JPS6176459A - アセチレン基含有イミド - Google Patents

アセチレン基含有イミド

Info

Publication number
JPS6176459A
JPS6176459A JP59196426A JP19642684A JPS6176459A JP S6176459 A JPS6176459 A JP S6176459A JP 59196426 A JP59196426 A JP 59196426A JP 19642684 A JP19642684 A JP 19642684A JP S6176459 A JPS6176459 A JP S6176459A
Authority
JP
Japan
Prior art keywords
bis
dicarboxyphenoxy
anhydride
acetylene
ethynylphenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59196426A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0522699B2 (enrdf_load_stackoverflow
Inventor
Mitsutoshi Aritomi
有富　充利
Hideyori Fujiwara
英資 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Petrochemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Petrochemical Co Ltd filed Critical Mitsubishi Petrochemical Co Ltd
Priority to JP59196426A priority Critical patent/JPS6176459A/ja
Publication of JPS6176459A publication Critical patent/JPS6176459A/ja
Publication of JPH0522699B2 publication Critical patent/JPH0522699B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Indole Compounds (AREA)
JP59196426A 1984-09-19 1984-09-19 アセチレン基含有イミド Granted JPS6176459A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59196426A JPS6176459A (ja) 1984-09-19 1984-09-19 アセチレン基含有イミド

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59196426A JPS6176459A (ja) 1984-09-19 1984-09-19 アセチレン基含有イミド

Publications (2)

Publication Number Publication Date
JPS6176459A true JPS6176459A (ja) 1986-04-18
JPH0522699B2 JPH0522699B2 (enrdf_load_stackoverflow) 1993-03-30

Family

ID=16357645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59196426A Granted JPS6176459A (ja) 1984-09-19 1984-09-19 アセチレン基含有イミド

Country Status (1)

Country Link
JP (1) JPS6176459A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005281428A (ja) * 2004-03-29 2005-10-13 Sumitomo Bakelite Co Ltd エポキシ樹脂組成物およびそれを用いた半導体装置
JP2009046622A (ja) * 2007-08-22 2009-03-05 Fujifilm Corp 膜形成用組成物、膜及び電子デバイス
JP2014051538A (ja) * 2012-09-05 2014-03-20 Mitsubishi Gas Chemical Co Inc 芳香族ポリカーボネート樹脂組成物および成形品
WO2019039254A1 (ja) * 2017-08-23 2019-02-28 宇部興産株式会社 電極用バインダー樹脂、電極合剤ペースト、電極、及び電極の製造方法
EP3725772A1 (en) * 2019-04-16 2020-10-21 Shin-Etsu Chemical Co., Ltd. Compounds and materials for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process
US20200348595A1 (en) * 2018-01-23 2020-11-05 Jsr Corporation Composition, film, and production method of patterned substrate
US11500292B2 (en) 2019-04-16 2022-11-15 Shin-Etsu Chemical Co., Ltd. Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005281428A (ja) * 2004-03-29 2005-10-13 Sumitomo Bakelite Co Ltd エポキシ樹脂組成物およびそれを用いた半導体装置
JP2009046622A (ja) * 2007-08-22 2009-03-05 Fujifilm Corp 膜形成用組成物、膜及び電子デバイス
JP2014051538A (ja) * 2012-09-05 2014-03-20 Mitsubishi Gas Chemical Co Inc 芳香族ポリカーボネート樹脂組成物および成形品
WO2019039254A1 (ja) * 2017-08-23 2019-02-28 宇部興産株式会社 電極用バインダー樹脂、電極合剤ペースト、電極、及び電極の製造方法
US20200348595A1 (en) * 2018-01-23 2020-11-05 Jsr Corporation Composition, film, and production method of patterned substrate
EP3725772A1 (en) * 2019-04-16 2020-10-21 Shin-Etsu Chemical Co., Ltd. Compounds and materials for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process
KR20200121757A (ko) * 2019-04-16 2020-10-26 신에쓰 가가꾸 고교 가부시끼가이샤 유기막 형성용 재료, 반도체 장치 제조용 기판, 유기막의 형성 방법, 패턴 형성 방법, 및 유기막 형성용 화합물
JP2020177225A (ja) * 2019-04-16 2020-10-29 信越化学工業株式会社 有機膜形成用材料、半導体装置製造用基板、有機膜の形成方法、パターン形成方法、及び有機膜形成用化合物
US11500292B2 (en) 2019-04-16 2022-11-15 Shin-Etsu Chemical Co., Ltd. Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film
US11692066B2 (en) 2019-04-16 2023-07-04 Shin-Etsu Chemical Co., Ltd. Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film

Also Published As

Publication number Publication date
JPH0522699B2 (enrdf_load_stackoverflow) 1993-03-30

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