JPH02224285A - Pulse gas laser oscillation apparatus - Google Patents
Pulse gas laser oscillation apparatusInfo
- Publication number
- JPH02224285A JPH02224285A JP4293189A JP4293189A JPH02224285A JP H02224285 A JPH02224285 A JP H02224285A JP 4293189 A JP4293189 A JP 4293189A JP 4293189 A JP4293189 A JP 4293189A JP H02224285 A JPH02224285 A JP H02224285A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- discharge
- anode
- discharge surface
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000010355 oscillation Effects 0.000 title claims description 9
- 239000003990 capacitor Substances 0.000 claims description 3
- 230000001788 irregular Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 2
- 238000000752 ionisation method Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】 〔発明の目的〕 （産業上の利用分野） 本発明はガスレーザ発振装置に関する。[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention relates to a gas laser oscillation device.
（従来の技術）
ＴＥＡＣＯレーザ、エキシマレーザ等のパルスガスレー
ザ発振装置では安定な主放電を得るために放電空間を予
備電離する方式が採られている。この予備電離方式には
コロナ放電、紫外線あるいはＸ線等が利用されている。(Prior Art) Pulsed gas laser oscillators such as TEACO lasers and excimer lasers employ a method of pre-ionizing a discharge space in order to obtain a stable main discharge. This pre-ionization method uses corona discharge, ultraviolet rays, X-rays, etc.
上記紫外線の予備電離方式を利用したガスレーザ発振装
置の一つとして第３図に示す特開昭６３−２２８７７４
号公報に開示されたものが知られている。すなわち、図
中（１）は陰極、（２）は陽極、（３）は陰極（１）お
よび陽極（２）を保持する保持板、（４ａ） 、 （４
ｂ）は予備電離のための複数対のピン電極、（５）は陰
極（１）側になる一方のピン電極（４ａ）に設けられた
ピーキングコンデンサ、（Ｂ）は共振器の一方をなす高
反射鏡、（７）は共振器の他方をなす出力鏡であり、共
振器以外の各要素はガスレーザ媒質が所定圧力で封入さ
れた図示せぬ気密容器内に設けられている。上記ピン電
極（４ａ） 、 （４ｂ）は共振軸方向に沿って陰極（
１）および陽極（２）の両側にほぼ同ピツチで設けられ
ている。また、ピン電極（４ａ） 、 （４ｂ）のギャ
ップ（８）は陰極（１）、陽極（２）の放電面から等距
離になる放電空間（９）のほぼ中央部分に位置させたも
のと、陰極（１）寄りに位置させたものとが共振軸方向
に沿って交互に配設されている。JP-A-63-228774 shown in FIG. 3 is one of the gas laser oscillation devices using the above ultraviolet pre-ionization method
The one disclosed in the above publication is known. That is, in the figure, (1) is the cathode, (2) is the anode, (3) is the holding plate that holds the cathode (1) and the anode (2), (4a), (4
b) shows multiple pairs of pin electrodes for pre-ionization; (5) shows a peaking capacitor provided on one pin electrode (4a) on the cathode (1) side; The reflecting mirror (7) is an output mirror forming the other side of the resonator, and each element other than the resonator is provided in an airtight container (not shown) in which a gas laser medium is sealed at a predetermined pressure. The pin electrodes (4a) and (4b) are connected to the cathode (4a) and (4b) along the resonance axis direction.
1) and anode (2) at approximately the same pitch. In addition, the gap (8) between the pin electrodes (4a) and (4b) is located approximately at the center of the discharge space (9) equidistant from the discharge surfaces of the cathode (1) and anode (2); Those located closer to the cathode (1) are arranged alternately along the resonance axis direction.
（発明が解決しようとする課題）
上記従来の構成では陽極（２）側の放電空間の予備電離
が弱くなる欠点があった。また、陰極（１）寄りにギャ
ップ（８）を位置させたことから、各ギャップ（８）か
らの紫外線の内、放電面に平行な紫外線（１０）は第４
図に示すように、陰極（１）自体に直・接照射するので
、陰極（１）に直接照射した分だけ陰極（１）の放電面
を照射する紫外線の照射パワーが低くなる問題があった
。本発明はこの様な問題に対処するためになされたもの
で、より安定な主放電面が得られるガスレーザ発振装置
を提供することを目的とする。(Problems to be Solved by the Invention) The above-mentioned conventional configuration has a drawback that preliminary ionization in the discharge space on the anode (2) side is weak. In addition, since the gap (8) is located closer to the cathode (1), among the ultraviolet rays from each gap (8), the ultraviolet ray (10) parallel to the discharge surface is in the fourth
As shown in the figure, since the cathode (1) itself is directly irradiated, there was a problem in that the irradiation power of the ultraviolet rays that irradiated the discharge surface of the cathode (1) was reduced by the amount of direct irradiation on the cathode (1). . The present invention was made in order to deal with such problems, and an object of the present invention is to provide a gas laser oscillation device that can obtain a more stable main discharge surface.
