JPS62102552A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS62102552A JPS62102552A JP60241367A JP24136785A JPS62102552A JP S62102552 A JPS62102552 A JP S62102552A JP 60241367 A JP60241367 A JP 60241367A JP 24136785 A JP24136785 A JP 24136785A JP S62102552 A JPS62102552 A JP S62102552A
- Authority
- JP
- Japan
- Prior art keywords
- wire
- semiconductor device
- copper
- bonding
- ball
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/43—Manufacturing methods
- H01L2224/438—Post-treatment of the connector
- H01L2224/43848—Thermal treatments, e.g. annealing, controlled cooling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45147—Copper (Cu) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Wire Bonding (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明は半導体のチップ電極と外部引出し用リードフレ
ームのインナーリード部とをワイヤボンディングした半
導体装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a semiconductor device in which a semiconductor chip electrode and an inner lead portion of an external lead frame are wire-bonded.
一般に、トランジスタ、ＩＣ（集積回路）、ＬＳＩ（大
規模集積回路）の如き半導体装置としては１例えｉｆ第
３図に示す構造のものが知られている。ダイフレーム１
の上に半導体チップであるペレット２をダイボンディン
グし、このペレット２の電極とリードフレーム３とをボ
ンディングワイヤ４で電気的に接続した後、これらを樹
脂５でモールディングすることにより形成される。2. Description of the Related Art Generally, semiconductor devices such as transistors, ICs (integrated circuits), and LSIs (large scale integrated circuits) have a structure shown in FIG. 3, for example. die frame 1
It is formed by die-bonding a pellet 2, which is a semiconductor chip, onto the board, electrically connecting the electrodes of the pellet 2 and a lead frame 3 with a bonding wire 4, and then molding them with a resin 5.
上記ボンディングワイヤとして、熱圧着法あるいは超音
波併用熱圧着法によりボンディングするφ２０〜１００
．の金、超音波法によりボンディングするφ２５〜５０
μｓのアルミニウム合金（ＡＱ １．Ｏｖｔ％Ｓ ｉ
、 Ａ Ｑ −１，Ｏｖｔ％Ｍｇ等）とφ１００〜５０
０−の高純度アルミニウム（９９，９９％以上）が用い
られている。The above bonding wire has a diameter of 20 to 100 and is bonded by thermocompression bonding method or ultrasonic thermocompression bonding method.
．． gold, φ25-50 bonded by ultrasonic method
μs aluminum alloy (AQ 1.Ovt%S i
, A Q -1, Ovt%Mg, etc.) and φ100~50
0- high purity aluminum (99.99% or more) is used.
現在、金線は普及タイプのＩＣやＬＳＩに用い、アルミ
ニウム線はサーディプ型またはパワートランジスタ用に
と使いわけられている。Currently, gold wires are used for popular type ICs and LSIs, and aluminum wires are used for cerdip type or power transistors.
最近、集積度の増加に伴なう多ピン化の傾向によって、
金線のコストを無視することが出来なくなっている。そ
のため、ボンディングワイヤを高価な金線から比較的安
価な銅線に変更することが検討されている。Recently, due to the trend of increasing the number of pins due to the increase in the degree of integration,
It is no longer possible to ignore the cost of gold wire. Therefore, consideration is being given to changing the bonding wire from expensive gold wire to relatively inexpensive copper wire.
銅線のボンディングボールは不活性雰囲気中で形成され
るが、ボール表面が酸化し、さらに金あるいはアルミニ
ウムに比べてボールが硬すぎるため、ボンディング時に
半導体チップの損傷あるいはボンディングの強度不足に
よるワイヤの剥離などが発生する場合がある。そこで、
この問題を解決し、期待される良好なボンディング性を
有する銅線の開発が望まれていた。Copper wire bonding balls are formed in an inert atmosphere, but because the ball surface is oxidized and the balls are too hard compared to gold or aluminum, the semiconductor chip may be damaged during bonding or the wire may peel off due to insufficient bonding strength. etc. may occur. Therefore,
It has been desired to develop a copper wire that solves this problem and has the expected good bonding properties.
本発明はこのような問題を解決するためになされたもの
で、優れたボンディング性を有した銅ワイヤを用いた半
導体装置を提供することを目的とする。The present invention was made to solve such problems, and an object of the present invention is to provide a semiconductor device using a copper wire having excellent bonding properties.
本発明は半導体チップとの接続にワイヤボンディングを
用いた半導体装置において、前記ワイヤボンディング素
材として、硼素（Ｂ）を５〜３２５ｗｔ。The present invention provides a semiconductor device using wire bonding for connection with a semiconductor chip, in which 5 to 325 wt of boron (B) is used as the wire bonding material.
ｐｐｍ含有し、残部鋼からなる線材を用いることを特徴
とする半導体装置である。This semiconductor device is characterized in that it uses a wire rod containing ppm and the remainder made of steel.
