JPS6194220A - Magnetic recording medium and its manufacture - Google Patents

Magnetic recording medium and its manufacture

Info

Publication number
JPS6194220A
JPS6194220A JP21420584A JP21420584A JPS6194220A JP S6194220 A JPS6194220 A JP S6194220A JP 21420584 A JP21420584 A JP 21420584A JP 21420584 A JP21420584 A JP 21420584A JP S6194220 A JPS6194220 A JP S6194220A
Authority
JP
Japan
Prior art keywords
film
magnetic recording
recording medium
substrate
high molecular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21420584A
Other languages
Japanese (ja)
Other versions
JPH0778865B2 (en
Inventor
Hiroyoshi Nakamura
中村 弘喜
Yoshiaki Ouchi
義昭 大内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP59214205A priority Critical patent/JPH0778865B2/en
Publication of JPS6194220A publication Critical patent/JPS6194220A/en
Publication of JPH0778865B2 publication Critical patent/JPH0778865B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To improve the adhesive force between a high molecular film substrate and ferromagnetic body film and to obtain the titled magnetic recording medium having a long service life by oxidizing the high molecular film substrate with plasma, and then forming a magnetic body film on the high molecular film substrate. CONSTITUTION:A Co-Cr film 2, an abrasion-resistant film 3, and a lubricating layer 4 are formed on both surfaces of a substrate 1 consisting of a high molecular film, and a continuous thin film forming device is used for manufacturing the vertical magnetic recording medium. The high molecular thin film substrate is oxidized with plasma as the pretreatment, and the Co-Cr ferromagnetic body film and the abrasion- resistant film are formed by sputtering in an argon atmosphere with a magnetron sputtering system. Namely, a PET film is firstly degasified, and the a high-frequency voltage is impressed on high-frequency electrodes 17a and 17b to oxidize both surfaces of the PET film with plasma. An oxygen atmosphere is used, the pressure of oxygen is regulated, for example, to 8X10<-1>Torr, and the RF electric power is regulated, for example, to 300W. Then the atmosphere is changed into argon, and the temp. of main rollers 14a and 14b is lowered, for example, to 90 deg.C to form a ferromagnetic body film of a Co-Ni film 2.

Description

【発明の詳細な説明】 (発明の属する技術分野) 本発明は磁気記録媒体、特に垂直磁化記録に使用して好
適な磁気記録媒体及びその製造方法シー関する。
DETAILED DESCRIPTION OF THE INVENTION (Technical field to which the invention pertains) The present invention relates to a magnetic recording medium, particularly a magnetic recording medium suitable for use in perpendicular magnetization recording, and a method for manufacturing the same.

(発明の技術的背景とその問題点) 近年、磁気記録媒体の媒体面に垂直な方向の磁化を利用
して高密度の記録を行なう垂直磁化記録化容易軸を有す
るCo −Cr系スパッタ薄膜を記録膜とするものが代
表的である。このような垂直磁気記録媒体は、ポリイミ
ド、ポリエチレンテレフタレート等の高分子フィルムを
基体とし、その片面または両面にCo −Cr系スパッ
タ膜が形成され、またCo −Cr系スパッタ膜の上に
は耐摩耗膜(保護膜)が形成されている。このような垂
直磁気記録媒体は、磁気テープやフロッピーディスクに
適用する場合には、磁気ヘッドを介して情報の記録、再
生及び消去を行なう。
(Technical background of the invention and its problems) In recent years, Co-Cr based sputtered thin films with a perpendicular magnetization easy axis for high-density recording using magnetization in a direction perpendicular to the medium surface of a magnetic recording medium have been developed. A typical example is a recording film. Such perpendicular magnetic recording media are based on a polymer film such as polyimide or polyethylene terephthalate, and a Co-Cr sputtered film is formed on one or both sides of the film, and a wear-resistant film is formed on the Co-Cr sputtered film. A film (protective film) is formed. When such a perpendicular magnetic recording medium is applied to a magnetic tape or a floppy disk, information is recorded, reproduced, and erased via a magnetic head.

