JP2000208533A - Die bonding zn alloy - Google Patents
Die bonding zn alloyInfo
- Publication number
- JP2000208533A JP2000208533A JP716699A JP716699A JP2000208533A JP 2000208533 A JP2000208533 A JP 2000208533A JP 716699 A JP716699 A JP 716699A JP 716699 A JP716699 A JP 716699A JP 2000208533 A JP2000208533 A JP 2000208533A
- Authority
- JP
- Japan
- Prior art keywords
- die bonding
- alloy
- bonding
- weight
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は半導体素子のダイボ
ンディング等で用いられるダイボンディング用Zn合金
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a die bonding Zn alloy used for die bonding of semiconductor devices.
【0002】[0002]
【従来の技術】パワートランジスタ素子等のダイボンデ
ィングにはんだが用いられる。この用途のはんだには、
1)350℃前後の温度で素子を接合することが可能な
こと、2)次工程のワイヤボンディングが正常に行われ
るために250℃前後の温度においてもはんだが溶融し
ないこと、3)素子の使用中に接合性が劣化しないこと
等の特性が必要であり、従来はPb-5%Snに代表さ
れるPb系はんだが用いられてきた。2. Description of the Related Art Solder is used for die bonding of power transistor elements and the like. Solders for this purpose include:
1) The element can be joined at a temperature of about 350 ° C. 2) The solder does not melt even at a temperature of about 250 ° C. so that the wire bonding in the next step is performed normally. 3) Use of the element In such a case, it is necessary to have characteristics such as not deteriorating the bonding property. Conventionally, a Pb-based solder represented by Pb-5% Sn has been used.
【0003】近年、環境汚染に対する配慮から、Pbの
使用を制限する動きが強くなってきた。このような動き
に対応して、半導体素子のダイボンディング用はんだの
分野においてもPbを含まないものが求められてきてい
る。In recent years, there has been an increasing movement to restrict the use of Pb in consideration of environmental pollution. In response to such a movement, there has been a demand for Pb-free solders in the field of die bonding solders for semiconductor devices.
【0004】[0004]
【発明が解決しようとする課題】そこで本発明は、半導
体素子のダイボンディング等に用いるのに好適な、Pb
を含まないはんだ用合金を提供することを目的とする。SUMMARY OF THE INVENTION Accordingly, the present invention relates to a method for producing Pb, which is suitable for use in die bonding of a semiconductor device.
It is an object of the present invention to provide a solder alloy containing no.
【0005】[0005]
【課題を解決するための手段】上記の目的を達成するた
めに、本発明のダイボンディング用Zn合金は、(1)
Geを2〜9重量%含み、さらにAlを2〜9重量%
含み、残部がZn及び不可避不純物からなることに特徴
があり、(2) Geを2〜9重量%含み、Alを2〜
9重量%含み、さらにMgを0.01〜0.5重量%を
含み、残部がZn及び不可避不純物からなることに特徴
があり、(3) SnとInの1種以上を5〜25重量
%含み、残部がZn及び不可避不純物からなることに特
徴があり、(4) SnとInの1種以上を5〜25重
量%含み、さらにGeを0.1〜7重量%含み、残部が
Zn及び不可避不純物からなることに特徴がある。In order to achieve the above object, a Zn alloy for die bonding according to the present invention comprises (1)
Ge is contained in an amount of 2 to 9% by weight, and Al is contained in an amount of 2 to 9% by weight.
(2) Ge is contained in an amount of 2 to 9% by weight, and Al is contained in an amount of 2 to 9% by weight.
9% by weight, and further contains 0.01 to 0.5% by weight of Mg, with the balance being Zn and unavoidable impurities. (3) 5 to 25% by weight of at least one of Sn and In. (4) containing 5 to 25% by weight of at least one of Sn and In, further containing 0.1 to 7% by weight of Ge, and the balance of Zn and unavoidable impurities. It is characterized by being composed of unavoidable impurities.
