JPS6186472U - - Google Patents
Info
- Publication number
- JPS6186472U JPS6186472U JP17266784U JP17266784U JPS6186472U JP S6186472 U JPS6186472 U JP S6186472U JP 17266784 U JP17266784 U JP 17266784U JP 17266784 U JP17266784 U JP 17266784U JP S6186472 U JPS6186472 U JP S6186472U
- Authority
- JP
- Japan
- Prior art keywords
- cap
- gas introduction
- reaction tube
- gas
- supply port
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 239000000376 reactant Substances 0.000 claims 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第１図は本考案を実施した反応管とキヤツプと
の接合部の構造を示す側断面図、第２図は反応管
接合部の正面図、第３図はキヤツプ接合部の正面
図、第４図は従来のＣＶＤ装置の側断面図、であ
る。
図において、１は反応管、３はウエハ、５，１
１，１２は給気口、７，８，１０はキヤツプ、１
３，１４は導入路、１５，１６は吹出し口、１７
，１８は０リング、９は反応管フランジ、である
。
Fig. 1 is a side sectional view showing the structure of the joint between the reaction tube and the cap in which the present invention is implemented, Fig. 2 is a front view of the reaction tube joint, Fig. 3 is a front view of the cap joint, and Fig. 4 is a front view of the joint of the reaction tube and the cap. The figure is a side sectional view of a conventional CVD apparatus. In the figure, 1 is a reaction tube, 3 is a wafer, 5, 1
1, 12 are air supply ports, 7, 8, 10 are caps, 1
3 and 14 are inlet passages, 15 and 16 are outlet ports, and 17
, 18 is an O-ring, and 9 is a reaction tube flange.
Claims (1)
供給口より管壁内を通つてガスの導入路が設けら
れており、０リングにより該反応管と接合するキ
ヤツプの内部に前記ガス導入路と接続するガス導
入路が設けられ、該ガス導入路がキヤツプの内側
に開口していることを特徴とする化学気相成長装
置。 There is a reactant gas supply port on the outer wall of the reaction tube, and a gas introduction path is provided from the supply port through the inside of the tube wall, and the gas is introduced into the inside of the cap that is connected to the reaction tube with an O-ring. What is claimed is: 1. A chemical vapor deposition apparatus characterized in that a gas introduction passage connected to a cap is provided, and the gas introduction passage opens inside a cap.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17266784U JPH0213494Y2 (en) | 1984-11-14 | 1984-11-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17266784U JPH0213494Y2 (en) | 1984-11-14 | 1984-11-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6186472U true JPS6186472U (en) | 1986-06-06 |
| JPH0213494Y2 JPH0213494Y2 (en) | 1990-04-13 |
Family
ID=30730330
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17266784U Expired JPH0213494Y2 (en) | 1984-11-14 | 1984-11-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0213494Y2 (en) |
-
1984
- 1984-11-14 JP JP17266784U patent/JPH0213494Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0213494Y2 (en) | 1990-04-13 |