JPS6211291A - Manufacture of circuit board - Google Patents

Manufacture of circuit board

Info

Publication number
JPS6211291A
JPS6211291A JP14924085A JP14924085A JPS6211291A JP S6211291 A JPS6211291 A JP S6211291A JP 14924085 A JP14924085 A JP 14924085A JP 14924085 A JP14924085 A JP 14924085A JP S6211291 A JPS6211291 A JP S6211291A
Authority
JP
Japan
Prior art keywords
circuit board
layer
metal layer
resist layer
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14924085A
Other languages
Japanese (ja)
Inventor
洋 大平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP14924085A priority Critical patent/JPS6211291A/en
Publication of JPS6211291A publication Critical patent/JPS6211291A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は回路板の製造方法に関する。[Detailed description of the invention] [Technical field of invention] The present invention relates to a method of manufacturing a circuit board.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

従来回路板を製造するのに絶縁板上の金属層上にエツチ
ングレジストをスクリーン印刷したり。
Conventionally, when manufacturing circuit boards, etching resist is screen printed on the metal layer on the insulating plate.

或いは感光性エツチングレジストを用いて写真蝕刻法に
より所定のレジストパターンを得て、露出した金属層を
エツチング液で溶解し1回路パターンを得ていた。これ
らの方法による嚇合、必ず原画としての写真マスクが必
要であった。この為。
Alternatively, a predetermined resist pattern is obtained by photolithography using a photosensitive etching resist, and the exposed metal layer is dissolved with an etching solution to obtain a single circuit pattern. When using these methods, a photographic mask was always required as the original image. For this reason.

マスク作成の為の期間が必要なため、短納期には間に会
わなかったシ、マスクの傷つきやすいため、不良品を製
造したシの不都合があった@〔発明の目的〕 本発明は前記従来技術による回路板の形成上の問題点を
克服した回路板の製造方法を提供する。
Because of the time required for mask production, there were inconveniences such as not being able to meet short delivery deadlines, and defective products being manufactured because the masks were easily damaged. Provided is a method for manufacturing a circuit board that overcomes problems in forming the circuit board by technology.

〔発明の概要〕[Summary of the invention]

本発明は絶縁板の片面乃至両面に金8層を形成して、こ
の金属層上に光線を吸収しやすく変性し、且つ、残渣の
残りにくい高分子化合物からなるエツチングレジスト層
を形成し、このレジスト1をコンピューターによって照
射部位を制御されたレーザ光で所定パターン状に走査さ
せ、レジスト層を揮発させる工程と、露出し九金属層を
エツチングする工程と、残余のレジスト層を剥離するこ
とによって所定のパターンを形成する回路板の製造方法
である。
In the present invention, 8 gold layers are formed on one or both sides of an insulating plate, and on this metal layer, an etching resist layer made of a polymer compound that easily absorbs light, denatures, and does not easily leave a residue is formed. The irradiation area of the resist 1 is scanned in a predetermined pattern with a laser beam controlled by a computer to volatilize the resist layer, the exposed metal layer is etched, and the remaining resist layer is peeled off to form a predetermined pattern. This is a method of manufacturing a circuit board in which a pattern is formed.

ここで光線を吸収しやすく変性し、且つ残渣の残りにく
い高分子化合物からなるエツチングレジストとしては、
ポリエチレン系樹脂、ポリプロピレン系樹脂、アクリル
系樹脂、ニトロセルロース。
Here, as an etching resist made of a polymer compound that easily absorbs light, denatures, and does not easily leave a residue,
Polyethylene resin, polypropylene resin, acrylic resin, nitrocellulose.

エチルセルローズ、カルボキシメチルセルロース。Ethyl cellulose, carboxymethyl cellulose.

ポリビニールブチルウール樹脂等がある。特にアクリル
系樹脂が好適であシ、各種のアクリル系コーポリマーが
使える。一方、光線を吸収しゃすぐなるための添加剤と
しては1便用するレーザ光の波長によって使いわける必
要がある。
Examples include polyvinyl butyl wool resin. Acrylic resins are particularly suitable, and various acrylic copolymers can be used. On the other hand, additives for absorbing light must be selected depending on the wavelength of the laser light to be used.

