JP2680441B2 - Gas laser device - Google Patents

Gas laser device

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Publication number
JP2680441B2
JP2680441B2 JP23989189A JP23989189A JP2680441B2 JP 2680441 B2 JP2680441 B2 JP 2680441B2 JP 23989189 A JP23989189 A JP 23989189A JP 23989189 A JP23989189 A JP 23989189A JP 2680441 B2 JP2680441 B2 JP 2680441B2
Authority
JP
Japan
Prior art keywords
discharge
anode
cathode
gas laser
main
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP23989189A
Other languages
Japanese (ja)
Other versions
JPH03102884A (en
Inventor
弘司 柿崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP23989189A priority Critical patent/JP2680441B2/en
Publication of JPH03102884A publication Critical patent/JPH03102884A/en
Application granted granted Critical
Publication of JP2680441B2 publication Critical patent/JP2680441B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Description

【発明の詳細な説明】 ［発明の目的］ （産業上の利用分野） この発明はレーザ管内に封入されたガスレーザ媒質を
陰極と陽極とからなる主電極で発生する放電によって励
起してレーザ光を出力させるガスレーザ装置に関する。DETAILED DESCRIPTION OF THE INVENTION Object of the Invention (Industrial field of application) The present invention excites a laser beam by exciting a gas laser medium enclosed in a laser tube by a discharge generated at a main electrode composed of a cathode and an anode. The present invention relates to a gas laser device for outputting.

（従来の技術） 一般に、TEA CO2レーザやエキシマレーザなどのガス
レーザ装置はガスレーザ媒質が封入されたレーザ管内に
主電極を構成する陰極と陽極とが離間対向して配設さ
れ、これらの間に主放電を発生させることによって上記
ガスレーザ媒質を励起してレーザ光を放出するようにな
っている。(Prior Art) Generally, in a gas laser device such as a TEA CO 2 laser or an excimer laser, a cathode and an anode constituting a main electrode are arranged facing each other in a laser tube in which a gas laser medium is sealed, and between them. By generating a main discharge, the gas laser medium is excited to emit laser light.

第５図は一般的な構成のガスレーザ装置を示す。すな
わち、同図中１はガスレーザ媒質が封入されたレーザ管
である。このレーザ管１内には主電極を構成する陰極２
と陽極３とが離間対向して配設されている。上記陰極２
は上部取付板４の下面に取付けられ、上記陽極３は下部
取付板５の上面に取付けられている。上記陰極２の両側
には予備電離電極としての上部ピン電極７が配設され、
上記陽極３の両側には同じく予備電離電極としての下部
ピン電極８が下部取付板５に下端を固定して配設されて
いる。上記上部ピン電極７はピーキングコンデンサ９を
介して上記上部取付板４に固定され、この上部ピン電極
７の下端と上記下部ピン電極８の上端とは所定間隔で離
間対向している。FIG. 5 shows a gas laser device having a general structure. That is, reference numeral 1 in the figure is a laser tube in which a gas laser medium is enclosed. In this laser tube 1, a cathode 2 which constitutes a main electrode
And the anode 3 are arranged to face each other with a space therebetween. The cathode 2
Is attached to the lower surface of the upper mounting plate 4, and the anode 3 is attached to the upper surface of the lower mounting plate 5. Upper pin electrodes 7 as preionization electrodes are arranged on both sides of the cathode 2,
Similarly, lower pin electrodes 8 as preionization electrodes are arranged on both sides of the anode 3 with their lower ends fixed to the lower mounting plate 5. The upper pin electrode 7 is fixed to the upper mounting plate 4 via a peaking capacitor 9, and the lower end of the upper pin electrode 7 and the upper end of the lower pin electrode 8 face each other at a predetermined interval.

上記陰極２と上部ピン電極７とは上記上部取付板４と
電気的に導通され、上記陽極３は上記下部取付板５と電
気的に導通されている。そして、上記上部取付板４は高
圧電源11のマイナス側に接続され、上記下部取付板５は
プラス側に接続されている。The cathode 2 and the upper pin electrode 7 are electrically connected to the upper mounting plate 4, and the anode 3 is electrically connected to the lower mounting plate 5. The upper mounting plate 4 is connected to the negative side of the high voltage power supply 11, and the lower mounting plate 5 is connected to the positive side.