Co −Cr膜は、アルゴン雰囲気中での通常のスパッ
タリング法或は、マグネトロン・スパッタリング法によ
り形成される。形成されたCo −Cr膜は、C軸に配
向された柱状構造であり、磁気特性としての主として膜
組成によって決まる飽和磁化M3の他に膜面1;垂直な
磁気異方性エネルギKuがきく、高記録密度となる条件
を備えている。
The Co--Cr film is formed by a normal sputtering method or a magnetron sputtering method in an argon atmosphere. The formed Co-Cr film has a columnar structure oriented along the C axis, and in addition to the saturation magnetization M3, which is mainly determined by the film composition as a magnetic property, there is a magnetic anisotropy energy Ku perpendicular to the film surface 1; It has the conditions for high recording density.

ところで、上述の垂直磁気記録媒体を、潤滑油例えばフ
ルオロ・カーボン(フッ素油)を介して磁気ヘッドで同
一トランク上を走行させる走行試験を行なうと、その寿
命が極めて短かいという欠点があった。面内磁化の磁気
記録媒体では、通常1000万バスの寿命が要求される
が、従来の垂直磁気記録媒体では100万パス未満であ
ることがしばしば生じた。最高の寿命でも30萌パスを
超えることは殆ど無い。走行試験での不良を解析すると
、Co −Cr膜の高分子フィルム基体からの剥離の原
従って、磁気記録媒体の長寿命化の為には、強磁性体層
の高分子フィルム基体に対する付着力を増加させること
が重要である。
By the way, when the above-mentioned perpendicular magnetic recording medium was subjected to a running test in which a magnetic head was run on the same trunk with a lubricating oil such as fluorocarbon (fluorocarbon oil) interposed therebetween, the shortcoming was that its lifespan was extremely short. In-plane magnetic recording media typically require a lifetime of 10 million passes, whereas conventional perpendicular magnetic recording media often have a lifespan of less than 1 million passes. Even at the highest lifespan, it rarely exceeds 30 moe passes. Analysis of defects in running tests reveals that the reason for the peeling of the Co-Cr film from the polymer film substrate is that in order to extend the life of the magnetic recording medium, it is necessary to improve the adhesion of the ferromagnetic layer to the polymer film substrate. It is important to increase

(発明の目的) 本発明は、長寿命、高信頼性の磁気記録媒体を提供する
ものである。
(Object of the Invention) The present invention provides a long-life, highly reliable magnetic recording medium.

(発明の概要) 本発明は、特に高分子フィルム基体上に形成される強磁
性体膜が、高分子フィルム基体との界面近傍に酸素濃縮
領域が形成されていることを特徴とする磁気記録媒体で
あり、また高分子フィルム基体をプラズマ酸化処理した
後、磁性体膜を高分子フィルム基体上1=形成すること
を特徴とする磁気記録媒体の製造方法である。
(Summary of the Invention) The present invention particularly provides a magnetic recording medium characterized in that a ferromagnetic film formed on a polymer film substrate has an oxygen enriched region formed near the interface with the polymer film substrate. and a method for manufacturing a magnetic recording medium, characterized in that a magnetic film is formed on the polymer film substrate after the polymer film substrate is subjected to plasma oxidation treatment.

(発明の実施例) 以下、実施例を参照して本発明を説明する。(Example of the invention) The present invention will be described below with reference to Examples.

第1図は本発明の一実施例による垂直磁気記録媒体を示
し、厚さ75μmのポリエチレンテレフタレート(以下
PETと略す)の高分子フィルムからなる基体(1)ノ
両面には、Co −Cr膜(2)、耐摩耗膜(3)及び
潤滑層(4)が形成されている。この垂直磁気記録媒体
の製造には、第2図に示す連続薄膜形成装置を用いた。
FIG. 1 shows a perpendicular magnetic recording medium according to an embodiment of the present invention, in which a Co-Cr film ( 2), a wear-resistant film (3) and a lubricating layer (4) are formed. A continuous thin film forming apparatus shown in FIG. 2 was used to manufacture this perpendicular magnetic recording medium.

膜成形には、高分子フィルム基体の前処理としてプラズ
マ酸化処理後、Co −Cr強磁性体膜及び耐摩耗膜を
マグネトロンスパッタ方式でアルゴン雰囲気中でスパッ
タを行った。垂直磁気記録媒体の具体的な形成方法は次
の如くである。
For film formation, a Co--Cr ferromagnetic film and an abrasion-resistant film were sputtered in an argon atmosphere using a magnetron sputtering method after plasma oxidation treatment as a pretreatment of the polymer film substrate. A specific method for forming the perpendicular magnetic recording medium is as follows.

