JPS62111489A - Excimer laser apparatus - Google Patents

Excimer laser apparatus

Info

Publication number
JPS62111489A
JPS62111489A JP25133585A JP25133585A JPS62111489A JP S62111489 A JPS62111489 A JP S62111489A JP 25133585 A JP25133585 A JP 25133585A JP 25133585 A JP25133585 A JP 25133585A JP S62111489 A JPS62111489 A JP S62111489A
Authority
JP
Japan
Prior art keywords
light
discharge
main discharge
ionization
preliminary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25133585A
Other languages
Japanese (ja)
Other versions
JPH0573072B2 (en
Inventor
Naoya Horiuchi
直也 堀内
Takuhiro Ono
小野 拓弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP25133585A priority Critical patent/JPS62111489A/en
Publication of JPS62111489A publication Critical patent/JPS62111489A/en
Publication of JPH0573072B2 publication Critical patent/JPH0573072B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation

Abstract

PURPOSE:To obtain stable glow discharge with less preliminary discharge, by converging UV light, which is generated by preliminary discharge, at a desired position in a main discharge region by pivotable mirror surfaces, and yielding ionization at the position so that most of the UV light contributes to the ionization in the main discharge region. CONSTITUTION:The main discharge of an excimer laser apparatus occurs between main discharge electrodes 1 and 2 and a glow region 3 is yielded. Meanwhile, preliminary ionization generates UV light 6 between preliminary electrodes 4 and 5. The UV light 6 is converged by a reflecting mirror 9 which is provided behind, and a focal point is formed at a point 11. The reflecting mirror is an elliptic mirror. The first focal point is set at a part, where the UV light 6 is generated, and the second focal point is set at the point 11. Then the UV light 6 is efficiently converged in the main discharge region even if the UV light has less discharge power. Thus sufficient amount of ionized electrons can be obtained. When the mirror can be turned around a supporting post 10, the focal point 11 can be adjusted so that the point 11 is located at the desired position between the main electrodes 1 and 2. The main discharge can be performed along the entire length between the main discharge electrodes 1 and 2.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は希がスハライド放電励起を利用したエキシマレ
ーザ装置に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an excimer laser device that utilizes shalide discharge excitation.

従来の技術 エキシマレーザは紫外線を放射するレーザ装置で、半導
体プロセス、化学工業、医療、エネルギー分野などへの
応用展開が期待されている。
Conventional technology Excimer lasers are laser devices that emit ultraviolet rays, and are expected to find application in semiconductor processing, chemical industry, medical care, energy fields, and other fields.

エキシマレーザはレーザ上準位寿命が約1wと短いこと
き、グロー放電の安定期間が負性イオンの形成によって
安定化に寄与するハロゲン分子の枯渇により高々100
0ybsと短いために、立上り約10λS1パルス巾数
1013の短パルス放電励起を必要とする。ところがこ
の様な短時間のうちには2次電子の発生やアバランシェ
電離など通常の正規グロー放電形成のために要求される
素現象が発生し得ないので、クロー放電を行わせる為に
は紫外光(UV光)、コロナ、X線などを用いた予備電
離が必要である。
The excimer laser has a short laser upper level lifetime of approximately 1W, and the stable period of glow discharge is at most 100W due to the depletion of halogen molecules that contribute to stabilization through the formation of negative ions.
Since it is as short as 0ybs, short pulse discharge excitation with a rise time of approximately 10λS1 and a pulse width of 1013 is required. However, in such a short time, the elementary phenomena required for normal glow discharge formation, such as the generation of secondary electrons and avalanche ionization, cannot occur, so ultraviolet light is required to generate a claw discharge. Pre-ionization using (UV light), corona, X-rays, etc. is required.