さらに、上記レーザ管１内にはガスレーザ媒質を矢印
方向に循環させる送風機12と、ガスレーザ媒質を所定温
度に維持するための熱交換器13とが配設されている。Further, in the laser tube 1, a blower 12 for circulating the gas laser medium in the direction of the arrow and a heat exchanger 13 for maintaining the gas laser medium at a predetermined temperature are arranged.

このような構成のガスレーザ装置においては、高圧電
源11が作動して電気エネルギが供給されると、まず上部
ピン電極７と下部ピン電極８との対向する端面間で放電
が生じ、UV光（紫外光）が発生する。そのUV光は陰極２
と陽極３との間の放電空間部を予備電離する。放電空間
部の予備電離が進み、陰極２と陽極３との間の電圧が高
くなると、これら電極２、３間で主放電が発生し、レー
ザ光が放電方向と直交する方向に出力されることにな
る。In the gas laser device having such a configuration, when the high-voltage power supply 11 is operated and electric energy is supplied, first, discharge is generated between the end faces of the upper pin electrode 7 and the lower pin electrode 8 facing each other, and UV light (ultraviolet light) is emitted. Light) is generated. The UV light is cathode 2
The discharge space between the anode and the anode 3 is preionized. When the preionization of the discharge space progresses and the voltage between the cathode 2 and the anode 3 becomes high, a main discharge occurs between the electrodes 2 and 3, and the laser light is output in a direction orthogonal to the discharge direction. become.

ところで、高いレーザ出力を得るためには、主放電の
繰り返し周波数を高くしなければならない。そのために
は、陰極２と陽極３との間の放電空間部に上記送風機12
によって循環させられるガスレーザ媒質の流速を大きく
し、主放電によって生じる蒸発金属などの生成物をつぎ
の主放電が点弧されるまでに放電空間部から除去しなけ
ればならない。By the way, in order to obtain a high laser output, the repetition frequency of the main discharge must be increased. For that purpose, the blower 12 is provided in the discharge space between the cathode 2 and the anode 3.
The flow velocity of the gas laser medium circulated by the main discharge must be increased and the products such as evaporated metal generated by the main discharge must be removed from the discharge space before the next main discharge is ignited.

しかしながら、ガスレーザ媒質の流速を大きくするた
めには大きな送風機12を用いなければならないから、装
置全体の大型化を招くばかりか、均一な流速が得にくい
などのことがある。However, in order to increase the flow velocity of the gas laser medium, a large blower 12 must be used, which not only leads to an increase in the size of the entire apparatus, but also makes it difficult to obtain a uniform flow velocity.

そこで、ガスレーザ媒質の流速を大きくせずに主放電
の繰り返し周波数を上げて大きなレーザ出力を得るよう
にしている。しかしながら、単に主放電の繰り返し数を
上げると、ある繰り返し周波数を越えたところで第６図
に示すように陰極２と陽極３との主放電の電界強度が最
大となる放電中心Ｏ（陰極２と陽極３との対向間隔が最
も狭くなる所）よりも矢印で示すガスレーザ媒質の流れ
方向の下流側の箇所でアーク放電ａが発生し、レーザ出
力が著しく低下してしまう。Therefore, the repetition frequency of the main discharge is increased without increasing the flow velocity of the gas laser medium to obtain a large laser output. However, if the number of repetitions of the main discharge is simply increased, the discharge center O (cathode 2 and anode 2) at which the electric field strength of the main discharge between the cathode 2 and the anode 3 becomes maximum as shown in FIG. Arc discharge a occurs at a position downstream of the gas laser medium in the flow direction indicated by the arrow, compared with the position where the facing interval with 3 is the narrowest), and the laser output is significantly reduced.

この原因は、従来の陰極２と、陽極３との断面形状が
同図に示すように放電中心Ｏに対して左右が対象なチャ
ン型やエルンスト型の形状に形成されている。そのた
め、繰り返し周波数を高くすると、主放電によって発生
する生成物が陰極２と陽極３との間の放電空間部の下流
側に残留する間につぎの主放電のための電気エネルギが
陰極２と陽極３とに供給されるから、これら電極の下流
側の箇所で生成物によって上述したようにアーク放電ａ
が発生してレーザ出力の低下を招くことになる。The reason for this is that the conventional cathode 2 and the anode 3 are formed in a Chan-type or Ernst-type shape in which the left and right sides are symmetrical with respect to the discharge center O as shown in FIG. Therefore, when the repetition frequency is increased, the electric energy for the next main discharge is generated while the product generated by the main discharge remains on the downstream side of the discharge space between the cathode 2 and the anode 3. As described above, the arc discharge a is generated by the product at a position on the downstream side of these electrodes.
Occurs, which causes a reduction in laser output.