先ずPliTフィルムの脱ガスを行なう。条件は、例え
ば120°C、I X 1(1’Torr 、 30分
である。脱ガス方法は、第2図に於ける装置では、次の
如くである。PETフィルム(1)の加熱は、主ローラ
Ia及びα4bにより行なう。主ローラα4)a及び(
14) bの中には、図示しないシリコーン油が装填さ
れており、シリコーン油を加熱することにより、主ロー
ラ(I4)a及びubを加熱し、PETフィルム基体(
1)の脱ガスを行なう。脱ガス方法は、例えば、・第2
図に示す如く、一定速度にて、PETフィルム基体(1
)を、供給ローラαυ→補助ローラtt31a→主ロー
ラCL4) a→補助ローラ(1■b→主ローラ(14
b→補助ローラ(L3C→巻取ローラ(1eの順にて走
行させることにより行なう。PETフィルム基体(1)
は、主ローラ(14)、及び(14) bに接して通過
する際に加熱・脱ガスされる。
First, the PliT film is degassed. The conditions are, for example, 120°C, I x 1 (1'Torr, 30 minutes).The degassing method in the apparatus shown in Fig. 2 is as follows.The heating of the PET film (1) is as follows. This is done by main rollers Ia and α4b. Main rollers α4)a and (
14) Silicone oil (not shown) is loaded in b, and by heating the silicone oil, the main rollers (I4) a and ub are heated, and the PET film base (I4) is heated.
1) Perform degassing. The degassing method is, for example,
As shown in the figure, the PET film substrate (1
), supply roller αυ → auxiliary roller tt31a → main roller CL4) a → auxiliary roller (1■b → main roller (14)
This is done by running in the order b → auxiliary roller (L3C → take-up roller (1e). PET film base (1)
is heated and degassed when it passes in contact with the main rollers (14) and (14) b.

次に高周波電極(17)、及び(17) bに高周波を
かけることにより、PETフィルムの両面に亘ってプラ
ズマ酸化を行なう。雰囲気を酸素とし、酸素圧力は、例
えば8 X 10−’Torrであり、RF電力は例え
ば300Wである。概略、投入電力としては0.1乃至
1.5W/″cIIの範囲で行なうことにより効果的に
プラズマ酸化が行なわれる。高分子フィルム基体の処理
時間は、走行速度により制御し得るが、例えば10分行
なう。プラズマ酸化処理は、上述の脱ガスの場合の走行
方向と逆の方向に送り出して行なう。
Next, by applying high frequency to the high frequency electrodes (17) and (17)b, plasma oxidation is performed over both sides of the PET film. The atmosphere is oxygen, the oxygen pressure is, for example, 8 x 10-'Torr, and the RF power is, for example, 300W. In general, plasma oxidation is effectively carried out by inputting power in the range of 0.1 to 1.5 W/''cII. The processing time of the polymer film substrate can be controlled by the running speed, but for example, The plasma oxidation treatment is carried out in the opposite direction to the traveling direction in the case of degassing described above.

次に雰囲気をアルゴンに変えて、また主ローラ114)
 a及び<141 bの温度を例えば90′c!=下げ
て強磁性体膜Co −Cr膜を形成する。プラズマ酸化
処理により供給ロールα])にPETPE外ム基体(1
)を巻取っているので、PETフィルム基体(1)を、
脱ガス処理と同じ走行方向に送り出し、主ローラ(I4
)a上を基体(1)が走行する際に主ローラα4)aと
対向して置かれたスパッタ・ターゲラ) (15mから
基体(1)上にCo −Cr膜を被着形成することによ
って連続薄膜を形成する。
Next, change the atmosphere to argon and return to the main roller 114).
a and <141 b, for example 90'c! = lower to form a ferromagnetic film Co--Cr film. A PETPE outer membrane substrate (1
), the PET film base (1) is rolled up.
The main roller (I4
) When the substrate (1) runs on the main roller α4) a, the sputter target roller placed opposite the main roller Forms a thin film.

