JPS62111490A - Excimer laser apparatus - Google Patents

Excimer laser apparatus

Info

Publication number
JPS62111490A
JPS62111490A JP25135985A JP25135985A JPS62111490A JP S62111490 A JPS62111490 A JP S62111490A JP 25135985 A JP25135985 A JP 25135985A JP 25135985 A JP25135985 A JP 25135985A JP S62111490 A JPS62111490 A JP S62111490A
Authority
JP
Japan
Prior art keywords
discharge
light
ionization
main discharge
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25135985A
Other languages
Japanese (ja)
Other versions
JPH0573073B2 (en
Inventor
Naoya Horiuchi
直也 堀内
Takuhiro Ono
小野 拓弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP25135985A priority Critical patent/JPS62111490A/en
Publication of JPS62111490A publication Critical patent/JPS62111490A/en
Publication of JPH0573073B2 publication Critical patent/JPH0573073B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Lasers (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)

Abstract

PURPOSE:To obtain stable glow discharge even by less preliminary discharge, by forming UV light which is generated by the preliminary discharge, into approximately parallel beams by parabola reflecting mirrors, passing the beams in a main discharge region, and yielding ionization so that the most of the UV light contribute to the ionization of the main discharge region. CONSTITUTION:Main discharge in an eximer laser apparatus is performed between main discharge electrodes 1 and 2 to form a glow region 3. Meanwhile, UV light 6 is yielded between preliminary discharge electrodes 4 and 5 by preliminary ionization. The UV light 6 is formed into parallel beams 11 by parabola reflecting mirrors 9, which are provided behind the light. The beams pass the glow region 3, which is the main discharge region. Then ionization is yielded in the glow region 3 and a large amount of electrons are generated. Thus the stable glow discharge can be obtained, and the laser output is increased. When the parabola reflecting mirror 9 is made to turn around a supporting post 10, the UV light beams 11 are adjusted so that they are located at desirable positions between the main electrodes 1 and 2. The main discharge is carried out along the entire length between the main discharge electrodes 1 and 2.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は希カスハライド放電励起を利用したエキシマレ
ーザ装置に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an excimer laser device using diluted casshalide discharge excitation.

従来の技術 エキシマレーザは紫外線を放射するレー廿装置で、半導
体プロセス、化学工業、医療、エネルギー分野などへの
応用展開が期待されている。
Excimer laser is a laser device that emits ultraviolet light, and is expected to find applications in semiconductor processing, chemical industry, medical care, and energy fields.

エキシマレーザはレーザ上準位寿命が約1我5と短いこ
とと、クロー放電の安定期間が負性イオンの形成によっ
て安定化に寄与するハロケン分子の枯渇により高々10
00.Sと短いために、立上り約1O−rLs、パルス
巾数10YLSの短パルス放電励起を必要占する。とこ
ろがこの様な短時間のうちには2次宙、子の発生やアバ
ランシェ雷、離など通常の正規クロー放電形成のために
要求される素現象が発生し得ないので、クロー放電を行
わせる為には紫外光(UV光)、コロナ、X線なとを用
いた予備電離が必要である。
The excimer laser has a short laser upper level lifetime of approximately 1 to 5 years, and the stable period of claw discharge is at most 10 to 10 years due to the depletion of halogen molecules that contribute to stabilization through the formation of negative ions.
00. Since the discharge voltage is short, a short pulse discharge excitation with a rise time of about 1 O-rLs and a pulse width of 10YLS is required. However, in such a short time, the elementary phenomena required for normal claw discharge formation, such as the generation of secondary space, child generation, avalanche lightning, and separation, cannot occur, so in order to cause claw discharge to occur, This requires preliminary ionization using ultraviolet light (UV light), corona, X-rays, etc.