従来のUV光光子型電離法、主放電電極の片側にUV光
子備電離用電極を配置し、主放電より一定時間前に予備
電離用放電を行わせる。この方法は2度の放電を行わせ
るので二重放電法と呼ばれる。予備電離用電極にも、切
れ目のある電極に沿って直列に沿面放電を行わせる直列
式々マルチピンを並列に配置した並列式のものとがある
In the conventional UV photon ionization method, a UV photon ionization electrode is placed on one side of the main discharge electrode, and a preliminary ionization discharge is performed a certain period of time before the main discharge. This method is called a double discharge method because it causes two discharges. There are also pre-ionization electrodes of the parallel type, in which multi-pins are arranged in series and in parallel to cause a creeping discharge to occur in series along an electrode with cuts.

発明が解決しようとする問題点 予備電離方法においては、予備電離の量が少いと主放電
は不均一なアークになりやすいが、ある閾値を越えてい
れば安定なグロー放電が得られ、その閾値は約10 電
子/CCとされている。しかし従来の方法では十分な予
備電離量が得られない。
Problems to be Solved by the Invention In the pre-ionization method, if the amount of pre-ionization is small, the main discharge tends to become an uneven arc, but if it exceeds a certain threshold, a stable glow discharge can be obtained; is estimated to be approximately 10 electrons/CC. However, with conventional methods, a sufficient amount of pre-ionization cannot be obtained.

また、主放電は前記した様に数10vL5と云う極めて
短時間の内ζこ行われるので放電中に電子のドリフトが
生ずる事は考えられない。したがって、予備電離による
電離電子の発生が主放電にとって最も望ましい所に行わ
れる事が必要である。ところが従来の方法ではせいぜい
予備電離電極の配置によってしか、この位置の適正化を
行うことは出来ず、十分な位置制御をすることができな
い。
Furthermore, as mentioned above, the main discharge is carried out within an extremely short period of several tens of vL5, so it is unlikely that electron drift will occur during the discharge. Therefore, it is necessary that the generation of ionized electrons by pre-ionization be performed at the most desirable location for the main discharge. However, in the conventional method, this position can only be optimized by arranging the pre-ionization electrode at most, and sufficient position control cannot be achieved.

本発明は以上の点に鑑みてなされたもので、予備電離効
果を促進させて多量の電離電子を発生させレーザ出力の
増大を図ることを目的とするものである。
The present invention has been made in view of the above points, and an object of the present invention is to promote the pre-ionization effect, generate a large amount of ionized electrons, and increase laser output.

問題点を解決するための手段 本発明は予備放電により発生したUV光を回動可能な鏡
面により主放電領域内の望ましい位置に集光させ、そこ
に電離を発生させるようにしたエキシマレーザ装置であ
る。
Means for Solving the Problems The present invention is an excimer laser device in which UV light generated by preliminary discharge is focused on a desired position within the main discharge area using a rotatable mirror surface, and ionization is generated there. be.

作    用 上記構成によれば、予備放電によって発生したUV光の
大半が主放電領域内の電離に寄与し、小さい予備放電に
よっても安定なグロー放電を得ることができ、エキシマ
レーザ出力が増大する。
Operation According to the above configuration, most of the UV light generated by the preliminary discharge contributes to ionization in the main discharge region, and a stable glow discharge can be obtained even with a small preliminary discharge, increasing the excimer laser output.

実施例 以下本発明の実施例について、図面きともに詳細に説明
する。
EXAMPLES Hereinafter, examples of the present invention will be described in detail with reference to the drawings.

第1図は本発明によるエキシマレーザ装置の実施例を示
す斜視図、第2図はそのA−A′!!断面図である。図
において、主放電は主放電電極1及び2間で行われグロ
ー領域3を生ずる。一方予備電離は予備放電電極4及び
5間で発生し、UV光6を発生する。予備放電電極4,
5はレーザ管の長さ方向に数10対設けられ、長さ方向
の各所において[JV光6を発生させる。7及び8は電
極4及び5へのリードを兼ねた支持体である。予備電離
6で発生するUV光6はその背後に設置した反射鏡9、
たとえば楕円鏡により集光されて点11に焦点を結ぶ。
FIG. 1 is a perspective view showing an embodiment of an excimer laser device according to the present invention, and FIG. 2 is an A-A'! ! FIG. In the figure, a main discharge takes place between main discharge electrodes 1 and 2, producing a glow region 3. On the other hand, pre-ionization occurs between the pre-discharge electrodes 4 and 5, generating UV light 6. preliminary discharge electrode 4,
Several tens of pairs of laser beams 5 are provided along the length of the laser tube, and JV light 6 is generated at various locations along the length. 7 and 8 are supports that also serve as leads to the electrodes 4 and 5. The UV light 6 generated by pre-ionization 6 is reflected by a reflecting mirror 9 installed behind it.
For example, the light is collected by an elliptical mirror and focused on a point 11.

