JPS61147274U - - Google Patents
Info
- Publication number
- JPS61147274U JPS61147274U JP2745885U JP2745885U JPS61147274U JP S61147274 U JPS61147274 U JP S61147274U JP 2745885 U JP2745885 U JP 2745885U JP 2745885 U JP2745885 U JP 2745885U JP S61147274 U JPS61147274 U JP S61147274U
- Authority
- JP
- Japan
- Prior art keywords
- flange
- reaction tube
- reaction
- exhaust side
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 239000003566 sealing material Substances 0.000 claims 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第１図は本考案を実施したＣＶＤ装置の断面図
、第２図はこの排気側の部分拡大図で、同図Ａは
断面図または同図Ｂは排気側からの正面図、第３
図は従来のＣＶＤ装置の断面図、である。
図において、１，１１は反応管、２，３，１４
はフランジ、５はウエハ、８はＮＨ４Ｃｌ、１２
は外側部分、１３は内側部分、１５は鍔、１６は
０リング、１７は先端、である。
Figure 1 is a cross-sectional view of a CVD apparatus embodying the present invention, Figure 2 is a partially enlarged view of the exhaust side, Figure A is a cross-sectional view, Figure B is a front view from the exhaust side, Figure 3
The figure is a sectional view of a conventional CVD apparatus. In the figure, 1, 11 are reaction tubes, 2, 3, 14
is a flange, 5 is a wafer, 8 is NH 4 Cl, 12
13 is the outer part, 13 is the inner part, 15 is the collar, 16 is the O-ring, and 17 is the tip.
Claims (1)
管の排気側がフランジとシール材を介して接合さ
れる外側部分と、該フランジ内に挿入される内側
部分との二重の管構造を備えて形成されてなるこ
とを特徴とする化学気相成長装置。 A reaction tube into which a reaction gas is introduced is provided, and the exhaust side of the reaction tube has a double tube structure including an outer portion joined to a flange via a sealing material and an inner portion inserted into the flange. A chemical vapor deposition apparatus characterized in that it is formed by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2745885U JPS61147274U (en) | 1985-02-27 | 1985-02-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2745885U JPS61147274U (en) | 1985-02-27 | 1985-02-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61147274U true JPS61147274U (en) | 1986-09-11 |
Family
ID=30524431
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2745885U Pending JPS61147274U (en) | 1985-02-27 | 1985-02-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61147274U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04230022A (en) * | 1990-06-13 | 1992-08-19 | Internatl Business Mach Corp <Ibm> | Super vacuum chemical deposition re- actor device |
-
1985
- 1985-02-27 JP JP2745885U patent/JPS61147274U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04230022A (en) * | 1990-06-13 | 1992-08-19 | Internatl Business Mach Corp <Ibm> | Super vacuum chemical deposition re- actor device |