従来のUV光子備電離法は、主放電電橙の片側にLIV
光子備電離用電極を配置し、主放電より一定時間前に予
備電離用放電を行わせる。この方法は2度の放電を行わ
せるので二重放電法と呼ばれる。予備電離用電極にも、
切れ目のある電極に沿って直列に沿面放電を行わせる直
列式とマルチビンを並列に配置した並列式のものとがあ
る。
The conventional UV photon ionization method uses LIV on one side of the main discharge
A photon ionization electrode is arranged, and a preliminary ionization discharge is performed a certain period of time before the main discharge. This method is called a double discharge method because it causes two discharges. Also for pre-ionization electrodes,
There are two types: a series type in which creeping discharge occurs in series along a cut electrode, and a parallel type in which multi-bins are arranged in parallel.

発明が解決しようとする問題点 予備電離方法においては、予備電離の量が少いと主放電
は不均一なアークになりやすいが、ある閾値を越えてい
れば安定なりロー放電が得られ、その閾値は約10 電
子/ccとされている。しかし従来の方法では十分な予
備電離量が得られない。
Problems to be Solved by the Invention In the pre-ionization method, if the amount of pre-ionization is small, the main discharge tends to become an uneven arc, but if it exceeds a certain threshold, a stable or low discharge can be obtained; is estimated to be about 10 electrons/cc. However, with conventional methods, a sufficient amount of pre-ionization cannot be obtained.

また、主放電は前記した様に数10*s(!:云う極め
て短時間の内に行われるので放電中に電子のドリフトが
生ずる事は考えられない。したがって、予備電離による
電離電子の発生が主放電にとって最も望ましい所に行わ
れる事が必要である。ところが従来の方法ではせいぜい
予備電離電極の配置によってしか、この位置の適正化を
行うことは出来ず、十分な位置制御をすることができな
い。
In addition, as mentioned above, the main discharge occurs within an extremely short period of several tens of seconds (!), so it is unlikely that electron drift will occur during the discharge.Therefore, the generation of ionized electrons due to pre-ionization is unlikely. It is necessary for the main discharge to occur at the most desirable location.However, with conventional methods, this position can only be optimized by arranging the pre-ionization electrode, and sufficient position control cannot be achieved. .

本発明は以上の点に鑑みてなされたもので、予備電離効
果を促進させて多量の電離電子を発生させ、レーザ゛出
力の増大を図ることを目的とするものである。
The present invention has been made in view of the above points, and an object of the present invention is to increase the laser output by promoting the pre-ionization effect and generating a large amount of ionized electrons.

問題点を解決するための手段 本発明は予備放電により発生させたUV光をパラボラ反
射鏡によりほぼ平行ビームにし、これを主放電領域内に
通過させ、そこに電離を発生させるようにしたエキシマ
レーザ装置である。
Means for Solving the Problems The present invention provides an excimer laser in which UV light generated by preliminary discharge is made into a nearly parallel beam using a parabolic reflector, and the beam is passed into the main discharge region to generate ionization there. It is a device.

作    用 上記構成によれば、予備放電によって発生したUV光の
大半が主放電領域内の電離に寄与し、小さい予備放電に
よっても安定なグロー放電を得ることができ、エキシマ
レーザ出力が増大する。
Operation According to the above configuration, most of the UV light generated by the preliminary discharge contributes to ionization in the main discharge region, and a stable glow discharge can be obtained even with a small preliminary discharge, increasing the excimer laser output.

実施例 以下本発明の実施例について、図面とともに詳細に説明
する。
EXAMPLES Hereinafter, examples of the present invention will be described in detail with reference to the drawings.