反射僻9は楕円鏡として第1焦点をUV光6を発生する
部分に、第2焦点を点11にすれば小さい放電電力によ
るUV光でも効率的に主放電領域に集光し、十分な量の
電離電子が得られる。この反射鏡9は支持柱10のまわ
りに回転しうる様にしておくと、焦点11は主電極1及
び2間の望ましい位置に来る様調整することができる。
If the reflector 9 is an elliptical mirror and the first focal point is set to the part that generates the UV light 6 and the second focal point is set to the point 11, even the UV light generated by a small discharge power will be efficiently focused on the main discharge area, and a sufficient amount will be generated. of ionized electrons are obtained. By allowing the reflecting mirror 9 to rotate around the support column 10, the focal point 11 can be adjusted to a desired position between the main electrodes 1 and 2.

実際にはレーザ出力が最大になる様にこの回転量を実験
的に調整してやればよい。12は出力結合鏡、13は全
反射鏡、14は出力ビームである。
In practice, this amount of rotation may be adjusted experimentally so that the laser output is maximized. 12 is an output coupling mirror, 13 is a total reflection mirror, and 14 is an output beam.

なお、実際のレーザでは真空容器、送風装置、冷却装置
等のその他の部品や装置が必要であるが、それらはエキ
シマレーザの分野では既知の技術であるし、本発明での
本質的な部分でないので図示を省略した。
Note that actual lasers require other parts and devices such as a vacuum container, blower device, and cooling device, but these are known technologies in the field of excimer lasers and are not essential parts of the present invention. Therefore, illustration is omitted.

上記構成において、主放電電極I、2間の全長域にわた
って主放電が行なわれる。一方、各予備電離電極4,5
間に発生したUV光6は反射鏡9によって主放電電極]
、2間の全長域にわたって集光される。この集光位置は
反射鏡9を支持柱10のまわりに回転させることにより
最大出力が得られる適正位置に集光するよう調整するこ
とができる。
In the above configuration, the main discharge is performed over the entire length region between the main discharge electrodes I and 2. On the other hand, each pre-ionization electrode 4, 5
The UV light 6 generated during this period is directed to the main discharge electrode by a reflecting mirror 9]
, the light is focused over the entire length region between the two. This light condensing position can be adjusted by rotating the reflecting mirror 9 around the support column 10 so that the light is condensed at an appropriate position where maximum output can be obtained.

第3図は第】図に示した予備電離用放電電極4゜5およ
び反射鏡9を主放電部をはさんで左右両側に対称的に配
置した実施例であり、予備電離の効果が一層大きくなる
。各部の構成および動作は第1図、第2図の場合と本質
的に同一であるので同一符号を付し説明を省略する。
Figure 3 shows an embodiment in which the pre-ionization discharge electrodes 4.5 and the reflecting mirrors 9 shown in the figure are arranged symmetrically on both the left and right sides with the main discharge part in between, and the effect of pre-ionization is even greater. Become. The configuration and operation of each part are essentially the same as those in FIGS. 1 and 2, so the same reference numerals are given and explanations will be omitted.