本発明者等はＡｒガス等の不活性ガス中での放電あるい
は酸水素炎等により形成された銅ボールの硬化は、銅線
に固溶しているＳがボール表面に濃化偏析するためであ
ることを見出した。さらに研究を進めた結果、微量のＢ
の添加が、このＳの銅ボール表面での濃化偏析防止に有
効であることを見出したのである。The present inventors believe that the hardening of copper balls formed by electric discharge in an inert gas such as Ar gas or by oxyhydrogen flame is due to the fact that S dissolved in the copper wire becomes concentrated and segregated on the ball surface. I discovered something. As a result of further research, trace amounts of B
It was discovered that the addition of S is effective in preventing the concentration and segregation of S on the surface of the copper ball.
この硼素（Ｂ）は微量の添加でＳの銅ボール表面での濃
化偏析を防止し、銅ボールの硬化を防止する効果を発揮
するが、あまり多いと鋼中に固溶して強度が増大し、銅
ボールが硬化してボンディング後の接合強度が低下して
しまう、したがって、５〜３２５１ｔ、ｐｐｍとする。When added in a small amount, boron (B) is effective in preventing the concentration and segregation of S on the surface of the copper ball and preventing the hardening of the copper ball, but if too much boron (B) is added, it dissolves in the steel and increases its strength. However, the copper ball hardens and the bonding strength after bonding decreases.Therefore, it is set at 5 to 3251 t, ppm.
さらには、 １００−２５（１７ｔ、ｐｐｍが好ましい
。Furthermore, 100-25 (17t, ppm is preferable).
またＢに加え、さらにＶ、Ｔｉ、Ｚｒ、Ｃｒ、Ｍｎ。In addition to B, V, Ti, Zr, Cr, and Mn.
Ｆｅ、Ｈｆ等を加えることもできる。Ｖ、Ｔｉ、Ｚｒ。Fe, Hf, etc. can also be added. V, Ti, Zr.
Ｃｒ、Ｍｎ、Ｆｅ、Ｈｆ等の添加も同様に銅ボールの硬
化を防止することができる。しかしながら、余り大量の
添加はかえって銅ボールを硬化させてしまうため、２０
１ｔ、ｐｐｍ以下が好ましい、添加する場合は、５ｗｔ
．ｐｐｍ以上程度からその効果があられれる。Addition of Cr, Mn, Fe, Hf, etc. can similarly prevent hardening of the copper ball. However, adding too much will actually harden the copper ball, so 20
1t, ppm or less is preferable, if added, 5wt
．． The effect can be seen at levels above ppm.
また本発明に係る線材は、残部が銅であるが、Ａｇ＋
Ｎｉｌ Ａｓ、 Ｓｎ、 Ｓｘｇ ｓｂ、 Ｔａｇ Ｐ
ｂｙ Ｂｉ等の不可避的不純物を除くものではない。Further, the wire according to the present invention has a balance of copper, but Ag+
Nil As, Sn, Sxg sb, Tag P
It does not exclude inevitable impurities such as by Bi.
以上説明したように本発明によれば、銅ボール表面にＳ
が濃化偏析するのを防止することができるため、接合強
度が高く、優れたボンディング性を有する半導体装置を
得ることができる。As explained above, according to the present invention, S
Since it is possible to prevent concentration and segregation of , it is possible to obtain a semiconductor device with high bonding strength and excellent bonding properties.
以下に本発明の詳細な説明する。 The present invention will be explained in detail below.
（実施例１）
純度９９．９９ｗｔ、％の無酸素鋼に硼素を添加した試
料を真空溶解により作製した。φ２０面の各鋳塊を固剤
し、１ｍｍまで冷間引抜き後、４００℃でｌｈｒ焼鈍し
、引抜き加工によりφ２５μｓの細線とした。次に線材
を３００℃で等温焼鈍を行ない、試料とした。(Example 1) A sample in which boron was added to oxygen-free steel with a purity of 99.99wt% was prepared by vacuum melting. Each ingot with a diameter of 20 mm was hardened, cold drawn to a thickness of 1 mm, annealed at 400° C. for 1 hour, and drawn into a thin wire of 25 μs in diameter. Next, the wire rod was subjected to isothermal annealing at 300° C. and used as a sample.
得られた試料をＡｒガス中で放電により溶融してボール
を形成し、ボール断面の硬さをヌープ硬度計で測定した
。その結果を第１図に示す。第１図から明らかなように
、本発明に規定する範囲のＢ添加で放電ボールの硬さは
、比較例の放電ボールに比べて低下していることが確認
された。The obtained sample was melted by electric discharge in Ar gas to form a ball, and the hardness of the cross section of the ball was measured using a Knoop hardness meter. The results are shown in FIG. As is clear from FIG. 1, it was confirmed that the hardness of the discharge ball was reduced compared to the discharge ball of the comparative example when B was added within the range specified in the present invention.