さらに両面に記録膜を有するフロッピー・ディスクを作
る場合にはスパッタ・ターゲット(15aからPETフ
ィルム基体(1)の片面にCo −Crの薄膜を形成し
た後、主ローラα4)a→補助ローラa31b→主ロー
ラ(14) bとPETフィルム基体(1)を送り出し
、主ローラ(14) b上を基体(1)が走行する際に
、主ローラ(14)bと対向して置かれたスパッタ・タ
ーゲット(1!1ilbから、基体(1)の他の面にC
o −Cr膜を形成する。
Furthermore, when making a floppy disk with recording films on both sides, after forming a Co-Cr thin film on one side of the PET film substrate (1) from the sputter target (15a), the main roller α4) a→auxiliary roller a31b→ The main roller (14) b and the PET film substrate (1) are sent out, and when the substrate (1) runs on the main roller (14) b, a sputter target placed opposite the main roller (14) b (From 1!1ilb, C on the other side of the base (1)
Form o-Cr film.

次いで補助ローラ1131c→巻取りローラ161と走
行し巻き取る。
Next, it travels from the auxiliary roller 1131c to the winding roller 161 and winds it up.

上述の如く、供給ローラαυより出たPETフィルム基
体は、脱ガス処理された後巻取りローラ・σQに巻取ら
れ、フィルム基体のプラズマ酸化工程を経て、更に両面
にCo −Cr膜が形成された後、巻取りローラ顛に巻
取られる。Co −Cr膜用のターゲットとしては、1
20−關X250關X8鴎、 Co −21(at%)
Cr組成のものを用い、膜厚5000^を上述の方法に
より両面に形成した。
As mentioned above, the PET film substrate discharged from the supply roller αυ is degassed and then wound onto the take-up roller σQ, and the film substrate undergoes a plasma oxidation process, and a Co-Cr film is further formed on both sides. After that, it is wound up on a winding roller. As a target for Co-Cr film, 1
20-X250X8, Co-21 (at%)
A film having a Cr composition was used, and a film thickness of 5000^ was formed on both sides by the method described above.

次にターゲラ)(15)as(isbとして耐摩耗膜用
例えば酸化アルミニウム膜形成用のターゲットに交\ビ 換する酸化アルミニウム膜形成用のターゲットは、Co
 −Cr膜用と同じ寸法で酸化アルミニウムの焼結体を
用いる。上述と同様の走行方法!−より、 C。
Next, the target for forming an aluminum oxide film is Co
- A sintered body of aluminum oxide with the same dimensions as for the Cr film is used. Driving method similar to above! - from C.

−Cr膜上に両面に亘ってアルゴン雰囲気中で約200
又マダイ・トロン・スパッタを行ない、耐摩耗膜として
酸化アルミニウム膜を形成する。耐摩耗膜は、酸化アル
ミニウムの他、酸化シリコン、酸化ジルコニウム等の金
執酸化物や電化シリコンや窒化チタンのような窒化物で
もよい。
-Approximately 200% on both sides of the Cr film in an argon atmosphere
Further, red tron sputtering is performed to form an aluminum oxide film as a wear-resistant film. In addition to aluminum oxide, the wear-resistant film may be a metal oxide such as silicon oxide or zirconium oxide, or a nitride such as electrified silicon or titanium nitride.

本発明による高分子フィルム基体をプラズマ酸化処理し
た後、強磁性体膜を形成した垂直磁気記録媒体と、プラ
ズマ酸化処理を施さない従来技術の垂直磁気記録媒体と
を、同一トラック上での走行試験による寿命試験を行な
った。寿命試験の結果を第3図に示す。潤滑油はフルオ
ロ・カーボンを用いて行ない、ナンブル数はそれぞれ1
0個である。図中の丸印はその平均値を示す。同図から
明らかなように、プラズマ酸化処理を施した高分子フィ
ルム基体上に強磁性体膜を形成したものは、寿命が飛躍
的に向上する。
A perpendicular magnetic recording medium in which a ferromagnetic film was formed after plasma oxidizing a polymer film substrate according to the present invention and a conventional perpendicular magnetic recording medium without plasma oxidizing treatment were tested on the same track. A lifespan test was conducted. The results of the life test are shown in Figure 3. Fluorocarbon is used as the lubricating oil, and each number is 1.
There are 0 pieces. The circles in the figure indicate the average values. As is clear from the figure, the life of a device in which a ferromagnetic film is formed on a polymer film substrate that has been subjected to plasma oxidation treatment is dramatically improved.

強磁性体膜としてCo−Crを用いた場合の本発明によ
る磁気記録媒体の、強磁性体膜と高分子フィルム界面近
付をオージェ電子分光法によりCo。
In the magnetic recording medium according to the present invention in which Co--Cr is used as the ferromagnetic film, the vicinity of the interface between the ferromagnetic film and the polymer film is analyzed by Auger electron spectroscopy.

