昭二 芝
Yoko Kawasaki
陽子 川崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP25760885A priority Critical patent/JPS62119263A/en
Publication of JPS62119263A publication Critical patent/JPS62119263A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:An epoxy resin composition, containing polypropylene powder and useful as a resin having high water resistance and low stress at the same time for sealing semiconductors. CONSTITUTION:An epoxy resin composition obtained by blending 1-20pts.wt. polypropylene powder with 100pts.wt. epoxy resin. The polypropylene powder to be used has >=140 deg.C melting point. 250-500pts.wt. inorganic filler and 20-100 pts.wt. curing agent having phenolic hydroxyl groups are further blended to give the aimed composition. The polypropylene powder has preferably the melting point about equal to or higher than the molding temperature or after-curing temperature. Novolak type resin is preferably used as the epoxy resin and silica is preferably used as the filler. Phenolic novolak is preferred for the curing agent.

Description

【発明の詳細な説明】 〔発明の概要〕 本発明はポリプロピレンを含有する半導体封止用エポキ
シ樹脂組成物を提供するもので高耐水性、低応力特性を
有する。
DETAILED DESCRIPTION OF THE INVENTION [Summary of the Invention] The present invention provides an epoxy resin composition for semiconductor encapsulation containing polypropylene, which has high water resistance and low stress characteristics.

〔産業上の利用分野〕[Industrial application field]

本発明は半導体封止用エポキシ樹脂組成物に係り、特に
ポリプロピレンを含有する高耐水性、低応力の半導体封
止用エポキシ樹脂組成物に関する。
The present invention relates to an epoxy resin composition for semiconductor encapsulation, and more particularly to an epoxy resin composition for semiconductor encapsulation that contains polypropylene and has high water resistance and low stress.

〔従来技術と問題点〕[Prior art and problems]

従来、半導体などの電気部品や電気機器の封止用樹脂と
してはエポキシ系、シリコーン系フェノール系などの材
料が使用されてきた。その中でも、フェノールノボラッ
ク樹脂を硬化剤とするエポキシ樹脂組成物が電気特性、
耐水性、金属インサートに対する接着性などが均衡して
いる点ですぐれており、封止用樹脂の主流となっている
Conventionally, materials such as epoxy, silicone, and phenolic materials have been used as sealing resins for electrical parts and devices such as semiconductors. Among them, epoxy resin compositions using phenol novolac resin as a curing agent have good electrical properties and
It has an excellent balance of water resistance and adhesion to metal inserts, making it the mainstream sealing resin.

このような半導体部品等は半導体パターンの倣細化ある
いは半導体チップの大型化が進みこれに伴いより低応力
でしかも耐水性に優れた半導体対土用樹脂が要求されて
いる。
In such semiconductor parts, semiconductor patterns have become thinner and semiconductor chips have become larger, and as a result, there has been a demand for resins for use with semiconductors that have lower stress and excellent water resistance.

従来、封止用樹脂組成物の応力を小さくする方法として
は、架橋密度を低下させたり可とう剤を添加するなどの
方法がある。しかしこれらの方法では耐水性が劣化する
という問題があった。また充填剤の添加量を増加して線
膨張係数を小さくすることも考えられるが、この方法で
は、流動性が低下し、ボンディングワイヤのワイヤオー
プン(断′a)などの不良がおこる。
Conventionally, methods for reducing stress in a sealing resin composition include reducing the crosslinking density and adding a flexibilizing agent. However, these methods have the problem of deteriorating water resistance. It is also possible to reduce the coefficient of linear expansion by increasing the amount of filler added, but this method lowers the fluidity and causes defects such as wire open (breakage 'a) of the bonding wire.

一方封止用樹脂組成物の耐水性を向上させるために架橋
密度を上げると樹脂が硬くなり応力が大きくなる。この
ように低応力と高耐水性を同時に実現するのは従来技術
では困難であった。
On the other hand, if the crosslinking density is increased in order to improve the water resistance of the sealing resin composition, the resin will become harder and stress will increase. It has been difficult with conventional techniques to simultaneously achieve such low stress and high water resistance.

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点は本発明によればポリプロピレン粉末を含む
ことを特徴とする半導体封止用エポキシ樹脂組成物によ
って解決される。
According to the present invention, the above problems are solved by an epoxy resin composition for semiconductor encapsulation characterized by containing polypropylene powder.