（発明が解決しようとする課題） このように、従来のガスレーザ装置は主放電の繰り返
し周波数を上げて高いレーザ出力を得ようとすると、主
電極の幅方向下流側の箇所でアーク放電が生じてレーザ
出力が低下するということがあった。(Problems to be Solved by the Invention) As described above, in the conventional gas laser device, when an attempt is made to increase the repetition frequency of the main discharge to obtain a high laser output, arc discharge occurs at a position on the downstream side in the width direction of the main electrode. The laser output sometimes decreased.

この発明は上記事情にもとすぎなされたもので、その
目的とするところは、ガスレーザ媒質の流速を大きくせ
ずに主放電の繰り返し周波数を上げても、主電極の下流
側の箇所でアーク放電が発生しずらいようにしたガスレ
ーザ装置を提供することにある。The present invention has been made in light of the above circumstances, and an object thereof is to achieve arc discharge at a location downstream of the main electrode even if the repetition frequency of the main discharge is increased without increasing the flow velocity of the gas laser medium. Another object of the present invention is to provide a gas laser device that makes it difficult to generate.

［発明の構成］ （課題を解決するための手段及び作用） 上記課題を解決するためにこの発明は、ガスレーザ媒
質が封入されたレーザ管と、光軸に沿う一方の両エッジ
部が所定の関数曲線に形成された一対の板状体からなり
上記レーザ管内に対向して配設された陰極と陽極とから
なる主電極と、この主電極に電気エネルギを供給して上
記陰極と陽極との間に主放電を発生させる高圧電源と、
上記ガスレーザ媒質を上記陰極と陽極との間の放電空間
部に循環させる送風手段とを具備し、上記陰極と陽極と
は、これら電極間に発生する主放電の放電幅が、その放
電の電界強度が最大となる放電中心から上記ガスレーザ
媒質の流れ方向下流側の方が上流側よりも小さくなる断
面形状に設定する。[Structure of the Invention] (Means and Actions for Solving the Problems) In order to solve the above problems, according to the present invention, a laser tube in which a gas laser medium is enclosed and one of both edge portions along the optical axis have a predetermined function. A main electrode composed of a pair of plate-shaped members formed in a curved line and arranged in the laser tube so as to face each other, and a main electrode composed of a cathode and an anode, and an electric energy is supplied to the main electrode to provide a space between the cathode and the anode. A high-voltage power supply that generates a main discharge in
A blowing means for circulating the gas laser medium in a discharge space between the cathode and the anode, wherein the cathode and the anode have a discharge width of a main discharge generated between these electrodes and an electric field strength of the discharge. Is set to a cross-sectional shape in which the downstream side in the flow direction of the gas laser medium is smaller than the upstream side with respect to the discharge center where the maximum.

このようにすれば、主電極の幅方向下流側にゆくにつ
れて放電が生じずらくなるから、上記下流側に生成物が
残留した状態で主放電を繰り返して発生させても、アー
ク放電が生じずらい。By doing this, since it becomes more difficult for discharge to occur in the width direction downstream side of the main electrode, arc discharge does not occur even if the main discharge is repeatedly generated with the product remaining on the downstream side. Lei.

