JPS62101648A - Epoxy resin molding material for semiconductor sealing - Google Patents

Epoxy resin molding material for semiconductor sealing

Info

Publication number
JPS62101648A
JPS62101648A JP24314885A JP24314885A JPS62101648A JP S62101648 A JPS62101648 A JP S62101648A JP 24314885 A JP24314885 A JP 24314885A JP 24314885 A JP24314885 A JP 24314885A JP S62101648 A JPS62101648 A JP S62101648A
Authority
JP
Japan
Prior art keywords
epoxy resin
molding material
resin molding
resin
semiconductor sealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24314885A
Other languages
Japanese (ja)
Inventor
Kota Nishii
耕太 西井
Azuma Matsuura
東 松浦
Yasuhiro Yoneda
泰博 米田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP24314885A priority Critical patent/JPS62101648A/en
Publication of JPS62101648A publication Critical patent/JPS62101648A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To provide the titled material having excellent moisture resistance, by blending an epoxy resin with a hardener, a curing accelerator, an inorg. filler and a fluororesin surface improver. CONSTITUTION:An epoxy resin having at least one epoxy group per molecule (e.g., a phenolic novolak) is blended with a hardener such as maleic anhydride, a curing accelerater such as various imidazole compds., an inorg. filler such as CaCO3, a fluororesin surface improver such as a perfluoroacrylate/dodecyl methacrylate copolymer and optionally a parting agent, a colorant, a flame retarder, etc. The mixture is mixed in a mixing roll mill to obtain an epoxy resin molding material for use in semiconductor sealing.

Description

【発明の詳細な説明】 本発明は、高温、高湿状態に長時間放置後も信頼性の高
い電子部品を提供可能な半導体封止用エポキシ樹脂成形
材料に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an epoxy resin molding material for semiconductor encapsulation that can provide highly reliable electronic components even after being left in high temperature and high humidity conditions for a long time.

〔従来の技術と問題点〕[Conventional technology and problems]

電子部品においては、高集積度化、高信頼性の止されて
いる電子部品が高温、高湿状態に長時間放置されると、
樹脂パ゛ルク中や樹脂とリードフレーム、素子との隙間
を通じて外部の水分がバックージ内部に浸入し、素子上
のM配線を腐食し断線する問題がある。この対策として
、素子表面のバッファーコート、原材料の高純度化、レ
ジンの低応力化などが図られている。しかし樹脂バルク
中の透湿水、吸湿水に対する抑制、樹脂とリードフレー
ムとの密着性に関する検討は必ずしも十分とは言えず、
樹脂封止型半導体装置の耐湿信頼性向上を図る上で、こ
の対策が重要な課題となってきた0 〔発明が解決しようとする問題点〕 本発明は上記の状況に鑑みてなされ、耐湿性向上を目的
とするものである。
When electronic components are left in high temperature and high humidity conditions for long periods of time, they are no longer highly integrated or highly reliable.
There is a problem in that external moisture infiltrates into the baggage through the resin pulp and the gaps between the resin, the lead frame, and the element, corroding and breaking the M wiring on the element. Countermeasures include buffer coating the element surface, increasing the purity of raw materials, and reducing stress in the resin. However, studies regarding the suppression of moisture-permeable water and moisture-absorbed water in the resin bulk, and the adhesion between the resin and the lead frame are not necessarily sufficient.
In order to improve the moisture resistance reliability of resin-sealed semiconductor devices, countermeasures against this problem have become an important issue0. The purpose is to improve.

〔問題点を解決するための手段〕[Means for solving problems]

本発明はエポキシ樹脂、硬化剤、硬化促進剤。 The present invention is an epoxy resin, a curing agent, and a curing accelerator.

無機充てん剤、フッソ系樹脂表面改質剤を必須成分とす
ることを特徴とする半導体封止用エポキシ樹脂成形材料
である。本発明において使用されるエポキシ樹脂として
は、ビスフェノールAのジグリシジエーテル、フェノー
ルノボラック、クレゾールノボラックなどのノボラメタ
型エポキシ樹脂。
This is an epoxy resin molding material for semiconductor encapsulation characterized by containing an inorganic filler and a fluorocarbon resin surface modifier as essential components. Epoxy resins used in the present invention include novola meta-type epoxy resins such as diglycidether of bisphenol A, phenol novolac, and cresol novolak.

脂肪族環状エポキシ樹脂など分子内に少なくとも1信以
上のエポキシ基を有するエポキシ樹脂であれば、いかな
るものでも使用できる。また硬化剤として(X公知のエ
ポキシ樹脂硬化剤を用いることができる。幾つか例示す
ると、例えば無水マレイン酸、無水フタル酸、無水テト
ラヒドロフタル酸。
Any epoxy resin can be used as long as it has at least one epoxy group in its molecule, such as an aliphatic cyclic epoxy resin. Further, as a curing agent (X) known epoxy resin curing agents can be used. Some examples include maleic anhydride, phthalic anhydride, and tetrahydrophthalic anhydride.