例えばアルゴンレーザの波長487nmにおいては、ロ
ーダミンB、デスパーファストピンクR9等が好適であ
夛、Nd;YAGレーザーの波長11060nにおいて
はオイルブラック、ダイヤモンドブラック等が好適であ
る。使用レーザによって染顔料を選定し、上記高分子化
合物に分散させることにより、エツチングレジストを調
整する。
For example, Rhodamine B, Desperfast Pink R9, etc. are suitable for the wavelength of 487 nm of the argon laser, and oil black, diamond black, etc. are suitable for the wavelength of 11060 nm of the Nd;YAG laser. The etching resist is prepared by selecting dyes and pigments depending on the laser used and dispersing them in the polymer compound.

〔発明の効果〕〔Effect of the invention〕

(1)パターン形成のための原画マスクを作成する必要
がなく、配りレイアウトをコンピューターで作画し、こ
のデータによってダイレクトにエツチングレジストに所
定のパターンを形成できるので。
(1) There is no need to create an original mask for pattern formation; the distribution layout can be drawn on a computer, and a predetermined pattern can be directly formed on the etching resist using this data.

納期の短縮がはかられ、また数量の少ないものでは経済
的に回路板を製造することが可能とする。
The delivery time can be shortened, and circuit boards can be manufactured economically in small quantities.

〔発明の実施ダ1 ) 本発明の実施列を図面を用いて説明する。1.6mm厚
のフェノール樹脂銅張積層板(商品名ニトライトCCL
−8A73製造元三菱ガス化学KK)には35μの鋼箔
が張り会されている。これを100冊角に切断した。別
にエツチングレジストとしてポリメチルメタアクリレー
ト樹脂をN、N−ジメチルホルムアミドに10%1度に
なるように溶解し、この溶液100重量部に対して2俤
のオイルブラックを添加し、均一に分散溶解させた。欠
いてこれを前記鋼張積層板lの鋼層2の上にスピンナー
を用いて均一塗布して、エッチレジスト層3を得た。乾
燥厚みは約5μmであった。次いで1.06μmの波長
のNa :YAG L/−ザー装置(商品名LAY−7
11(り東芝I!りを用いて、ビームスポット50μ径
、バイトサイズ2μ、Qスイ、チ周波数2000Hz、
レーザ光の平均出力5W、スポット移動速度40mm/
seeで行り念。図中4はレーザー光の照射部である。
[Embodiment 1 of the Invention] An embodiment of the present invention will be described with reference to the drawings. 1.6mm thick phenolic resin copper clad laminate (product name: Nitrite CCL)
-8A73 (manufacturer Mitsubishi Gas Chemical KK) is covered with 35μ steel foil. This was cut into 100 square pieces. Separately, as an etching resist, polymethyl methacrylate resin was dissolved in N,N-dimethylformamide to a concentration of 10% and 1%, and 2 tons of oil black was added to 100 parts by weight of this solution to uniformly disperse and dissolve. Ta. This was uniformly applied onto the steel layer 2 of the steel clad laminate 1 using a spinner to obtain an etch resist layer 3. The dry thickness was approximately 5 μm. Next, a Na:YAG L/- laser device (trade name LAY-7) with a wavelength of 1.06 μm was used.
11 (using Toshiba I!ri, beam spot diameter 50μ, bite size 2μ, Q switch, chi frequency 2000Hz,
Average laser beam output 5W, spot moving speed 40mm/
See and remember. 4 in the figure is a laser beam irradiation part.

描画図形は図のように直線を100μmピッチで、長さ
50mmのものを500本描き、更fc局辺を照射し、
1本1本が独立したパターンになるようにした。この描
画は前記レーザー装置に内蔵されているコンピューター
ヲ用いて自動的に描画させたものである。
As shown in the figure, draw 500 straight lines with a pitch of 100 μm and a length of 50 mm, and then irradiate the fc local area.
I made it so that each line has an independent pattern. This drawing was automatically drawn using a computer built into the laser device.