本発明では上記ポリプロピレン粉末を、前記エポキシ樹
脂100重量部に対して1〜20重量部含ませるのが成
型時あるいはキュア後に適当な硬度を得る上で望ましい
In the present invention, it is desirable to contain 1 to 20 parts by weight of the polypropylene powder per 100 parts by weight of the epoxy resin in order to obtain appropriate hardness during molding or after curing.

またそのポリプロピレン粉末の融点が140”C以上で
あることがIC,LSI等を低圧トランスファ成形する
時、あるいはアフターキュア時の温度が少なくとも15
0℃以上であるために好ましく、特に該成型温度あるい
はアフターキュア温度と同程度あるいはそれ以上の温度
の融点であることが好ましい。
In addition, the melting point of the polypropylene powder must be 140"C or higher when low-pressure transfer molding of ICs, LSIs, etc. or the temperature during after-curing must be at least 15"C.
It is preferable to have a melting point of 0° C. or higher, and it is particularly preferable that the melting point is about the same as or higher than the molding temperature or after-cure temperature.

また本発明では該エポキシ樹脂100重量部に対して無
機質充填剤250〜500重量部含むことが、250重
量部未満では線膨張係数を大にし、500重量部を超え
る場合流動性を悪化するために好ましい。
Furthermore, in the present invention, 250 to 500 parts by weight of the inorganic filler is contained per 100 parts by weight of the epoxy resin, because if it is less than 250 parts by weight, the coefficient of linear expansion will increase, and if it exceeds 500 parts by weight, the fluidity will deteriorate. preferable.

また本発明ではフェノール性水酸基を有する硬化剤20
〜100重量部を含むことがエポキシ樹脂との良好な硬
化反応の点から好ましい。
In addition, in the present invention, the curing agent 20 having a phenolic hydroxyl group is
It is preferable to include 100 parts by weight from the viewpoint of a good curing reaction with the epoxy resin.

すなわち、本発明は、エポキシ樹脂が成形時に硬化収縮
する際に生ずる応力を、流動状態、あるいは溶融状態に
あるポリプロピレンが緩和するという性質を使用して減
少させるようにしたものである。
That is, the present invention uses the property of polypropylene in a fluid or molten state to relax the stress generated when the epoxy resin cures and shrinks during molding.

またポリプロピレンは分子内に水酸基などの親水基を含
まず耐水性に優れるという利点がある。
Further, polypropylene has the advantage of not containing hydrophilic groups such as hydroxyl groups in its molecules and has excellent water resistance.

本発明におけるエポキシ樹脂としては電気特性、耐水性
、成形性の面からノボラック型エポキシ樹脂が好ましい
。また無機質充填剤としてはシリカ、アルミナなど熱放
散性の良いものが望ましい。フェノール性水酸基を有す
る硬化剤としてはフェノールノボラックが耐水性の点で
好ましい。さらに無機質充填剤と樹脂分とを3−グリシ
ドキシプロピルトリメトキシシランに代表されるシラン
カップリング剤を用いることにより橋かけを行なえば耐
水性、強度などが向上する。また2−メチルイミダゾー
ルなどイミダゾール類に代表される硬化促進剤、カルナ
バワックスなどの離型剤、臭素化エポキシ、酸化アンチ
モン等のil!燃剤、カーボンブラック等の顔料等、公
知の材料を使用することができる。
As the epoxy resin in the present invention, a novolac type epoxy resin is preferable from the viewpoint of electrical properties, water resistance, and moldability. Further, as the inorganic filler, it is desirable to use a material with good heat dissipation properties such as silica or alumina. As the curing agent having a phenolic hydroxyl group, phenol novolak is preferred from the viewpoint of water resistance. Furthermore, if the inorganic filler and the resin are cross-linked using a silane coupling agent such as 3-glycidoxypropyltrimethoxysilane, water resistance, strength, etc. can be improved. Also, hardening accelerators represented by imidazoles such as 2-methylimidazole, mold release agents such as carnauba wax, il! such as brominated epoxy, antimony oxide, etc. Known materials such as fuel and pigments such as carbon black can be used.

〔実施例〕〔Example〕

エポキシ当量220のクレゾールノボラック型エポキシ
樹脂100重量部(以下部とのみ記す)、水酸基当量1
05のフェノールノボラック60部、メジアン径が12
μmのシリカ粉末380部、3−グリシドキシプロビル
トリメトキシシラン2部、2−フェニルイミダゾール2
部、エステルワックス1.5部および融点が175℃の
ポリプロピレン粉末10部を熱ロールにて60〜80℃
で混練し、得られた組成物を10メツシユパスのパウダ
ーとした。
100 parts by weight of cresol novolac type epoxy resin with an epoxy equivalent of 220 (hereinafter referred to as parts), a hydroxyl equivalent of 1
05 phenol novolac 60 parts, median diameter 12
380 parts of μm silica powder, 2 parts of 3-glycidoxypropyltrimethoxysilane, 2 parts of 2-phenylimidazole
1.5 parts of ester wax and 10 parts of polypropylene powder with a melting point of 175°C were heated at 60 to 80°C using a heated roll.
The resulting composition was made into a powder of 10 mesh passes.