％）を添加して真空溶解した後、実施例１と同様な方法
によって試料（φ２５ｐ）を作製した。各試料の組成は
、第１表に示す通りである。%) and vacuum melting, a sample (φ25p) was prepared in the same manner as in Example 1. The composition of each sample is as shown in Table 1.
硬さ測定およびブツシュ・テストの結果を同表に示す、
この表から明らかなように、本発明の実施例は優れた特
性を有していることが確認された。The results of hardness measurement and bush test are shown in the same table.
As is clear from this table, it was confirmed that the examples of the present invention had excellent characteristics.
次にＡＥＳを用い、放電ボール表面からの不純物Ｓを分
析した結果を第２図に示す。比較例（純度９９．９９％
の無酸素鋼）により形成した放電ボール表面に存在する
Ｓ濃化偏析は、本発明の実施例である試料１により形成
した放電ボール表面には認められなかった。他の実施例
も同様であった。Next, using AES, the impurity S from the surface of the discharge ball was analyzed, and the results are shown in FIG. Comparative example (purity 99.99%
The S concentration segregation present on the surface of the discharge ball formed from the oxygen-free steel (Oxygen-free steel) was not observed on the surface of the discharge ball formed from Sample 1, which is an example of the present invention. The same was true for other examples.
以下余白 第１表Margin below Table 1
第１図は硬度特性曲線図、第２図はＳピーク強度特性図
、第３図はプラスチックパッケージＩＣを示す概略断面
図である。
２・・・ペレット ３・・・リードフレーム４・
・・ボンディングワイヤ
代理人 弁理士 則 近 憲 佑
同 竹花喜久男
スープ硬さＨＫ
スパ”７５’ 時１１ｉ１（ｍ １ｒＬ）第 ２ 図
第 ３ 図FIG. 1 is a hardness characteristic curve diagram, FIG. 2 is an S peak strength characteristic diagram, and FIG. 3 is a schematic sectional view showing a plastic package IC. 2... Pellet 3... Lead frame 4.
...Bonding wire agent Patent attorney Yudo Nori Chika Kikuo Takehana Soup hardness HK Spa "75' 11i1 (m 1rL) Fig. 2 Fig. 3
Claims (2)
いた半導体装置において、前記ワイヤボンディング素材
として、硼素（Ｂ）を５〜３２５ｗｔ．ｐｐｍ含有し、
残部鋼からなる線材を用いることを特徴とする半導体装
置。(1) In a semiconductor device using wire bonding for connection with a semiconductor chip, boron (B) is used as the wire bonding material in an amount of 5 to 325 wt. Contains ppm,
A semiconductor device characterized by using a wire rod made of steel.
を特徴とする特許請求の範囲第１項記載の半導体装置。(2) Boron of 100 to 250wt. 2. The semiconductor device according to claim 1, wherein the amount of the semiconductor device is ppm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60241367A JP2656237B2 (en) | 1985-10-30 | 1985-10-30 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60241367A JP2656237B2 (en) | 1985-10-30 | 1985-10-30 | Semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62102552A true JPS62102552A (en) | 1987-05-13 |
| JP2656237B2 JP2656237B2 (en) | 1997-09-24 |
Family
ID=17073235
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60241367A Expired - Lifetime JP2656237B2 (en) | 1985-10-30 | 1985-10-30 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2656237B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6364211A (en) * | 1986-09-05 | 1988-03-22 | 古河電気工業株式会社 | Fine copper wire and manufacture thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61234063A (en) * | 1985-04-10 | 1986-10-18 | Tanaka Denshi Kogyo Kk | Copper wire for bonding semiconductor element |
| JPS61255045A (en) * | 1985-05-07 | 1986-11-12 | Nippon Mining Co Ltd | Bonding wire for semiconductor device and manufacture thereof |
| JPS61259558A (en) * | 1985-05-14 | 1986-11-17 | Mitsubishi Metal Corp | Cu alloy bonding wire for semiconductor device |
-
1985
- 1985-10-30 JP JP60241367A patent/JP2656237B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61234063A (en) * | 1985-04-10 | 1986-10-18 | Tanaka Denshi Kogyo Kk | Copper wire for bonding semiconductor element |
| JPS61255045A (en) * | 1985-05-07 | 1986-11-12 | Nippon Mining Co Ltd | Bonding wire for semiconductor device and manufacture thereof |
| JPS61259558A (en) * | 1985-05-14 | 1986-11-17 | Mitsubishi Metal Corp | Cu alloy bonding wire for semiconductor device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6364211A (en) * | 1986-09-05 | 1988-03-22 | 古河電気工業株式会社 | Fine copper wire and manufacture thereof |
| JPH0464121B2 (en) * | 1986-09-05 | 1992-10-14 | Furukawa Denki Kogyo Kk |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2656237B2 (en) | 1997-09-24 |
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