レーザー光の照射部は、銅箔面が何ら障害を受けず、露
呈してお!7.これを塩化第二鉄湯浴で5分間でエツチ
ングした。その後エツチングレジスト層をトリクレンで
除去した。これを顕微鏡で観察した結果、導体巾55μ
m、絶縁部45μmできれいにパターンが形成されてお
り、電気的チェック−こおいても全数、短絡等なかった
The copper foil surface is exposed to the laser beam without any damage! 7. This was etched in a ferric chloride water bath for 5 minutes. Thereafter, the etching resist layer was removed using trichlorethylene. As a result of observing this with a microscope, the conductor width was 55 μm.
A clean pattern was formed with an insulating part of 45 μm, and there were no short circuits in all cases when electrically checked.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明の一実施例を説明するための図である。 1・・・銅張積層板、2・・・鋼層、3・・・レジスト
層。 4・・・レーザ光の照射部。 代理人 弁理士  則 近 憲 右 同    竹 花 喜久男
The drawings are diagrams for explaining one embodiment of the present invention. 1... Copper-clad laminate, 2... Steel layer, 3... Resist layer. 4... Laser light irradiation part. Agent Patent Attorney Ken Nori Chika Udo Kikuo Takehana

Claims (1)

【特許請求の範囲】[Claims]  絶縁層の全面に均一厚みの金属層を形成する工程と、
この金属層上に光線を吸収しやすく変性且つ残渣の残り
にくい高分子化合物からなるエッチングレジスト層を形
成する工程と、コンピューターによって制御されたレー
ザ光を所定パターン状に走査させ、レジスト層を揮発す
る工程と、露出に金属層をエッチングする工程と、レジ
スト層を剥離する工程とからなることを特徴とする回路
板の製造方法。
a step of forming a metal layer with a uniform thickness on the entire surface of the insulating layer;
A process of forming an etching resist layer made of a polymer compound that easily absorbs light, denatures, and does not leave residue on this metal layer, and a laser beam controlled by a computer is scanned in a predetermined pattern to volatilize the resist layer. 1. A method for manufacturing a circuit board, comprising: a step of etching an exposed metal layer; and a step of peeling off a resist layer.
JP14924085A 1985-07-09 1985-07-09 Manufacture of circuit board Pending JPS6211291A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14924085A JPS6211291A (en) 1985-07-09 1985-07-09 Manufacture of circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14924085A JPS6211291A (en) 1985-07-09 1985-07-09 Manufacture of circuit board

Publications (1)

Publication Number Publication Date
JPS6211291A true JPS6211291A (en) 1987-01-20

Family

ID=15470944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14924085A Pending JPS6211291A (en) 1985-07-09 1985-07-09 Manufacture of circuit board

Country Status (1)

Country Link
JP (1) JPS6211291A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06112626A (en) * 1992-09-28 1994-04-22 Polyplastics Co Method of forming conducting circuit on surface of molded product
US5792520A (en) * 1995-08-24 1998-08-11 Kabushiki Kaisha Toshiba Method of manufacturing a reflector
JP2006201212A (en) * 2005-01-18 2006-08-03 Shinka Jitsugyo Kk Method and apparatus for forming surface shape and method and apparatus for forming floating surface of magnetic head
JP2006198457A (en) * 2005-01-18 2006-08-03 Shinka Jitsugyo Kk Method and apparatus for forming surficial shape and method and apparatus for forming floating surface of magnetic head
JP2013030523A (en) * 2011-07-27 2013-02-07 Dowa Metaltech Kk Method of manufacturing metal-ceramic junction circuit board
JP2018101763A (en) * 2016-12-22 2018-06-28 株式会社Nsc Power module substrate and production method thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06112626A (en) * 1992-09-28 1994-04-22 Polyplastics Co Method of forming conducting circuit on surface of molded product
US5792520A (en) * 1995-08-24 1998-08-11 Kabushiki Kaisha Toshiba Method of manufacturing a reflector
JP2006201212A (en) * 2005-01-18 2006-08-03 Shinka Jitsugyo Kk Method and apparatus for forming surface shape and method and apparatus for forming floating surface of magnetic head
JP2006198457A (en) * 2005-01-18 2006-08-03 Shinka Jitsugyo Kk Method and apparatus for forming surficial shape and method and apparatus for forming floating surface of magnetic head
JP2013030523A (en) * 2011-07-27 2013-02-07 Dowa Metaltech Kk Method of manufacturing metal-ceramic junction circuit board
JP2018101763A (en) * 2016-12-22 2018-06-28 株式会社Nsc Power module substrate and production method thereof

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