JPS619570A - 薄膜製造方法 - Google Patents

薄膜製造方法

Info

Publication number
JPS619570A
JPS619570A JP12856384A JP12856384A JPS619570A JP S619570 A JPS619570 A JP S619570A JP 12856384 A JP12856384 A JP 12856384A JP 12856384 A JP12856384 A JP 12856384A JP S619570 A JPS619570 A JP S619570A
Authority
JP
Japan
Prior art keywords
substrate
thin film
film
target
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12856384A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0373632B2 (enrdf_load_html_response
Inventor
Izumi Yanagida
柳田　泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tanaka Kikinzoku Kogyo KK
Original Assignee
Tanaka Kikinzoku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanaka Kikinzoku Kogyo KK filed Critical Tanaka Kikinzoku Kogyo KK
Priority to JP12856384A priority Critical patent/JPS619570A/ja
Publication of JPS619570A publication Critical patent/JPS619570A/ja
Publication of JPH0373632B2 publication Critical patent/JPH0373632B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP12856384A 1984-06-22 1984-06-22 薄膜製造方法 Granted JPS619570A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12856384A JPS619570A (ja) 1984-06-22 1984-06-22 薄膜製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12856384A JPS619570A (ja) 1984-06-22 1984-06-22 薄膜製造方法

Publications (2)

Publication Number Publication Date
JPS619570A true JPS619570A (ja) 1986-01-17
JPH0373632B2 JPH0373632B2 (enrdf_load_html_response) 1991-11-22

Family

ID=14987855

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12856384A Granted JPS619570A (ja) 1984-06-22 1984-06-22 薄膜製造方法

Country Status (1)

Country Link
JP (1) JPS619570A (enrdf_load_html_response)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0238566A (ja) * 1988-07-27 1990-02-07 Hitachi Ltd スパッタ方法およびその装置
WO2000070106A1 (fr) * 1999-05-14 2000-11-23 Fuji Electric Co., Ltd. Alliage magnetique, support d'enregistrement magnetique et procede de leur fabrication, et cible pour formation de film magnetique et dispositif d'enregistrement magnetique
CN104694900A (zh) * 2015-03-27 2015-06-10 中国工程物理研究院激光聚变研究中心 可加偏压式薄膜样品架

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0238566A (ja) * 1988-07-27 1990-02-07 Hitachi Ltd スパッタ方法およびその装置
WO2000070106A1 (fr) * 1999-05-14 2000-11-23 Fuji Electric Co., Ltd. Alliage magnetique, support d'enregistrement magnetique et procede de leur fabrication, et cible pour formation de film magnetique et dispositif d'enregistrement magnetique
US6607612B1 (en) 1999-05-14 2003-08-19 Migaku Takahashi Magnetic alloy and magnetic recording medium and method for preparation thereof, and target for forming magnetic film and magnetic recording device
CN104694900A (zh) * 2015-03-27 2015-06-10 中国工程物理研究院激光聚变研究中心 可加偏压式薄膜样品架

Also Published As

Publication number Publication date
JPH0373632B2 (enrdf_load_html_response) 1991-11-22

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