［発明の構成］
（課題を解決するための手段と作用）
上記課題を解決するためにガスレーザ媒質が所定圧力に
保たれたレーザ管と、このレーザ管内に所定の放電空間
をおいて対向配置された陰極および陽極と、上記陰極の
放電面の幅方向側部に長手方向に沿って所定間隔で設け
られた複数のピン電極対と、これらピン電極対に設けら
れた複数のピーキングコンデンサとを具備するガスレー
ザ発振装置において、上記複数のピン電極対はそのギャ
ップを上記陰極および陽極の放電面からほぼ等距離にな
る上記放電空間の中央部と上記陰極の放電面との中間に
位置する第１のピン電極対と、上記放電空間の中央部と
上記陽極の放電面との中間に位置する第２のピン電極対
とを備えた構成とし、放電面に予備電離が均一に作用す
る。[Structure of the invention] (Means and effects for solving the problem) In order to solve the above problem, a laser tube in which a gas laser medium is maintained at a predetermined pressure, and a laser tube in which a gas laser medium is disposed facing each other with a predetermined discharge space therebetween. a cathode and an anode, a plurality of pin electrode pairs provided at predetermined intervals along the longitudinal direction on the widthwise sides of the discharge surface of the cathode, and a plurality of peaking capacitors provided on these pin electrode pairs. In the gas laser oscillation device, the plurality of pin electrode pairs have a gap located between the central part of the discharge space and the discharge surface of the cathode, which is approximately equidistant from the discharge surfaces of the cathode and anode. The configuration includes a pair of pin electrodes and a second pair of pin electrodes located between the center of the discharge space and the discharge surface of the anode, so that pre-ionization acts uniformly on the discharge surface.
（実施例） 以下、実施例を示す図面に基づいて本発明を説明する。(Example) EMBODIMENT OF THE INVENTION Hereinafter, the present invention will be described based on drawings showing examples.
第３図と共通する部分には同一符号を付して説明する。Components common to those in FIG. 3 will be described with the same reference numerals.
第１図は本発明の一実施例で、従来と異なる点は放電空
間（９）の中央部を通る軸。FIG. 1 shows an embodiment of the present invention, which differs from the conventional one in that the axis passes through the center of the discharge space (9).
線（１５）と陰極（１）の放電面（１６）との中間部に
ギャップ（１４ａ）を位置させた第１のピン電極（１７
ａ） 、 （１７ｂ）と、軸線（１５）と陽極（２）の
放電面（１８）との中間部、すなわち、軸線（１５）を
中心にギャップ（１４ａ）と対称にギャップ（１４ｂ）
を位置させた第２のピン電極（１９ａ） 、 （１９ｂ
）とを共振軸方向に沿って交互に配設したことにある。A first pin electrode (17) with a gap (14a) located midway between the wire (15) and the discharge surface (16) of the cathode (1).
a), (17b) and a gap (14b) symmetrical to the gap (14a) about the intermediate part between the axis (15) and the discharge surface (18) of the anode (2), that is, the axis (15).
The second pin electrodes (19a) and (19b
) are arranged alternately along the resonance axis direction.
上記の構成によって第２図に示すように、スパークする
ギャップの位置が横断面方向でみると、陰極（１）、陽
極（２）の片側ずつ二か所に設けられたことになり、し
かも各ギャップ（１４ａ） 、 （１４ｂ）からの紫外
線（２０ａ） 、 （２０ｂ）の内、平行に出る紫外線
が放電空間（９）に進む位置となる。このことから、陽
極（２）側のギャップ（１４ｂ）は第３図に示した従来
例と比べて陰極（１）の放電面（１Ｂ）に対してより離
れた位置となるため、放電面（１６）は急角度の条件で
照射される。このことは放電面（１８）においても同様
である。With the above configuration, as shown in Figure 2, when viewed in the cross-sectional direction, the spark gaps are provided at two locations, one on each side of the cathode (1) and the anode (2). Among the ultraviolet rays (20a) and (20b) from the gaps (14a) and (14b), the ultraviolet rays emitted in parallel are at a position where they proceed to the discharge space (9). From this, the gap (14b) on the anode (2) side is located further away from the discharge surface (1B) of the cathode (1) compared to the conventional example shown in FIG. 16) is irradiated at a steep angle. This also applies to the discharge surface (18).