（実施例） 以下、この発明の第１の実施例を第１図と第２図を参
照して説明する。第１図は第５図に示す構成と同じ構成
のガスレーザ装置に用いられる主電極21を示し、この主
電極21は対をなした陰極22と陽極23とからなる。これら
電極22、23の断面形状は主放電の電界強度が最大となる
放電中心Ｏ（陰極22と陽極23との対向間隔が最小となる
所）に対して矢印で示すガスレーザ媒質の流れ方向上流
側部分22a、23aと下流側部分22b、23bとで非対称に形成
されている。すなわち、これら電極22、23の断面形状
は、その幅方向に沿う表面の対向間隔が上流側部分22
a、23aよりも下流側部分22b、23bの方が大きくなるよう
に設定されている。それによって、陰極22と陽極23との
間で生じる主放電Ｄの放電幅は、各電極22、23の放電中
心Ｏに対して上流側の幅寸法d1の方が下流側の幅寸法d2
よりも大きくなる。(Embodiment) A first embodiment of the present invention will be described below with reference to FIGS. 1 and 2. FIG. 1 shows a main electrode 21 used in a gas laser device having the same structure as that shown in FIG. 5, and this main electrode 21 comprises a cathode 22 and an anode 23 which make a pair. The cross-sectional shape of these electrodes 22, 23 is the upstream side in the flow direction of the gas laser medium indicated by the arrow with respect to the discharge center O (where the facing distance between the cathode 22 and the anode 23 is minimum) where the electric field strength of the main discharge is maximum. The portions 22a and 23a and the downstream portions 22b and 23b are formed asymmetrically. That is, the cross-sectional shape of the electrodes 22 and 23 is such that the facing interval of the surfaces along the width direction is the upstream side portion 22.
The downstream side portions 22b and 23b are set to be larger than the a and 23a. Thereby, regarding the discharge width of the main discharge D generated between the cathode 22 and the anode 23, the width dimension d 1 on the upstream side with respect to the discharge center O of each electrode 22, 23 is the width dimension d 2 on the downstream side.
Larger than.

なお、上記陰極22と陽極23とは、第２図に示すように
断面形状の幅方向左右が対称のチャン型の電極を、同図
にＰで示す部分を除去することによって形成されてい
る。The cathode 22 and the anode 23 are formed by removing a chan-shaped electrode whose cross-sectional shape is symmetrical in the width direction as shown in FIG.

このように、陰極22と陽極23との下流側部分22b、23b
の対向間隔を上流側部分22a、23aよりも大きく設定し、
その下流側部分22b、23bで放電が発生しずらくすれば、
主放電によって生じた金属蒸気などの生成物が上記陰極
22と陽極23との下流側部分22b、23bに残留している間に
つぎの主放電が発生させられても、上記下流側部分22
b、23bでアーク放電が発生しずらい。Thus, the downstream side portions 22b, 23b of the cathode 22 and the anode 23
The facing interval of is set larger than the upstream side portions 22a and 23a,
If it is difficult for discharge to occur in the downstream parts 22b and 23b,
Products such as metal vapor generated by the main discharge are the above-mentioned cathode
Even if the following main discharge is generated while remaining in the downstream portions 22b and 23b of the anode 22 and the anode 23, the downstream portion 22
Arc discharge is unlikely to occur at b and 23b.

したがって、主放電の繰り返し周波数をアーク放電の
発生を招くことなく高くすることができるから、それに
よって高いレーザ出力を得ることができる。Therefore, the repetition frequency of the main discharge can be increased without inviting the occurrence of arc discharge, whereby a high laser output can be obtained.

第３図はレーザ出力と主放電の繰り返し周波数との関
係を示す。同図中曲線Ａは従来のチャン型の電極を用い
た場合で、曲線Ｂはこの発明の非対称の断面形状の電極
を用いた場合であり、この発明の電極を用いれば、主放
電の繰り返し周波数を上げ、高いレーザ出力が得られる
ことが確認された。FIG. 3 shows the relationship between the laser output and the repetition frequency of the main discharge. In the figure, a curve A shows the case of using a conventional Chan-shaped electrode, and a curve B shows the case of using an electrode with an asymmetrical cross-sectional shape according to the present invention. It was confirmed that a high laser output was obtained.

第４図はこの発明の主電極21の他の実施例を示し、こ
の実施例は陰極220と陽極230とをチャン型の電極を加工
するのではなく、新たに製作するようにした場合で、こ
のようにすれば各電極220、230の上流側部分220a、230a
と下流側部分220b、230bとの円弧面形状を自由に設定す
ることができる。FIG. 4 shows another embodiment of the main electrode 21 of the present invention. In this embodiment, the cathode 220 and the anode 230 are newly manufactured instead of processing the Chang type electrodes. By doing this, the upstream side portions 220a, 230a of the electrodes 220, 230
It is possible to freely set the arcuate surface shape between the downstream side portions 220b and 230b.

