JPS6166356U - - Google Patents

Info

Publication number
JPS6166356U
JPS6166356U JP1984150948U JP15094884U JPS6166356U JP S6166356 U JPS6166356 U JP S6166356U JP 1984150948 U JP1984150948 U JP 1984150948U JP 15094884 U JP15094884 U JP 15094884U JP S6166356 U JPS6166356 U JP S6166356U
Authority
JP
Japan
Prior art keywords
ion beam
mask
reticle
ion
cassette
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1984150948U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6312349Y2 (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1984150948U priority Critical patent/JPS6312349Y2/ja
Publication of JPS6166356U publication Critical patent/JPS6166356U/ja
Application granted granted Critical
Publication of JPS6312349Y2 publication Critical patent/JPS6312349Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP1984150948U 1984-10-05 1984-10-05 Expired JPS6312349Y2 (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1984150948U JPS6312349Y2 (enExample) 1984-10-05 1984-10-05

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1984150948U JPS6312349Y2 (enExample) 1984-10-05 1984-10-05

Publications (2)

Publication Number Publication Date
JPS6166356U true JPS6166356U (enExample) 1986-05-07
JPS6312349Y2 JPS6312349Y2 (enExample) 1988-04-08

Family

ID=30709080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1984150948U Expired JPS6312349Y2 (enExample) 1984-10-05 1984-10-05

Country Status (1)

Country Link
JP (1) JPS6312349Y2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62174765A (ja) * 1985-10-02 1987-07-31 Seiko Instr & Electronics Ltd マスクリペア装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62174765A (ja) * 1985-10-02 1987-07-31 Seiko Instr & Electronics Ltd マスクリペア装置

Also Published As

Publication number Publication date
JPS6312349Y2 (enExample) 1988-04-08

Similar Documents

Publication Publication Date Title
US4548883A (en) Correction of lithographic masks
KR960002722A (ko) 외부 미립자의 위치 조정 방법과 분석 방법 그리고 이에 사용되는 분석기
TW201447477A (zh) 清洗光罩之裝置與方法
JPS627540B2 (enExample)
JPS60201626A (ja) 位置合わせ装置
JPS6453418A (en) Wafer aligning system
US20020155359A1 (en) Dual-member pellicle assemblies and methods of use
JPS5865436A (ja) 機械式レチクル検査装置
JPS6166356U (enExample)
AT386297B (de) Ionenstrahlgeraet und verfahren zur ausfuehrung von aenderungen, insbes. reparaturen an substraten unter verwendung eines ionenstrahlgeraetes
JP2644741B2 (ja) プロキシミティ露光方法およびその装置
JPS63155145A (ja) マスクの白点欠陥修正方法
JPH0121307Y2 (enExample)
JPH08257770A (ja) アブレーション現像方法およびその装置
JP2561933B2 (ja) パターン膜修正装置
JPS61212843A (ja) 露光装置
JPH01216529A (ja) X線露光用マスクの製造方法
JPS6237387B2 (enExample)
JPS6339894B2 (enExample)
JP2000047371A (ja) 集束イオンビーム装置の電荷中和方法
JPH06290732A (ja) 質量分析計
JP2002184307A (ja) ディスプレイ装置の製造方法およびレーザ加工装置
JPH06124684A (ja) 質量分析計
JPS62134647A (ja) 異物検査装置
JPS6166346U (enExample)