［発明の効果］
放電空間内に紫外線が均等に照射されるとともに、放電
面へ急角度の入射によって放電面に凹凸がある場合でも
、凹部内まで紫外線が照射され、特に陰極（１）表面か
ら光電子放出が促進され、陰極（ｌ）、陽極（２）両方
の放電面全体からより均一に電子が放出される。このた
め、主放電がより安定するほか、放電空間の均一主放電
が達成され、出力鏡（７）から放出するレーザ光（Ｌ）
の強度分布が平坦化し、高反射鏡（６）、出力鏡（７）
への局部的な強い発振がなくなるので、これら鏡への熱
影響が極めて小さくなり、一方では装置の高寿命化、他
方では大電力の投入を可能ならしめて高出力化が達成で
きた。また強度分布の平坦化はたとえば半導体リソグラ
フィ、レーザマーカ等の加工分野においては、強度分布
を平坦化する光学系が不要となり、装置の小形化を計る
ことができた。[Effects of the Invention] Ultraviolet rays are uniformly irradiated within the discharge space, and even if the discharge surface is uneven due to a steep angle of incidence on the discharge surface, the ultraviolet rays are irradiated to the inside of the recesses, especially from the surface of the cathode (1). Photoelectron emission is promoted, and electrons are emitted more uniformly from the entire discharge surfaces of both the cathode (l) and anode (2). Therefore, in addition to making the main discharge more stable, a uniform main discharge in the discharge space is achieved, and the laser light (L) emitted from the output mirror (7)
The intensity distribution of the high reflector (6) and output mirror (7) becomes flat.
Since strong local oscillations are eliminated, the thermal influence on these mirrors becomes extremely small, making it possible to extend the life of the device on the one hand, and on the other hand, to achieve high output by making it possible to input large amounts of power. Furthermore, the flattening of the intensity distribution eliminates the need for an optical system for flattening the intensity distribution in processing fields such as semiconductor lithography and laser markers, making it possible to downsize the apparatus.
第１図は本発明の一実施例を示す側面図、第２図は第１
図中の■−■線部分の断面図、第３図は従来例を示す側
面図、第４図は第３図中のＩＶ−ＩＶ線部分における拡
大断面模式図である。
（１）・・・陰極
（２）・・・陽極FIG. 1 is a side view showing one embodiment of the present invention, and FIG. 2 is a side view showing one embodiment of the present invention.
3 is a side view showing a conventional example, and FIG. 4 is an enlarged schematic sectional view taken along line IV--IV in FIG. 3. (1)...Cathode (2)...Anode
Claims (2)
、このレーザ管内に所定の放電空間をおいて対向配置さ
れた陰極および陽極と、上記陰極の放電面の幅方向側部
に長手方向に沿って所定間隔で設けられた複数のピン電
極対と、これらピン電極対に設けられた複数のピーキン
グコンデンサとを具備するガスレーザ発振装置において
、上記複数のピン電極対はそのギャップを上記陰極およ
び陽極の放電面からほぼ等距離になる上記放電空間の中
央部を中心にして上記陰極側になる第１のピン電極対と
、上記陽極側になる第２のピン電極対とを備えたことを
特徴とするパルスガスレーザ発振装置。(1) A laser tube in which a gas laser medium is maintained at a predetermined pressure, a cathode and an anode that are arranged facing each other with a predetermined discharge space in the laser tube, and a longitudinal side of the discharge surface of the cathode in the width direction. In a gas laser oscillation device comprising a plurality of pin electrode pairs provided at predetermined intervals along the line and a plurality of peaking capacitors provided on the pin electrode pairs, the plurality of pin electrode pairs connect the gap between the cathode and the anode. It is characterized by comprising a first pair of pin electrodes located on the cathode side and a second pair of pin electrodes located on the anode side with the center of the discharge space approximately equidistant from the discharge surface. Pulsed gas laser oscillation device.
一対を陰極および陽極の長手方向に沿って交互に配設し
た請求項１項記載のパルスガスレーザ発振装置。(2) The pulsed gas laser oscillation device according to claim 1, wherein at least one pair of the first pin electrode pair and the second pin electrode pair are arranged alternately along the longitudinal direction of the cathode and the anode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4293189A JPH02224285A (en) | 1989-02-27 | 1989-02-27 | Pulse gas laser oscillation apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4293189A JPH02224285A (en) | 1989-02-27 | 1989-02-27 | Pulse gas laser oscillation apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02224285A true JPH02224285A (en) | 1990-09-06 |
Family
ID=12649762
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4293189A Pending JPH02224285A (en) | 1989-02-27 | 1989-02-27 | Pulse gas laser oscillation apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02224285A (en) |
-
1989
- 1989-02-27 JP JP4293189A patent/JPH02224285A/en active Pending
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