次に、このパウダー50gを用い圧力3 ton/c+
w”の条件でタブレットとし、トランスファ圧力50k
g/cL112、成形温度175℃、成形時間2分でト
ランスファ成形を行ない、成形品の応力をピエゾ素子法
により測定した。さらに成形品を175℃、5hの条件
で後硬化処理を行ない、応力、曲げ弾性率、煮沸吸水率
を測定した。その結果を表1に示す。
Next, using 50 g of this powder, the pressure was 3 ton/c+.
Tablet under the condition of “w”, transfer pressure 50k
Transfer molding was performed at g/cL of 112, molding temperature of 175° C., and molding time of 2 minutes, and the stress of the molded product was measured by the piezo element method. Further, the molded product was subjected to post-curing treatment at 175° C. for 5 hours, and the stress, flexural modulus, and boiling water absorption were measured. The results are shown in Table 1.

〔比較例〕[Comparative example]

ポリプロピレンを除いた以外は実施例と同様の組成、方
法にて成形品を得た後、上記実施例と同様の特性の測定
を行なった。その結果を第1表に示す。
A molded article was obtained using the same composition and method as in the example except that polypropylene was omitted, and then the characteristics were measured in the same manner as in the above example. The results are shown in Table 1.

第  1  表 第1表によれば実施例の方が比較例よりいずれも低く、
低応力、高耐水性であることがわかる。
Table 1 According to Table 1, the Examples are lower than the Comparative Examples.
It can be seen that it has low stress and high water resistance.

〔発明の効果〕〔Effect of the invention〕

本発明によれば親木基を持たず、成形温度、アフターキ
ュア温度付近に融点のあるポリプロピレンを用いること
により第1表かられかるように硬化収縮に伴う応力を緩
和できるので、低応力で耐水性に優れる。
According to the present invention, by using polypropylene that does not have parent wood groups and has a melting point near the molding temperature and after-cure temperature, it is possible to alleviate the stress associated with curing shrinkage as shown in Table 1, so it is low stress and water resistant. Excellent in sex.

Claims (1)

【特許請求の範囲】 1、ポリプロピレン粉末を含むことを特徴とする半導体
封止用エポキシ樹脂組成物。 2、前記ポリプロピレン粉末を、前記エポキシ樹脂10
0重量部に対して1〜20重量部含む特許請求の範囲第
1項記載の組成物。 3、前記ポリプロピレン粉末の融点が140℃以上であ
る特許請求の範囲第1項記載の組成物。 4、前記エポキシ樹脂100重量部に対して無機質充填
剤250〜500重量部及びフェノール性水酸基を有す
る硬化剤20〜100重量部を含む特許請求の範囲第1
項記載の組成物。
[Scope of Claims] 1. An epoxy resin composition for semiconductor encapsulation, characterized by containing polypropylene powder. 2. Add the polypropylene powder to the epoxy resin 10
The composition according to claim 1, which contains 1 to 20 parts by weight relative to 0 parts by weight. 3. The composition according to claim 1, wherein the polypropylene powder has a melting point of 140°C or higher. 4. Claim 1, which contains 250 to 500 parts by weight of an inorganic filler and 20 to 100 parts by weight of a curing agent having a phenolic hydroxyl group based on 100 parts by weight of the epoxy resin.
Compositions as described in Section.
JP25760885A 1985-11-19 1985-11-19 Epoxy resin composition for sealing semiconductor Pending JPS62119263A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25760885A JPS62119263A (en) 1985-11-19 1985-11-19 Epoxy resin composition for sealing semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25760885A JPS62119263A (en) 1985-11-19 1985-11-19 Epoxy resin composition for sealing semiconductor

Publications (1)

Publication Number Publication Date
JPS62119263A true JPS62119263A (en) 1987-05-30

Family

ID=17308629

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25760885A Pending JPS62119263A (en) 1985-11-19 1985-11-19 Epoxy resin composition for sealing semiconductor

Country Status (1)

Country Link
JP (1) JPS62119263A (en)

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