JPS6175522A - 縮小投影式アライメント装置 - Google Patents

縮小投影式アライメント装置

Info

Publication number
JPS6175522A
JPS6175522A JP59196645A JP19664584A JPS6175522A JP S6175522 A JPS6175522 A JP S6175522A JP 59196645 A JP59196645 A JP 59196645A JP 19664584 A JP19664584 A JP 19664584A JP S6175522 A JPS6175522 A JP S6175522A
Authority
JP
Japan
Prior art keywords
alignment
wafer
pattern
reticle
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59196645A
Other languages
English (en)
Japanese (ja)
Other versions
JPH036650B2 (OSRAM
Inventor
Yoshisada Oshida
良忠 押田
Masataka Shiba
正孝 芝
Naoto Nakajima
直人 中島
Toshihiko Nakada
俊彦 中田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59196645A priority Critical patent/JPS6175522A/ja
Priority to US06/762,329 priority patent/US4701050A/en
Publication of JPS6175522A publication Critical patent/JPS6175522A/ja
Publication of JPH036650B2 publication Critical patent/JPH036650B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59196645A 1984-08-10 1984-09-21 縮小投影式アライメント装置 Granted JPS6175522A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59196645A JPS6175522A (ja) 1984-09-21 1984-09-21 縮小投影式アライメント装置
US06/762,329 US4701050A (en) 1984-08-10 1985-08-05 Semiconductor exposure apparatus and alignment method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59196645A JPS6175522A (ja) 1984-09-21 1984-09-21 縮小投影式アライメント装置

Publications (2)

Publication Number Publication Date
JPS6175522A true JPS6175522A (ja) 1986-04-17
JPH036650B2 JPH036650B2 (OSRAM) 1991-01-30

Family

ID=16361216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59196645A Granted JPS6175522A (ja) 1984-08-10 1984-09-21 縮小投影式アライメント装置

Country Status (1)

Country Link
JP (1) JPS6175522A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02293748A (ja) * 1989-05-08 1990-12-04 Matsushita Electron Corp マスクならびにマスクとウエーハとの位置合わせ方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
JPS58112330A (ja) * 1981-12-25 1983-07-04 Nippon Kogaku Kk <Nikon> 投影型露光装置
JPS58162039A (ja) * 1982-03-23 1983-09-26 Nippon Kogaku Kk <Nikon> 投影型露光装置
JPS58162954A (ja) * 1982-03-24 1983-09-27 Nippon Kogaku Kk <Nikon> 投影型露光装置
JPS58165326A (ja) * 1982-03-09 1983-09-30 ウロマスク 集積回路製造機の整合装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
JPS58112330A (ja) * 1981-12-25 1983-07-04 Nippon Kogaku Kk <Nikon> 投影型露光装置
JPS58165326A (ja) * 1982-03-09 1983-09-30 ウロマスク 集積回路製造機の整合装置
JPS58162039A (ja) * 1982-03-23 1983-09-26 Nippon Kogaku Kk <Nikon> 投影型露光装置
JPS58162954A (ja) * 1982-03-24 1983-09-27 Nippon Kogaku Kk <Nikon> 投影型露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02293748A (ja) * 1989-05-08 1990-12-04 Matsushita Electron Corp マスクならびにマスクとウエーハとの位置合わせ方法

Also Published As

Publication number Publication date
JPH036650B2 (OSRAM) 1991-01-30

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term