JPS62105983A - 無機質化粧板の製造方法 - Google Patents
無機質化粧板の製造方法Info
- Publication number
- JPS62105983A JPS62105983A JP24533685A JP24533685A JPS62105983A JP S62105983 A JPS62105983 A JP S62105983A JP 24533685 A JP24533685 A JP 24533685A JP 24533685 A JP24533685 A JP 24533685A JP S62105983 A JPS62105983 A JP S62105983A
- Authority
- JP
- Japan
- Prior art keywords
- inorganic
- paint
- alkali metal
- lithium
- aqueous solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Aftertreatments Of Artificial And Natural Stones (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24533685A JPS62105983A (ja) | 1985-10-31 | 1985-10-31 | 無機質化粧板の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24533685A JPS62105983A (ja) | 1985-10-31 | 1985-10-31 | 無機質化粧板の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62105983A true JPS62105983A (ja) | 1987-05-16 |
| JPH0223509B2 JPH0223509B2 (enExample) | 1990-05-24 |
Family
ID=17132148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24533685A Granted JPS62105983A (ja) | 1985-10-31 | 1985-10-31 | 無機質化粧板の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62105983A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8480068B2 (en) | 2010-01-29 | 2013-07-09 | Kabushiki Kaisha Tokyo Kikai Seisakusho | Newspaper production apparatus |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5551780A (en) * | 1978-10-07 | 1980-04-15 | Matsushita Electric Works Ltd | Method of painting porous substrate |
| JPS5616560A (en) * | 1979-07-20 | 1981-02-17 | Mazda Motor Corp | Coating agent for corrosion resistance at high temperature |
-
1985
- 1985-10-31 JP JP24533685A patent/JPS62105983A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5551780A (en) * | 1978-10-07 | 1980-04-15 | Matsushita Electric Works Ltd | Method of painting porous substrate |
| JPS5616560A (en) * | 1979-07-20 | 1981-02-17 | Mazda Motor Corp | Coating agent for corrosion resistance at high temperature |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8480068B2 (en) | 2010-01-29 | 2013-07-09 | Kabushiki Kaisha Tokyo Kikai Seisakusho | Newspaper production apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0223509B2 (enExample) | 1990-05-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4144074A (en) | Inorganic coating composition | |
| JPS6044145B2 (ja) | 塗被基材の珪酸塩処理 | |
| JPH0318514B2 (enExample) | ||
| JPS6140305B2 (enExample) | ||
| EP0236497B1 (en) | Coating compositions and method for improving the properties of coated substrates | |
| JPH0794619B2 (ja) | 無機質塗料組成物 | |
| JPS60135464A (ja) | 下塗りコーテイング組成物 | |
| JPS62105983A (ja) | 無機質化粧板の製造方法 | |
| EP0083867A2 (en) | Method of applying an inorganic paint | |
| JPS5927553A (ja) | 電子装置に使用される基質 | |
| JPS61192771A (ja) | 炭化ケイ素を主成分とするセラミツクコ−テイング剤 | |
| JPS63175078A (ja) | 金属表面処理組成物 | |
| JPS5995971A (ja) | 無機質塗膜の形成方法 | |
| JPS62105982A (ja) | 無機質化粧板の製法 | |
| JP3468734B2 (ja) | 無機質板および該無機質板の製造方法 | |
| JPS6111980B2 (enExample) | ||
| JPH0613110B2 (ja) | 均一塗膜の形成方法 | |
| JPS6399268A (ja) | 無機質コ−テイング被膜の高光沢化方法 | |
| JPS5829155B2 (ja) | ムキトリヨウトマクノアトシヨリホウ | |
| JPS5829154B2 (ja) | ムキトリヨウトマクノアトシヨリホウ | |
| JPS62258779A (ja) | 無機質塗膜の形成法 | |
| JPS5870867A (ja) | フツ素樹脂被覆のための下地処理方法 | |
| JPS5894499A (ja) | 筆記板 | |
| JP2001200204A (ja) | 高光沢耐熱塗料組成物とその製造方法および高光沢耐熱塗料の塗装方法ならびに高光沢耐熱塗料塗膜 | |
| CN117328058A (zh) | 一种基于冷喷涂的基体温度控制方法 |