［発明の効果］ 以上述べたようにこの発明によれば、陰極と陽極との
間の放電空間の下流側に主放電によって生じた生成物が
残留した状態でつぎの主放電が点弧されても、上記陰極
と陽極との下流側の部分ではアーク放電が発生しずらい
ようにした。したがって、ガスレーザ媒質の流速を上げ
ずに主放電の繰り返し周波数を上げることができるか
ら、それによって高いレーザ出力を得ることができる。[Effects of the Invention] As described above, according to the present invention, the next main discharge is ignited in a state where the product generated by the main discharge remains on the downstream side of the discharge space between the cathode and the anode. Also, arc discharge was made difficult to occur in the downstream side portions of the cathode and the anode. Therefore, since the repetition frequency of the main discharge can be increased without increasing the flow velocity of the gas laser medium, a high laser output can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

第１図はこの発明の一実施例を示す主電極の断面図、第
２図は同じく主電極を制作するときの説明図、第３図は
レーザ出力と主放電の繰り返し周波数との関係の説明
図、第４図はこの発明の他の実施例を示す主電極の断面
図、第５図はガスレーザ装置の一般的な構成図、第６図
は従来の主電極の断面図である。 １……レーザ管、11……高圧電源、12……送風機、21…
…主電極、22……陰極、23……陽極。FIG. 1 is a cross-sectional view of a main electrode showing an embodiment of the present invention, FIG. 2 is an explanatory view of manufacturing the same main electrode, and FIG. 3 is an explanation of the relationship between laser output and main discharge repetition frequency. FIG. 4 is a sectional view of a main electrode showing another embodiment of the present invention, FIG. 5 is a general configuration diagram of a gas laser device, and FIG. 6 is a sectional view of a conventional main electrode. 1 ... Laser tube, 11 ... High-voltage power supply, 12 ... Blower, 21 ...
… Main electrode, 22 …… Cathode, 23 …… Anode.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項１】ガスレーザ媒質が封入されたレーザ管と、
光軸方向に沿う一方の両エッジ部が所定の関数曲線に形
成された一対の板状体からなり上記レーザ管内に対向し
て配設された陰極と陽極とからなる主電極と、この主電
極に電気エネルギを供給して上記陰極と陽極との間に主
放電を発生させる高圧電源と、上記ガスレーザ媒質を上
記陰極と陽極との間の放電空間部に循環させる送風手段
とを具備し、上記陰極と陽極とは、これら電極間に発生
する主放電の放電幅が、その放電の電界強度が最大とな
る放電中心から上記ガスレーザ媒質の流れ方向下流側の
方が上流側よりも小さくなる断面形状に設定されている
ことを特徴とするガスレーザ装置。1. A laser tube in which a gas laser medium is enclosed,
A main electrode composed of a pair of plate-shaped members each having one of both edge portions along the optical axis direction formed in a predetermined function curve, the main electrode including a cathode and an anode arranged facing each other in the laser tube, and the main electrode. A high-voltage power source for supplying main electric energy to generate a main discharge between the cathode and the anode, and a blowing unit for circulating the gas laser medium in a discharge space between the cathode and the anode. The cross-sectional shape of the cathode and the anode is such that the discharge width of the main discharge generated between these electrodes is smaller on the downstream side in the flow direction of the gas laser medium than on the upstream side from the discharge center where the electric field strength of the discharge is maximum. A gas laser device characterized by being set to.
JP23989189A 1989-09-18 1989-09-18 Gas laser device Expired - Fee Related JP2680441B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23989189A JP2680441B2 (en) 1989-09-18 1989-09-18 Gas laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23989189A JP2680441B2 (en) 1989-09-18 1989-09-18 Gas laser device

Publications (2)

Publication Number Publication Date
JPH03102884A JPH03102884A (en) 1991-04-30
JP2680441B2 true JP2680441B2 (en) 1997-11-19

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JP23989189A Expired - Fee Related JP2680441B2 (en) 1989-09-18 1989-09-18 Gas laser device

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WO2015125286A1 (en) * 2014-02-21 2015-08-27 ギガフォトン株式会社 Laser chamber

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JPH03102884A (en) 1991-04-30

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