Cr 、 O、C及びNの深さ方向の濃度分布を分析し
た結果を第4図に示す。第4図よりCo −Cr強強性
性体膜高分子フィルム基体との界面に、酸素濃縮領域が
形成されていることが判る。この酸素濃縮領域(酸化層
)が強磁性体膜と高分子フィルム基体との付着力を増加
させ、長寿命化6二寄与している。
Figure 4 shows the results of analyzing the concentration distribution of Cr, O, C, and N in the depth direction. It can be seen from FIG. 4 that an oxygen-enriched region is formed at the interface between the Co--Cr strong material film and the polymer film substrate. This oxygen enriched region (oxidized layer) increases the adhesion between the ferromagnetic film and the polymer film substrate, contributing to longer life.

なお上述の実施例では、高分子フィルム基体としてポリ
エチレンテレブタレートを用いたが、他の高分子フィル
ム例えばポリイミドフィルムにおいても同様な効果が得
られ、オージェ電子分光法の結果も一致した。
Although polyethylene terebutarate was used as the polymer film substrate in the above-mentioned examples, similar effects were obtained with other polymer films such as polyimide films, and the results of Auger electron spectroscopy were also consistent.

なお、上述実施例では酸素分圧を8 X 1O−ITo
rrとしてプラズマ酸化処理を行ったが、酸素分圧はコ
ンベンショナル方式、スパッタ方式等放電の方式により
変り得る。即ちコンベンショナル方式では導入酸素圧力
を高くすることが可能であり(例えば10″″”Tor
r台)、またスパッタ方式では尋人酸素圧力を低くする
ことが可能である(例えば1O−5Torr台)。プラ
ズマ酸化処理を施した高分子フィルム基体上に形成され
たCo −Cr膜の磁気特性は未処理のものと殆ど変ら
ず、保磁力として1000θ。
In addition, in the above-mentioned example, the oxygen partial pressure was 8
Although plasma oxidation treatment was performed as rr, the oxygen partial pressure may vary depending on the discharge method such as conventional method or sputter method. That is, in the conventional method, it is possible to increase the introduced oxygen pressure (for example, 10"" Torr).
Furthermore, in the sputtering method, it is possible to lower the oxygen pressure (for example, on the order of 10-5 Torr). The magnetic properties of the Co-Cr film formed on the polymer film substrate subjected to plasma oxidation treatment are almost the same as those of the untreated one, with a coercive force of 1000θ.

のちのが得られた。The later one was obtained.

また、上述の実施例では、強磁性体膜の高分子フィルム
基体との界面での酸素濃縮領域の形成を、高分子フィル
、ムのプラズマ酸化という前処理によって行なったが、
強磁性体膜形成時のフィルム基体へのプラズマの流入量
や基板温度を変えることによっても形成できる。
Furthermore, in the above-mentioned examples, the formation of an oxygen-enriched region at the interface between the ferromagnetic film and the polymer film substrate was carried out by pretreatment of plasma oxidation of the polymer film.
It can also be formed by changing the amount of plasma flowing into the film substrate or the substrate temperature during formation of the ferromagnetic film.

更に、上述実施例では強磁性合金層がCo−Cr膜単層
の場合につき説明したが、Co −Crの膜の下地とし
てFe−Ni合金を基とするパーマロイ等の軟磁性層を
裏打ちした場合にも、高分子フィルム基体をプラズマ酸
化する本発明の製造方法が適用できる。またCo −C
r合金のみならずCoを基とする他の強磁性合金にも本
発明は適用できる。
Furthermore, in the above embodiments, the case where the ferromagnetic alloy layer is a single layer of Co--Cr film was explained, but in the case where the ferromagnetic alloy layer is lined with a soft magnetic layer such as permalloy based on Fe-Ni alloy as the base of the Co--Cr film. The manufacturing method of the present invention, which involves plasma oxidation of a polymer film substrate, can also be applied to the following. Also, Co -C
The present invention is applicable not only to r-alloys but also to other ferromagnetic alloys based on Co.