第1図は本発明によるエキシマレーザ装置の実施例を示
す斜視図、第2図はそのA−A’i断面図である。図に
おいて、主放電は主放電電極1及び2間で行われグロー
領域3を生ずる。一方予備電離は予備放電電極4及び5
間で発生し、UV光6を発生する。予備放電電極4,5
はレーザ管の長さ方向に数10対設けられ、長さ方向の
各所においてUV光6を発生させる。7及び8は電極4
及び5へのリードを兼ねた支持体である。予備電離6て
発生するUV光6はその背後に設置したパラボラ反射鏡
9により平行ビーム11にされ、主放電電極1,2間の
主放電領域であるグロー領域3を通過する。このとき、
グロー領域3に電離を発生させ多量の電離電子を発生さ
せることができる。
FIG. 1 is a perspective view showing an embodiment of an excimer laser device according to the present invention, and FIG. 2 is a sectional view taken along line A-A'i. In the figure, a main discharge takes place between main discharge electrodes 1 and 2, producing a glow region 3. On the other hand, pre-ionization is carried out by pre-discharge electrodes 4 and 5.
UV light 6 is generated. Preliminary discharge electrodes 4, 5
are provided in tens of pairs along the length of the laser tube, and generate UV light 6 at various locations along the length. 7 and 8 are electrodes 4
and a support that also serves as a lead to 5. The UV light 6 generated during pre-ionization 6 is converted into a parallel beam 11 by a parabolic reflector 9 installed behind it, and passes through a glow region 3 which is a main discharge region between main discharge electrodes 1 and 2. At this time,
Ionization can be generated in the glow region 3 to generate a large amount of ionized electrons.

この結果安定なグロー放電を得ることができ、レーサ出
力を増大させることができる。パラボラ反射鏡9は支持
柱10のまわりに回転しうる様にしておくとUV光ビー
ム11は主電極1及び2間の望ましい位置に来る様調整
することができる。実際にはレーザ出力が最大になる様
にこの回転量を実験的に調整してやればよい。12は出
力結合鏡、13は全反射鏡、14は出力ビームである。
As a result, stable glow discharge can be obtained and laser output can be increased. If the parabolic reflector 9 is rotatable around the support column 10, the UV light beam 11 can be adjusted to a desired position between the main electrodes 1 and 2. In practice, this amount of rotation may be adjusted experimentally so that the laser output is maximized. 12 is an output coupling mirror, 13 is a total reflection mirror, and 14 is an output beam.

なお、実際のレーデでは真空容器、送風装置、冷却装置
等のその他の部品や装置が必要であるが、それらはエキ
シマレーザの分野では既知の技術であるし、本発明での
本質的な部分でないので図示を省略した。
In addition, other parts and devices such as a vacuum container, a blower device, and a cooling device are required in the actual LED, but these are known technologies in the field of excimer lasers and are not essential parts of the present invention. Therefore, illustration is omitted.

上記構成において、主放電電極1,2間の全長域にわた
って主放電が行なわれる。一方、各予備電離電極4,5
間に発生したUV光6はパラボラ反射鏡9によって平行
ビーム11となって主放電電極1.2間の全長域にわた
る放電領域を通過する。この通過位置はパラボラ反射鏡
9を支持柱1゜のまわりに回転させることにより最大出
力が得られる適正位置を通過するよう調整することがで
きる。
In the above configuration, the main discharge is performed over the entire length region between the main discharge electrodes 1 and 2. On the other hand, each pre-ionization electrode 4, 5
The UV light 6 generated in between is turned into a parallel beam 11 by a parabolic reflector 9 and passes through a discharge region spanning the entire length between the main discharge electrodes 1.2. This passing position can be adjusted by rotating the parabolic reflector 9 around the support column 1° so that the parabolic reflector 9 passes through an appropriate position where the maximum output can be obtained.

第3図は第1図に示した予備電離用放電電極4゜5およ
びパラボラ反射鏡9を主放電部をはさんで左右両側に対
称的に配置した実施例であり、予備電離の効果が一層大
きくなる。各部の構成および動作は第1図、第2図の場
合と本質的に同一であるので同一符号を付し説明を省略
する。
FIG. 3 shows an embodiment in which the pre-ionization discharge electrode 4°5 and the parabolic reflector 9 shown in FIG. growing. The configuration and operation of each part are essentially the same as those in FIGS. 1 and 2, so the same reference numerals are given and explanations will be omitted.