無水へキサヒドロフタル酸、無水トリメリット酸。Hexahydrophthalic anhydride, trimellitic anhydride.

ピロメリット酸−無水物などの酸無水物硬化剤。Acid anhydride hardeners such as pyromellitic anhydride.

ジアミノジフェニルメタン、ジアミノジフェニルエーテ
ル、ジアミノジフェニルスルホンなトノ芳香族アミン、
フェノールノボラック、クレゾールノボラックやフェノ
ール各レゾール等とパラキシレンジメトキサイドとの縮
合物、フェノール、クレゾール等とジフェニルエーテル
、ホルムアルデヒドとの縮合物などの多価フェノール性
水酸基を有する、いわゆるフェノール性硬化剤などがあ
る。
diaminodiphenylmethane, diaminodiphenyl ether, diaminodiphenylsulfonic tonoaromatic amine,
So-called phenolic curing agents that have polyhydric phenolic hydroxyl groups, such as phenol novolak, cresol novolac, condensates of phenol resols, etc. and paraxylene dimethoxide, and condensates of phenol, cresol, etc., and diphenyl ether, formaldehyde, etc. be.

硬化促進剤として(工、エポキシ樹脂用として有用な公
知のもの1工全て使用できる。特に潜在性の優れたもの
としてテトラ貨換ホスホニウムテトラ看換ボレート、テ
トラ置換アンモニウムテトラ置換ボレート、各種イミダ
ゾール化合物、各種イミダゾール化合物とその誘導体な
どが有効である。また、これらの硬化促進剤を2独以上
併用してもかまわない。本発明に用いられるエポキシ樹
脂mg物には、トランジスタ、IC,LSI等の半導体
装置ヲトランスファモールドするために無機光てん剤を
配合することが望ましい。無機光てん剤としては、例え
ば炭乍カルシウム、ノリ力粉、ケイ酸ジルコニウム、ケ
イ酸カルシウム、石英ガラス粉、ガラス繊維粉などが有
用であり、これらは必要に応じて24以上併用してもか
まわない。さらに本発明において、レジンの耐湿性を向
上するためにフッソ系樹脂表面改質剤の添加は欠かせな
い。
As a curing accelerator, all known useful materials for epoxy resins can be used.Those with particularly excellent latent properties include tetra-converted phosphonium tetra-converted borate, tetra-substituted ammonium tetra-substituted borate, various imidazole compounds, Various imidazole compounds and their derivatives are effective.Also, two or more of these curing accelerators may be used in combination.The epoxy resin mg product used in the present invention is suitable for semiconductors such as transistors, ICs, and LSIs. In order to transfer mold the device, it is desirable to blend an inorganic photonic agent. Examples of the inorganic photonic agent include calcium carbonate, seaweed flour, zirconium silicate, calcium silicate, quartz glass powder, glass fiber powder, etc. are useful, and 24 or more of these may be used in combination if necessary.Furthermore, in the present invention, addition of a fluorocarbon resin surface modifier is essential in order to improve the moisture resistance of the resin.

このようなフッソ系樹脂表面改質剤としては、パフルオ
ロアクリレートドデシルメタクリレートの共重合体があ
る。この改質材を樹脂に練込んだ場合、樹脂側に親油基
1表面にパーフルオロアルキル基を向けて表層に配列す
る。これによシトラ/スファモールドにより成形した半
導体装置の耐湿性を向上することができる。
As such a fluorocarbon resin surface modifier, there is a copolymer of perfluoroacrylate dodecyl methacrylate. When this modifier is kneaded into a resin, the perfluoroalkyl groups are arranged on the surface layer with the lipophilic groups 1 on the resin side. As a result, the moisture resistance of the semiconductor device molded by Citra/Spha mold can be improved.

また、その!へ加削として、離型剤2着色剤、シランカ
ップリング剤、難燃剤、難燃助剤などを配合してもよい
Also, that! For machining, a release agent, a colorant, a silane coupling agent, a flame retardant, a flame retardant aid, etc. may be added.

本発明に用いられるエポキシ樹脂組成物は成形材料を調
整するに当っては固状の成分材料をそれぞれ扮砕し、つ
いで所望の割合で十分に混合する。
In preparing the molding material of the epoxy resin composition used in the present invention, the solid component materials are crushed and then thoroughly mixed in a desired ratio.

混合には、ミキノングロール機、コニーダ、ボールミル
など慣用の混合、混練機械を使用できる。
For mixing, conventional mixing and kneading machines such as a Mikinon roll machine, a co-kneader, and a ball mill can be used.

得られた混合物は、そのままトランスファ底形に適用で
きる。
The resulting mixture can be applied directly to the transfer bottom mold.