(発明の効果) 本発明によれば、高分子フィルム基体と強磁性体膜との
付着力が向上し、長寿命の磁気記録媒体が得られる。
(Effects of the Invention) According to the present invention, the adhesion between the polymer film substrate and the ferromagnetic film is improved, and a long-life magnetic recording medium can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は垂直磁気記録媒体の断面図、第2図は連続薄膜
形成装置の概略を示す図、第3図は本発明及び従来技術
の垂直磁気記録媒体の寿命特性を比較して示す図、第4
図は本発明の一実施例の垂直磁気記録媒体におけるCo
、Cr、0.N及びCの深さ方向の濃度分布を示す図で
ある。 (1)・・・高分子フィルム基体、(2)・・・Co 
−Cr膜(3)・・・耐摩耗膜v      (14a
*(t41b・・・主ローラP9at(2)b・・・ス
パッタ・ターゲット。 代理人 弁理士 則 近 憲 佑(ほか1名)第1図 4  。 第2図
FIG. 1 is a cross-sectional view of a perpendicular magnetic recording medium, FIG. 2 is a diagram showing an outline of a continuous thin film forming apparatus, and FIG. 3 is a diagram showing a comparison of the life characteristics of perpendicular magnetic recording media of the present invention and the prior art. Fourth
The figure shows Co in a perpendicular magnetic recording medium according to an embodiment of the present invention.
, Cr, 0. FIG. 3 is a diagram showing the concentration distribution of N and C in the depth direction. (1)...polymer film base, (2)...Co
-Cr film (3)...wear-resistant film v (14a
*(t41b...Main roller P9at(2)b...Spatter target. Agent: Patent attorney Noriyuki Chika (and one other person) Fig. 1 4. Fig. 2

Claims (2)

【特許請求の範囲】[Claims] (1)高分子フィルム基体と、この高分子フィルム基体
上に形成された強磁性体膜を有する磁気記録媒体におい
て、前記強磁性体膜の前記高分子フィルム基体と接する
界面近傍の領域に酸素濃縮領域が形成されていることを
特徴とする磁気記録媒体。
(1) In a magnetic recording medium having a polymer film substrate and a ferromagnetic film formed on the polymer film substrate, oxygen concentration occurs in a region near the interface of the ferromagnetic film in contact with the polymer film substrate. A magnetic recording medium characterized in that a region is formed.
(2)高分子フィルム基体を酸化性雰囲気下でプラズマ
酸化処理する工程と、この高分子フィルム基体上に磁性
体膜を形成する工程とを有することを特徴とする磁気記
録媒体の製造方法。
(2) A method for producing a magnetic recording medium, comprising the steps of plasma oxidizing a polymer film substrate in an oxidizing atmosphere and forming a magnetic film on the polymer film substrate.
JP59214205A 1984-10-15 1984-10-15 Magnetic recording medium and manufacturing method thereof Expired - Lifetime JPH0778865B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59214205A JPH0778865B2 (en) 1984-10-15 1984-10-15 Magnetic recording medium and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59214205A JPH0778865B2 (en) 1984-10-15 1984-10-15 Magnetic recording medium and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPS6194220A true JPS6194220A (en) 1986-05-13
JPH0778865B2 JPH0778865B2 (en) 1995-08-23

Family

ID=16651971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59214205A Expired - Lifetime JPH0778865B2 (en) 1984-10-15 1984-10-15 Magnetic recording medium and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JPH0778865B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009013473A (en) * 2007-07-05 2009-01-22 Dainippon Printing Co Ltd Thin-film-forming apparatus and thin-film-forming method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5877030A (en) * 1981-10-31 1983-05-10 Hitachi Maxell Ltd Magnetic recording medium and production thereof
JPS5883328A (en) * 1981-11-12 1983-05-19 Fuji Photo Film Co Ltd Magnetic recording medium
JPS59167830A (en) * 1983-03-14 1984-09-21 Hitachi Maxell Ltd Magnetic recording medium

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5877030A (en) * 1981-10-31 1983-05-10 Hitachi Maxell Ltd Magnetic recording medium and production thereof
JPS5883328A (en) * 1981-11-12 1983-05-19 Fuji Photo Film Co Ltd Magnetic recording medium
JPS59167830A (en) * 1983-03-14 1984-09-21 Hitachi Maxell Ltd Magnetic recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009013473A (en) * 2007-07-05 2009-01-22 Dainippon Printing Co Ltd Thin-film-forming apparatus and thin-film-forming method

Also Published As

Publication number Publication date
JPH0778865B2 (en) 1995-08-23

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