【0006】[0006]
【発明の実施の形態】以下に本発明の構成の詳細につい
て説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The details of the configuration of the present invention will be described below.
【0007】本願第1、第2の発明の合金は、融点が4
20℃であるZnをベースとし、Geを添加することに
より濡れ性を改善し、さらにAlを添加することにより
ダイボンディング温度を低温化したものである。The alloys of the first and second inventions have a melting point of 4
This is based on Zn at 20 ° C., the wettability of which is improved by adding Ge, and the die bonding temperature is lowered by adding Al.
【0008】Geの濃度を2〜9重量%としたのは、下
限濃度未満では濡れ性の向上が不十分でダイボンディン
グ時に接合不良を発生する確率が高くなるからであり、
逆に上限濃度を超えると合金硬度が高くなりすぎて熱サ
イクル試験等の耐環境試験においてチップ割れを発生す
るようになるからである。The reason why the concentration of Ge is set to 2 to 9% by weight is that if the concentration is less than the lower limit concentration, the wettability is insufficiently improved and the probability of occurrence of bonding failure during die bonding increases.
Conversely, if the concentration exceeds the upper limit, the alloy hardness becomes too high, and chip cracks occur in an environmental resistance test such as a heat cycle test.
【0009】一方、Alの濃度を2〜9重量%としたの
は、下限濃度未満ではダイボンディング温度の低下効果
が不十分だからであり、逆に上限濃度を超えるとダイボ
ンディング温度の低下効果が飽和するだけでなく濡れ性
が低下してダイボンディング時に接合不良を発生するよ
うになるからである。On the other hand, the reason why the concentration of Al is set to 2 to 9% by weight is that if the concentration is less than the lower limit, the effect of lowering the die bonding temperature is insufficient. This is because not only saturation is caused, but also wettability is reduced, resulting in poor bonding at the time of die bonding.
【0010】第2の発明におけるMgは、合金の耐食性
を向上させることにより素子使用中での接合の信頼性を
向上させる働きをする元素である。Mgの濃度を0.0
1〜0.5重量%としたのは、下限濃度未満では添加効
果が不十分だからであり、逆に上限濃度を超えると合金
の濡れ性が低下してダイボンディング時に接合不良を発
生するようになるからである。[0010] Mg in the second invention is an element that functions to improve the corrosion resistance of the alloy and thereby improve the reliability of bonding during use of the device. Mg concentration of 0.0
The reason for setting the content to 1 to 0.5% by weight is that if the concentration is less than the lower limit concentration, the effect of addition is insufficient. Because it becomes.
【0011】本願第3、第4の発明の合金は、融点が4
20℃であるZnに、Snまたは/及びInを添加する
ことにより、ダイボンディング温度を低温化したもので
ある。SnとInは、合金の濡れ性を向上させる働きや
合金の硬度を低下させて素子の接合の信頼性を向上させ
る働きも有する。The alloys according to the third and fourth inventions have a melting point of 4
The die bonding temperature is lowered by adding Sn or / and In to Zn at 20 ° C. Sn and In also have a function of improving the wettability of the alloy and a function of reducing the hardness of the alloy to improve the reliability of element bonding.
【0012】Snまたは/及びInを添加すると、Sn
またはInとZnとの共晶温度である200℃付近また
は145℃付近以上の温度で液相が生じるようになる
が、我々はSnまたは/及びInの濃度を本発明の組成
範囲内とすれば、250℃前後で生じる液相の量がごく
少量に抑えられて、ワイヤボンディング等の電子部品組
み立て工程で何ら問題を生じないことを見い出した。When Sn or / and In is added, Sn
Alternatively, a liquid phase is formed at a temperature of about 200 ° C. or about 145 ° C., which is the eutectic temperature of In and Zn, but we assume that the concentration of Sn or / and In is within the composition range of the present invention. It was found that the amount of liquid phase generated at around 250 ° C. was suppressed to a very small amount, and no problem was caused in an electronic component assembling process such as wire bonding.
【0013】Snまたは/及びInの濃度を1種以上で
5〜25重量%としたのは、下限濃度未満ではダイボン
ディング温度の低下効果が不十分であり、かつ合金硬度
が高すぎて熱サイクル試験等の耐環境試験においてチッ
プ割れを発生する確率が高くなるからであり、逆に上限
濃度を超えると250℃前後の温度で生じる液相の量が
多くなりすぎて、ワイヤボンディング等の工程で不都合
が生じるからである。[0013] The reason why the concentration of Sn or / and / or In is set to 5 to 25% by weight is that if the concentration is less than the lower limit concentration, the effect of lowering the die bonding temperature is insufficient and the alloy hardness is too high and the heat cycle is too high. This is because the probability of chip cracking increases in an environmental resistance test such as a test. Conversely, when the concentration exceeds the upper limit concentration, the amount of liquid phase generated at a temperature of about 250 ° C. becomes too large, and in a process such as wire bonding. This is because inconvenience occurs.
【0014】第4の発明におけるGeは、合金の濡れ性
を向上させるとともに若干ながらダイボンディング温度
を低温化する働きを有する。Geの濃度を0.1〜7重
量%としたのは、下限濃度未満では添加効果が不十分で
あるからであり、逆に上限濃度を超えると添加効果が飽
和すると同時に、熱サイクル試験等の耐環境試験におい
てチップ割れを発生する確率が高くなるからである。Ge in the fourth invention has the function of improving the wettability of the alloy and slightly lowering the die bonding temperature. The reason for setting the concentration of Ge to 0.1 to 7% by weight is that if the concentration is less than the lower limit concentration, the effect of addition is insufficient. This is because the probability of occurrence of chip cracks in the environmental resistance test increases.
【0015】[0015]
【実施例】第1、第2の発明の実施例 ・・・ 各純度
99.9重量%のZn、Ge、Al、Mgを用いて表
1、表2に示す組成のZn合金を大気溶解炉により溶製
した。得られた鋳塊に250℃での熱処理を施し、冷間
圧延を施して、0.1mm厚の試料とした。DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the first and second inventions: A Zn alloy having a composition shown in Tables 1 and 2 is melted in an atmosphere using Zn, Ge, Al, and Mg each having a purity of 99.9% by weight. Was melted. The obtained ingot was subjected to a heat treatment at 250 ° C. and cold-rolled to obtain a 0.1 mm thick sample.
【0016】得られた試料の評価として、ダイボンディ
ング性については、はんだダイボンダー(dage社
製、EDB−200)を用い、AgめっきL/F上への
3mm角のAu蒸着ダミーチップを接合できるか否か、
接合できる場合には接合できる最低のダイボンディング
温度を求めた。As to the evaluation of the obtained sample, as to the die bonding property, whether a 3 mm square Au vapor-deposited dummy chip can be bonded to the Ag plating L / F using a solder die bonder (EDB-200, manufactured by Dage). or not,
When bonding was possible, the lowest die bonding temperature at which bonding was possible was determined.
【0017】次の組立工程であるワイヤボンディングが
正常に行われるか否か(ワイヤボンディング性)につい
ては、市販の金線とボールボンダー(KAIJO社製、FB
−118)を用い、前記と同様にダイボンディングを行
ったチップ上の蒸着Al面とL/F上のAgめっき面の
間でワイヤボンディング試験を実施することにより行っ
た。Whether or not wire bonding, which is the next assembly step, is performed normally (wire bonding property) is determined by using a commercially available gold wire and a ball bonder (manufactured by KAIJO, FB).
−118), and a wire bonding test was performed between the vapor-deposited Al surface on the chip and the Ag-plated surface on the L / F on which die bonding was performed in the same manner as described above.
【0018】ワイヤボンディング試験はステージ温度を
250℃で行ない、ワイヤが接合された場合を「良」、
ワイヤが接合されない場合を「不良」と評価した。The wire bonding test was conducted at a stage temperature of 250 ° C.
The case where the wires were not joined was evaluated as “poor”.
【0019】接合信頼性の評価には、ダイボンディング
を行った後にトランスファーモールド型モールド機によ
ってエポキシ樹脂(住友ベークライト社製、EME−6
300)をモールドした試料について、−65℃/15
0℃1000サイクルの温度サイクル試験、もしくは温
度80℃湿度80%1000時間保持の恒温恒湿試験を
施した後に樹脂を開封してチップ接合部の観察を行い、
チップや接合界面に割れの発生が無い場合を「良」、割
れが発生した場合を「不良」と評価した。To evaluate the bonding reliability, after performing die bonding, an epoxy resin (manufactured by Sumitomo Bakelite;
-65 ° C./15
After performing a temperature cycle test of 0 ° C. 1000 cycles or a constant temperature and humidity test of holding at a temperature of 80 ° C. and a humidity of 80% for 1000 hours, the resin is opened, and the chip bonding portion is observed.
A case where no crack occurred at the chip or the joint interface was evaluated as “good”, and a case where cracks occurred was evaluated as “poor”.
【0020】表1、表2に上記評価の結果を示した。表
1で最低ダイボンディング温度の欄で「不良」と示したの
は、接合が得られない試料が発生したことを意味する。
また、ワイヤボンディング性と接合信頼性で「−」と示し
たのは、試験を実施しなかったことを意味する。Tables 1 and 2 show the results of the above evaluation. "Defective" in the column of the minimum die bonding temperature in Table 1 means that a sample in which bonding could not be obtained occurred.
Further, "-" in the wire bonding property and the bonding reliability means that the test was not performed.
【0021】表1、表2において明らかなように、本願
第1、第2の発明によるZn合金は、350℃前後の温
度でダイボンディングが可能であり、かつワイヤダイボ
ンディング性や接合信頼性に問題が無いことがわかる。As is clear from Tables 1 and 2, the Zn alloys according to the first and second aspects of the present invention can be die-bonded at a temperature of about 350 ° C. and have a good wire-die bonding property and bonding reliability. It turns out that there is no problem.
【0022】[0022]
【表1】 [Table 1]
【0023】[0023]
【表2】 [Table 2]
【0024】第3、第4の発明の実施例 ・・・ 各純
度99.9重量%のZn、Sn、In、Geを用いて表
3、表4に示す組成のZn合金を大気溶解炉により溶製
した。得られた鋳塊に120℃での熱処理を施し、冷間
圧延を施して、0.1mm厚の試料とした。Third and Fourth Embodiments: Zn alloys having the compositions shown in Tables 3 and 4 were prepared using Zn, Sn, In, and Ge having a purity of 99.9% by weight in an atmosphere melting furnace. It was melted. The obtained ingot was subjected to a heat treatment at 120 ° C. and cold-rolled to obtain a sample having a thickness of 0.1 mm.
【0025】得られた試料について、前期と同様に、ダ
イボンディング性、ワイヤボンディング性、接合信頼性
を評価し、表3、表4に結果を示した。The obtained samples were evaluated for die bonding property, wire bonding property, and bonding reliability in the same manner as in the previous period. Tables 3 and 4 show the results.
【0026】表3、表4において明らかなように、本願
第3、第4の発明によるZn合金は350℃前後の温度
でダイボンディングが可能であり、かつワイヤダイボン
ディング性や接合信頼性に問題が無いことがわかる。As apparent from Tables 3 and 4, the Zn alloys according to the third and fourth aspects of the present invention can be die-bonded at a temperature of about 350 ° C., and have problems in wire-die bonding property and bonding reliability. It turns out that there is no.
【0027】[0027]
【表3】 [Table 3]
【0028】[0028]
【表4】 [Table 4]
【0029】[0029]
【発明の効果】以上から明らかなように、本発明によ
り、電子部品の組立等で用いるのに好適な、Pbを含ま
ないはんだ用合金を提供することができた。As is apparent from the above, according to the present invention, a Pb-free solder alloy suitable for use in assembling electronic parts and the like can be provided.
Claims (4)
2〜9重量%含み、残部がZn及び不可避不純物からな
ることを特徴とするダイボンディング用Zn合金。1. A Zn alloy for die bonding, comprising 2 to 9% by weight of Ge, 2 to 9% by weight of Al, and the balance of Zn and unavoidable impurities.
重量%含み、さらにMgを0.01〜0.5重量%を含
み、残部がZn及び不可避不純物からなることを特徴と
するダイボンディング用Zn合金。2. A composition containing 2 to 9% by weight of Ge and 2 to 9% of Al.
A Zn alloy for die bonding, wherein the Zn alloy contains 0.01% to 0.5% by weight of Mg, and the balance consists of Zn and unavoidable impurities.
含み、残部がZn及び不可避不純物からなることを特徴
とするダイボンディング用Zn合金。3. An amount of at least one of Sn and In of 5 to 25% by weight.
A Zn alloy for die bonding, characterized in that the balance comprises Zn and inevitable impurities.
含み、さらにGeを0.1〜7重量%含み、残部がZn
及び不可避不純物からなることを特徴とするダイボンデ
ィング用Zn合金。4. An amount of at least one of Sn and In of 5 to 25% by weight.
And 0.1 to 7% by weight of Ge, with the balance being Zn
And a Zn alloy for die bonding, comprising an unavoidable impurity.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP716699A JP4022013B2 (en) | 1999-01-14 | 1999-01-14 | Zn alloy for die bonding |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP716699A JP4022013B2 (en) | 1999-01-14 | 1999-01-14 | Zn alloy for die bonding |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000208533A true JP2000208533A (en) | 2000-07-28 |
JP4022013B2 JP4022013B2 (en) | 2007-12-12 |
Family
ID=11658507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP716699A Expired - Lifetime JP4022013B2 (en) | 1999-01-14 | 1999-01-14 | Zn alloy for die bonding |
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JP (1) | JP4022013B2 (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1250032A1 (en) * | 2001-04-11 | 2002-10-16 | Hitachi, Ltd. | Electronic device using Zn-Al-Ge-Mg alloy solder having Al or Cu particles |
JP2006322027A (en) * | 2005-05-18 | 2006-11-30 | Uchihashi Estec Co Ltd | Fuse element |
WO2009066704A1 (en) | 2007-11-20 | 2009-05-28 | Toyota Jidosha Kabushiki Kaisha | Solder material, process for producing the solder material, joint product, process for producing the joint product, power semiconductor module, and process for producing the power semiconductor module |
WO2010089647A1 (en) | 2009-02-05 | 2010-08-12 | Toyota Jidosha Kabushiki Kaisha | Junction body, semiconductor module, and manufacturing method for junction body |
JP2011251298A (en) * | 2010-05-31 | 2011-12-15 | Sumitomo Metal Mining Co Ltd | Pb-FREE SOLDER ALLOY CONSISTING MAINLY OF Zn |
JP2014151364A (en) * | 2013-02-13 | 2014-08-25 | Toyota Industries Corp | Solder and die bond structure |
JP2014221484A (en) * | 2013-05-13 | 2014-11-27 | 住友金属鉱山株式会社 | Pb-FREE Zn-BASED SOLDER PASTE |
JP2015098048A (en) * | 2013-11-19 | 2015-05-28 | 住友金属鉱山株式会社 | Zn-Ge-BASED SOLDER ALLOY WITHOUT Pb, AND ELECTRONIC COMPONENT USING THE SAME |
WO2015084723A1 (en) | 2013-12-04 | 2015-06-11 | Honeywell International Inc. | Zinc-based lead-free solder compositions |