発明の効果 以上のように、本発明はエキシマレーザ装置の主放電電
極間の適正位置に予備放電によるUV光を反射鏡によっ
て集光させるようにしたもので、予備電離効果を促進さ
せて安定なグロー放電を行なわせ、レーザ出力の増大化
を図るとともに、予備電離用放電電力の低減を実現する
ことができる。
Effects of the Invention As described above, the present invention focuses UV light from a pre-discharge at a proper position between the main discharge electrodes of an excimer laser device using a reflecting mirror, thereby promoting the pre-ionization effect and producing a stable product. By causing glow discharge, it is possible to increase the laser output and reduce the pre-ionization discharge power.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明によるエキシマレーザ装置の実施例にお
ける要部斜視図、第2図は第1図のA −A′轢断面図
、第3図は本発明によるエキシマレーザ装置の他の実施
例を示す要部断面側面図である。 1.2・・・主放電電極、3・・主放電グロー領域、4
.5・・・予備電離用放電電極、6・・UV光、9・・
・反射鏡。 代理人の氏名 弁理士 中 尾 敏 男 はか1名第 
1 図 /3る及射攻 2主穆豊霊金 ・□ \l呼りじ′−4 第2図 3+予蘂博餘 第 3 図 s′5
FIG. 1 is a perspective view of essential parts of an embodiment of an excimer laser device according to the present invention, FIG. 2 is a sectional view taken along line A-A' in FIG. 1, and FIG. 3 is another embodiment of an excimer laser device according to the present invention. FIG. 1.2... Main discharge electrode, 3... Main discharge glow region, 4
.. 5... Discharge electrode for preliminary ionization, 6... UV light, 9...
·Reflector. Name of agent: Patent attorney Toshio Nakao Haka 1st person
1 Fig./3 Fire attack 2 Lord Mufeng Reikin ・□ \l Calligraphy'-4 Fig. 2 3 + Yosho Hakuyo No. 3 Fig. s'5

Claims (4)

【特許請求の範囲】[Claims] (1)主放電電極と、その長さ方向に複数個配列された
予備放電電極を備え、予備放電によって発生した紫外光
を反射鏡により主放電電極間に集光させることを特徴と
するエキシマレーザ装置。
(1) An excimer laser comprising a main discharge electrode and a plurality of preliminary discharge electrodes arranged in the length direction thereof, and which focuses ultraviolet light generated by the preliminary discharge between the main discharge electrodes using a reflecting mirror. Device.
(2)反射鏡が楕円鏡であり、その第1焦点に予備放電
位置を、第2焦点に集光位置を配した特許請求の範囲第
1項記載のエキシマレーザ装置。
(2) The excimer laser device according to claim 1, wherein the reflecting mirror is an elliptical mirror, the preliminary discharge position is located at the first focal point, and the condensing position is located at the second focal point.
(3)反射鏡が主放電電極の長さ方向に平行な軸に対し
て回転可能である特許請求の範囲第1項記載のエキシマ
レーザ装置。
(3) The excimer laser device according to claim 1, wherein the reflecting mirror is rotatable about an axis parallel to the length direction of the main discharge electrode.
(4)予備放電電極と反射鏡が主放電電極の両側に対称
的に配置された特許請求の範囲第1項記載のエキシマレ
ーザ装置。
(4) The excimer laser device according to claim 1, wherein the preliminary discharge electrode and the reflecting mirror are arranged symmetrically on both sides of the main discharge electrode.
JP25133585A 1985-11-08 1985-11-08 Excimer laser apparatus Granted JPS62111489A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25133585A JPS62111489A (en) 1985-11-08 1985-11-08 Excimer laser apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25133585A JPS62111489A (en) 1985-11-08 1985-11-08 Excimer laser apparatus

Publications (2)

Publication Number Publication Date
JPS62111489A true JPS62111489A (en) 1987-05-22
JPH0573072B2 JPH0573072B2 (en) 1993-10-13

Family

ID=17221292

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25133585A Granted JPS62111489A (en) 1985-11-08 1985-11-08 Excimer laser apparatus

Country Status (1)

Country Link
JP (1) JPS62111489A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7123872B2 (en) 2002-09-11 2006-10-17 Ricoh Company, Ltd. Cleaning device and method, image forming apparatus, and process cartridge

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7123872B2 (en) 2002-09-11 2006-10-17 Ricoh Company, Ltd. Cleaning device and method, image forming apparatus, and process cartridge

Also Published As

Publication number Publication date
JPH0573072B2 (en) 1993-10-13

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