JPH0289828U - - Google Patents
Info
- Publication number
- JPH0289828U JPH0289828U JP16999488U JP16999488U JPH0289828U JP H0289828 U JPH0289828 U JP H0289828U JP 16999488 U JP16999488 U JP 16999488U JP 16999488 U JP16999488 U JP 16999488U JP H0289828 U JPH0289828 U JP H0289828U
- Authority
- JP
- Japan
- Prior art keywords
- quartz furnace
- core tube
- mixing chamber
- furnace core
- quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010453 quartz Substances 0.000 claims 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 5
- 238000009792 diffusion process Methods 0.000 claims 2
- 239000012535 impurity Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
Description
第１図ａは本考案の第１の実施例の縦断面図、
同図ｂは同図ａのＡ−Ａ断面図、第２図ａは本考
案の第２の実施例の縦断面図、同図ｂは同図ａの
Ａ−Ａ断面図、第３図は従来の炉芯管の側面図で
ある。
１，７……混合室、２，３……ノズル、４，８
……遮へい板、５……炉芯管本体、６……継手、
９……配管。
FIG. 1a is a longitudinal sectional view of the first embodiment of the present invention;
Figure b is a sectional view taken along line A-A in figure a, Figure 2 a is a vertical cross-sectional view of the second embodiment of the present invention, Figure b is a cross-sectional view taken along line A-A in figure a, and Figure 3 is a cross-sectional view taken along line A-A in figure a. FIG. 3 is a side view of a conventional furnace core tube. 1,7...Mixing chamber, 2,3...Nozzle, 4,8
...shielding plate, 5 ... furnace core tube body, 6 ... joint,
9...Piping.
Claims (1)
れる拡散炉の石英炉芯管装置において、石英炉芯
管本体の前部にこの石英炉芯管本体に導入される
反応ガスの混合室を有し、かつこの混合室が前記
石英炉芯管本体と取外し自由に接続されているこ
とを特徴とする石英炉芯管装置。 A quartz furnace core tube device for a diffusion furnace used in an impurity diffusion process for semiconductor device manufacturing, which has a mixing chamber for a reaction gas introduced into the quartz furnace core tube body in the front part of the quartz furnace core tube body, and A quartz furnace tube device characterized in that the mixing chamber is detachably connected to the quartz furnace tube main body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988169994U JPH0745954Y2 (en) | 1988-12-28 | 1988-12-28 | Quartz furnace core tube device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988169994U JPH0745954Y2 (en) | 1988-12-28 | 1988-12-28 | Quartz furnace core tube device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0289828U true JPH0289828U (en) | 1990-07-17 |
| JPH0745954Y2 JPH0745954Y2 (en) | 1995-10-18 |
Family
ID=31460550
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988169994U Expired - Lifetime JPH0745954Y2 (en) | 1988-12-28 | 1988-12-28 | Quartz furnace core tube device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0745954Y2 (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59104123A (en) * | 1982-12-07 | 1984-06-15 | Toshiba Corp | Impurity diffusion device |
| JPS6273535U (en) * | 1985-10-29 | 1987-05-11 | ||
| JPS62278273A (en) * | 1986-05-26 | 1987-12-03 | Nec Corp | Plasma cvd device |
| JPS63200537A (en) * | 1987-02-16 | 1988-08-18 | Canon Inc | Apparatus for forming silicon oxide film |
-
1988
- 1988-12-28 JP JP1988169994U patent/JPH0745954Y2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59104123A (en) * | 1982-12-07 | 1984-06-15 | Toshiba Corp | Impurity diffusion device |
| JPS6273535U (en) * | 1985-10-29 | 1987-05-11 | ||
| JPS62278273A (en) * | 1986-05-26 | 1987-12-03 | Nec Corp | Plasma cvd device |
| JPS63200537A (en) * | 1987-02-16 | 1988-08-18 | Canon Inc | Apparatus for forming silicon oxide film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0745954Y2 (en) | 1995-10-18 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |