JPS6196722A - 電子銃装置 - Google Patents

電子銃装置

Info

Publication number
JPS6196722A
JPS6196722A JP59218118A JP21811884A JPS6196722A JP S6196722 A JPS6196722 A JP S6196722A JP 59218118 A JP59218118 A JP 59218118A JP 21811884 A JP21811884 A JP 21811884A JP S6196722 A JPS6196722 A JP S6196722A
Authority
JP
Japan
Prior art keywords
electron gun
gun device
raw material
crucible
impurities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59218118A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0476203B2 (enrdf_load_stackoverflow
Inventor
Sumio Sakai
酒井 純朗
Shunichi Murakami
俊一 村上
Tetsuo Ishida
哲夫 石田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP59218118A priority Critical patent/JPS6196722A/ja
Publication of JPS6196722A publication Critical patent/JPS6196722A/ja
Publication of JPH0476203B2 publication Critical patent/JPH0476203B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/02631Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
JP59218118A 1984-10-17 1984-10-17 電子銃装置 Granted JPS6196722A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59218118A JPS6196722A (ja) 1984-10-17 1984-10-17 電子銃装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59218118A JPS6196722A (ja) 1984-10-17 1984-10-17 電子銃装置

Publications (2)

Publication Number Publication Date
JPS6196722A true JPS6196722A (ja) 1986-05-15
JPH0476203B2 JPH0476203B2 (enrdf_load_stackoverflow) 1992-12-03

Family

ID=16714904

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59218118A Granted JPS6196722A (ja) 1984-10-17 1984-10-17 電子銃装置

Country Status (1)

Country Link
JP (1) JPS6196722A (enrdf_load_stackoverflow)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4926181A (enrdf_load_stackoverflow) * 1972-07-04 1974-03-08
JPS511556U (enrdf_load_stackoverflow) * 1974-06-21 1976-01-08

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4926181A (enrdf_load_stackoverflow) * 1972-07-04 1974-03-08
JPS511556U (enrdf_load_stackoverflow) * 1974-06-21 1976-01-08

Also Published As

Publication number Publication date
JPH0476203B2 (enrdf_load_stackoverflow) 1992-12-03

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term