〔実施例1〕 0−クンゾールノボラック型エポキシ樹脂(エボキン当
t200)100重量部、フェノールノボラック硬化剤
501債部、2.4ジアミノ−6−〔2−メチルイミダ
ゾリル−(1)〕−〕エチルーS−トリアジン21@部
シリカ粉末450重金部。
[Example 1] 100 parts by weight of 0-kunzol novolac type epoxy resin (T200 per Evokin), 501 parts by weight of phenol novolac curing agent, 2.4 diamino-6-[2-methylimidazolyl-(1)]-]ethyl S-triazine 21 parts silica powder 450 parts heavy metal.

フラノ系樹脂表面改質剤05重量部、臭素化エポキシ樹
脂10重量部、三酸化アンチモン5重量部。
05 parts by weight of furano resin surface modifier, 10 parts by weight of brominated epoxy resin, 5 parts by weight of antimony trioxide.

r−グリシドキシプロピルトリメトキンシラン。r-glycidoxypropyltrimethquine silane.

カルナバワックス、カーボンブラック各2重量部を混合
した後、二本ロール(60〜80℃)で10分間混練し
、粗粉砕して目的の半導体封止用樹脂組II物を得た。
After mixing 2 parts by weight each of carnauba wax and carbon black, the mixture was kneaded with two rolls (60 to 80°C) for 10 minutes and coarsely pulverized to obtain the desired resin assembly II for semiconductor encapsulation.

上記の樹脂組成物を用いてLSIをトランスファ底形し
た。成形時間は175℃。
An LSI was formed into a transfer bottom shape using the above resin composition. Molding time was 175°C.

70ke/cII、  3分テアル。70ke/cII, 3 minutes teal.

次いで、得られたLSI封止品(工121℃、2気圧過
飽和水蒸気釜(PCT釜)に投入し、所定時間毎に取り
出し、LSIの電気的導通チェックを行ない、孝子上′
/)AL配線の腐食断線の有無を確認した。その結果、
耐湿信頼性は500時間でO/40,1000時間で1
740,2000時間で2/40であった。
Next, the obtained LSI sealed product (temperature: 121°C, 2 atm supersaturated steam cooker (PCT cooker) was put into a supersaturated steam cooker (PCT cooker), taken out at predetermined intervals, the electrical continuity of the LSI was checked, and the
/) Checked for corrosion and disconnection of AL wiring. the result,
Moisture resistance reliability is O/40 for 500 hours and 1 for 1000 hours.
It was 2/40 at 740,2000 hours.

〔比較例1〕 フッソ系樹脂表面改質剤を添加しなかった以外は実施例
1と同じ組成、方法で得た樹脂組放物を用いて、実施例
1と同じ条件でLSIを封止しPCT試験を行なった。
[Comparative Example 1] An LSI was sealed under the same conditions as Example 1 using a resin assembly obtained by the same composition and method as Example 1 except that no fluorocarbon resin surface modifier was added. A PCT test was conducted.

その結果、耐湿信頼性は200時間で2/40,500
時間で22/40,1001間で39/40であった〇 〔発明の効果〕
As a result, the moisture resistance reliability was 2/40,500 after 200 hours.
It was 22/40 in time, 39/40 in 1001 hours〇 [Effect of the invention]

Claims (1)

【特許請求の範囲】[Claims] エポキシ樹脂、硬化剤、硬化促進剤、無機充てん剤、フ
ッ素系樹脂表示改質剤を必須成分とすることを特徴とす
る半導体封止用エポキシ樹脂成形材料。
An epoxy resin molding material for semiconductor encapsulation, characterized by containing an epoxy resin, a curing agent, a curing accelerator, an inorganic filler, and a fluororesin display modifier as essential components.
JP24314885A 1985-10-30 1985-10-30 Epoxy resin molding material for semiconductor sealing Pending JPS62101648A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24314885A JPS62101648A (en) 1985-10-30 1985-10-30 Epoxy resin molding material for semiconductor sealing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24314885A JPS62101648A (en) 1985-10-30 1985-10-30 Epoxy resin molding material for semiconductor sealing

Publications (1)

Publication Number Publication Date
JPS62101648A true JPS62101648A (en) 1987-05-12

Family

ID=17099503

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24314885A Pending JPS62101648A (en) 1985-10-30 1985-10-30 Epoxy resin molding material for semiconductor sealing

Country Status (1)

Country Link
JP (1) JPS62101648A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0632059A2 (en) * 1993-06-30 1995-01-04 Sumitomo Chemical Company, Limited Interpenetrating networks from unsaturated monomers and thermosetting resins

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0632059A2 (en) * 1993-06-30 1995-01-04 Sumitomo Chemical Company, Limited Interpenetrating networks from unsaturated monomers and thermosetting resins
EP0632059A3 (en) * 1993-06-30 1996-04-17 Sumitomo Chemical Co Interpenetrating networks from unsaturated monomers and thermosetting resins.

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