発明の効果 以上のように、本発明はエキシマレーザ装置の主放電極
間の適正位置に予備放電にょるUV光をパラボラ反射鏡
によって平行ビームきして通過させるようにしたもので
、予備電離効果を促進させて安定なりロー放電を行なわ
せ、レーサ出力の増大化を図るとともに、予備電離用放
電電力の低減を実現することができる。
Effects of the Invention As described above, the present invention is configured to pass UV light from a pre-discharge as a parallel beam using a parabolic reflector at an appropriate position between the main discharge electrodes of an excimer laser device, thereby reducing the pre-ionization effect. By promoting stable low discharge, it is possible to increase the laser output and reduce the pre-ionization discharge power.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明によるエキシマレーザ装置の実施例にお
ける要部斜視図、第2図は第1図の八−A/祿断面図、
第3図は本発明によるエキシマレーザ装置の他の実施例
を示す要部断面側面図である。 1.2・・・主放電電極、3・・・主放電グロー領域、
4.5・・・予備電離用放電電極、6・・・UV光、9
・・・パラボラ反射鏡、11・・・平行ビーム。 代理人の氏名 弁理士 中 尾 敏 男 はか1名第1
図 14出hc’−ム 第2図 第3図
FIG. 1 is a perspective view of a main part of an embodiment of an excimer laser device according to the present invention, FIG. 2 is a sectional view taken along line 8-A in FIG.
FIG. 3 is a sectional side view of main parts showing another embodiment of the excimer laser device according to the present invention. 1.2... Main discharge electrode, 3... Main discharge glow area,
4.5... Discharge electrode for preliminary ionization, 6... UV light, 9
...parabolic reflector, 11...parallel beam. Name of agent: Patent attorney Toshio Nakao (1st person)
Fig. 14 hc'-m Fig. 2 Fig. 3

Claims (3)

【特許請求の範囲】[Claims] (1)主放電電極と、その長さ方向に複数個配列された
予備放電電極を備え、予備放電によって発生した紫外光
をパラボラ反射鏡によって平行ビームとし、主放電電極
間を通過させることを特徴とするエキシマレーザ装置。
(1) Features include a main discharge electrode and a plurality of preliminary discharge electrodes arranged in the length direction thereof, and the ultraviolet light generated by the preliminary discharge is turned into a parallel beam by a parabolic reflector and passed between the main discharge electrodes. excimer laser device.
(2)パラボラ反射鏡が主放電電極の長さ方向に平行な
軸に対して回転可能である特許請求の範囲第1項記載の
エキシマレーザ装置。
(2) The excimer laser device according to claim 1, wherein the parabolic reflector is rotatable about an axis parallel to the length direction of the main discharge electrode.
(3)予備放電電極とパラボラ反射鏡が主放電電極の両
側に対称的に配置された特許請求の範囲第1項記載のエ
キシマレーザ装置。
(3) The excimer laser device according to claim 1, wherein the preliminary discharge electrode and the parabolic reflector are arranged symmetrically on both sides of the main discharge electrode.
JP25135985A 1985-11-08 1985-11-08 Excimer laser apparatus Granted JPS62111490A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25135985A JPS62111490A (en) 1985-11-08 1985-11-08 Excimer laser apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25135985A JPS62111490A (en) 1985-11-08 1985-11-08 Excimer laser apparatus

Publications (2)

Publication Number Publication Date
JPS62111490A true JPS62111490A (en) 1987-05-22
JPH0573073B2 JPH0573073B2 (en) 1993-10-13

Family

ID=17221652

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25135985A Granted JPS62111490A (en) 1985-11-08 1985-11-08 Excimer laser apparatus

Country Status (1)

Country Link
JP (1) JPS62111490A (en)

Also Published As

Publication number Publication date
JPH0573073B2 (en) 1993-10-13

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