WO2015160311A2 (en) | 2014-04-17 | 2015-10-22 | Heraeus Materials Singapore Pte. Ltd. | Lead-free eutectic solder alloy comprising zinc as the main component and aluminum as an alloying metal |
-
1999
- 1999-01-14 JP JP716699A patent/JP4022013B2/en not_active Expired - Lifetime
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1250032A1 (en) * | 2001-04-11 | 2002-10-16 | Hitachi, Ltd. | Electronic device using Zn-Al-Ge-Mg alloy solder having Al or Cu particles |
US6563225B2 (en) | 2001-04-11 | 2003-05-13 | Hitachi, Ltd. | Product using Zn-Al alloy solder |
JP2006322027A (en) * | 2005-05-18 | 2006-11-30 | Uchihashi Estec Co Ltd | Fuse element |
WO2009066704A1 (en) | 2007-11-20 | 2009-05-28 | Toyota Jidosha Kabushiki Kaisha | Solder material, process for producing the solder material, joint product, process for producing the joint product, power semiconductor module, and process for producing the power semiconductor module |
US8283783B2 (en) | 2007-11-20 | 2012-10-09 | Toyota Jidosha Kabushiki Kaisha | Solder material, method for manufacturing the same, joined body, method for manufacturing the same, power semiconductor module, and method for manufacturing the same |
WO2010089647A1 (en) | 2009-02-05 | 2010-08-12 | Toyota Jidosha Kabushiki Kaisha | Junction body, semiconductor module, and manufacturing method for junction body |
JP2011251298A (en) * | 2010-05-31 | 2011-12-15 | Sumitomo Metal Mining Co Ltd | Pb-FREE SOLDER ALLOY CONSISTING MAINLY OF Zn |
JP2014151364A (en) * | 2013-02-13 | 2014-08-25 | Toyota Industries Corp | Solder and die bond structure |
JP2014221484A (en) * | 2013-05-13 | 2014-11-27 | 住友金属鉱山株式会社 | Pb-FREE Zn-BASED SOLDER PASTE |
JP2015098048A (en) * | 2013-11-19 | 2015-05-28 | 住友金属鉱山株式会社 | Zn-Ge-BASED SOLDER ALLOY WITHOUT Pb, AND ELECTRONIC COMPONENT USING THE SAME |
WO2015084723A1 (en) | 2013-12-04 | 2015-06-11 | Honeywell International Inc. | Zinc-based lead-free solder compositions |
JP2017501879A (en) * | 2013-12-04 | 2017-01-19 | ハネウェル・インターナショナル・インコーポレーテッド | Zinc-based lead-free solder composition |
EP3077151A4 (en) * | 2013-12-04 | 2017-09-27 | Honeywell International Inc. | Zinc-based lead-free solder compositions |
WO2015160311A2 (en) | 2014-04-17 | 2015-10-22 | Heraeus Materials Singapore Pte. Ltd. | Lead-free eutectic solder alloy comprising zinc as the main component and aluminum as an alloying metal |
JP2017513713A (en) * | 2014-04-17 | 2017-06-01 | ヘレウス マテリアルズ シンガポール ピーティーイー. リミテッド | Lead-free eutectic solder alloy containing zinc as the main component and aluminum as alloying metal |
EP3192609A1 (en) | 2014-04-17 | 2017-07-19 | Heraeus Materials Singapore Pte. Ltd. | Lead-free eutectic solder alloy comprising zinc as the main component and aluminum as an alloying metal |
EP3192610A1 (en) | 2014-04-17 | 2017-07-19 | Heraeus Materials Singapore Pte. Ltd. | Lead-free eutectic solder alloy comprising zinc as the main component and aluminum as an alloying metal |
US10399186B2 (en) | 2014-04-17 | 2019-09-03 | Heraeus Materials Singapore Pte., Ltd. | Lead-free eutectic solder alloy comprising zinc as the main component and aluminum as an alloying metal |
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