JPS62113965U - - Google Patents

Info

Publication number
JPS62113965U
JPS62113965U JP1986000457U JP45786U JPS62113965U JP S62113965 U JPS62113965 U JP S62113965U JP 1986000457 U JP1986000457 U JP 1986000457U JP 45786 U JP45786 U JP 45786U JP S62113965 U JPS62113965 U JP S62113965U
Authority
JP
Japan
Prior art keywords
surface plate
wafer
processing surface
water washing
washing device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1986000457U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986000457U priority Critical patent/JPS62113965U/ja
Publication of JPS62113965U publication Critical patent/JPS62113965U/ja
Pending legal-status Critical Current

Links

JP1986000457U 1986-01-07 1986-01-07 Pending JPS62113965U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986000457U JPS62113965U (enrdf_load_stackoverflow) 1986-01-07 1986-01-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986000457U JPS62113965U (enrdf_load_stackoverflow) 1986-01-07 1986-01-07

Publications (1)

Publication Number Publication Date
JPS62113965U true JPS62113965U (enrdf_load_stackoverflow) 1987-07-20

Family

ID=30777447

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986000457U Pending JPS62113965U (enrdf_load_stackoverflow) 1986-01-07 1986-01-07

Country Status (1)

Country Link
JP (1) JPS62113965U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0521406A (ja) * 1991-07-12 1993-01-29 Fujikoshi Kikai Kogyo Kk 多連式全自動ウエハーポリツシング装置とポリツシング方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5932350B2 (ja) * 1980-12-17 1984-08-08 神鋼電機株式会社 ブレ−キ制御装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5932350B2 (ja) * 1980-12-17 1984-08-08 神鋼電機株式会社 ブレ−キ制御装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0521406A (ja) * 1991-07-12 1993-01-29 Fujikoshi Kikai Kogyo Kk 多連式全自動ウエハーポリツシング装置とポリツシング方法

Similar Documents

Publication Publication Date Title
US7097544B1 (en) Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion
US5545076A (en) Apparatus for gringing a semiconductor wafer while removing dust therefrom
JP3701126B2 (ja) 基板の洗浄方法及び研磨装置
US5738574A (en) Continuous processing system for chemical mechanical polishing
US5876508A (en) Method of cleaning slurry remnants after the completion of a chemical-mechanical polish process
KR100451615B1 (ko) 폴리싱장치
US6595220B2 (en) Apparatus for conveying a workpiece
JPS62113965U (enrdf_load_stackoverflow)
KR19990032351A (ko) 카메라를 갖는 화학적·기계적 연마 장치
EP0796702B1 (en) Polishing apparatus and method
JP3556148B2 (ja) ウェハ研磨装置
JP7611043B2 (ja) ウエハ裏面洗浄装置
JPH09254018A (ja) ポリッシング装置
JPH01153273A (ja) 半導体ウエハの研磨方法
JPS5919329A (ja) 洗浄方法とその装置
KR20020096083A (ko) 화학적 기계 연마 장치의 세척수 공급 유닛
JPS6176262A (ja) 研磨装置
JP2000127027A (ja) ウェーハ加工装置
JPS6016361A (ja) ウエ−ハ剥離方法
JPH01300523A (ja) 吸着方式によるポリッシング装置
JPS645880Y2 (enrdf_load_stackoverflow)
JPH069511Y2 (ja) ウエハ−の水中搬送装置
JPH0425705Y2 (enrdf_load_stackoverflow)
JPH0379872U (enrdf_load_stackoverflow)
JPH0425706Y2 (enrdf_load_stackoverflow)