JPH0476203B2 - - Google Patents

Info

Publication number
JPH0476203B2
JPH0476203B2 JP59218118A JP21811884A JPH0476203B2 JP H0476203 B2 JPH0476203 B2 JP H0476203B2 JP 59218118 A JP59218118 A JP 59218118A JP 21811884 A JP21811884 A JP 21811884A JP H0476203 B2 JPH0476203 B2 JP H0476203B2
Authority
JP
Japan
Prior art keywords
crucible
electron gun
evaporation source
gun device
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59218118A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6196722A (ja
Inventor
Sumio Sakai
Shunichi Murakami
Tetsuo Ishida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP59218118A priority Critical patent/JPS6196722A/ja
Publication of JPS6196722A publication Critical patent/JPS6196722A/ja
Publication of JPH0476203B2 publication Critical patent/JPH0476203B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
JP59218118A 1984-10-17 1984-10-17 電子銃装置 Granted JPS6196722A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59218118A JPS6196722A (ja) 1984-10-17 1984-10-17 電子銃装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59218118A JPS6196722A (ja) 1984-10-17 1984-10-17 電子銃装置

Publications (2)

Publication Number Publication Date
JPS6196722A JPS6196722A (ja) 1986-05-15
JPH0476203B2 true JPH0476203B2 (enrdf_load_stackoverflow) 1992-12-03

Family

ID=16714904

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59218118A Granted JPS6196722A (ja) 1984-10-17 1984-10-17 電子銃装置

Country Status (1)

Country Link
JP (1) JPS6196722A (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421830B2 (enrdf_load_stackoverflow) * 1972-07-04 1979-08-02
JPS511556U (enrdf_load_stackoverflow) * 1974-06-21 1976-01-08

Also Published As

Publication number Publication date
JPS6196722A (ja) 1986-05-15

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term