JPS6161218A - Manufacture of thin film magnetic head - Google Patents

Manufacture of thin film magnetic head

Info

Publication number
JPS6161218A
JPS6161218A JP18321784A JP18321784A JPS6161218A JP S6161218 A JPS6161218 A JP S6161218A JP 18321784 A JP18321784 A JP 18321784A JP 18321784 A JP18321784 A JP 18321784A JP S6161218 A JPS6161218 A JP S6161218A
Authority
JP
Japan
Prior art keywords
thin film
conductive
coil pattern
forming
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18321784A
Other languages
Japanese (ja)
Inventor
Mikio Kitamura
幹夫 北村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Original Assignee
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Manufacturing Co Ltd, Kansai Nippon Electric Co Ltd filed Critical Renesas Semiconductor Manufacturing Co Ltd
Priority to JP18321784A priority Critical patent/JPS6161218A/en
Publication of JPS6161218A publication Critical patent/JPS6161218A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

Abstract

PURPOSE:To prevent occurrence of defective level differences on an insulating layer at the time of forming an conductive coil pattern by forming a conductive film wholly beforehand when providing the conductive coil pattern, and making the conducting coil pattern by partial oxidation by an anodic oxidation process. CONSTITUTION:A thin film 2 is formed over the whole surface on an end side on a substrate 1, and through-holes are provided at several places. Then, a conductive film 8' of Al is formed on the thin film 2 including the through-hole s. Resists 9, 9- insoluble in an anodic oxidation solution are coated on intended parts 8'', 8''- for forming coil pattern in the conductive coil 8'. The body of the substrate 1 is immersed in the anodic oxidation solution, and an electric current is applied by using the substrate 1 as an anode and the anodic oxidation solution as a cathode to anodize the parts 10, 10- of the conductive film 8' not covered by resists 9, 9-. Then, the resists 9, 9- are stripped off and a conductive layer 11 is formed on the conductive coil patterns 8, 8- and oxidized parts 10, 10- and a ferromagnetic thin film 12 is formed.

Description

【発明の詳細な説明】 この発明は、DATやコンビコータ等の磁気記録装置の
R/ W用磁気ヘッドの製造方法であり、詳しくはその
導電コイル形成技術に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention is a method of manufacturing a magnetic head for R/W of a magnetic recording device such as a DAT or a combi coater, and specifically relates to a technique for forming a conductive coil.

従来の技術 最近DAT(デジタル・オーディオ・テープレコーダ)
ヲ初メ、POM(パルス・コード・モジュレーション)
記録を行わせる磁気記録装置は、アナログ信号をディジ
タル化するための多量の情報量の処理を要し、従来の磁
気記録装置よりも一段と、高記録密度化が要求されてい
る。そしてDAT等では、磁気テープの線記録密度は、
限界に近づきつつあり、今後これを飛躍的に改善するこ
とが期待できない。そこで、DλT等では、従来のバル
クヘッドに代り、高トラツク密度化が容易な薄膜ヘッド
が賞用され始めている。しかしながら、薄膜−・ラドけ
、子の導電コイル形成技術が、未だ確立しておらず、次
に述べる上部コアの磁束乱れを惹起する欠点があった。
Conventional technology Recent DAT (digital audio tape recorder)
First time, POM (Pulse Code Modulation)
Magnetic recording devices that perform recording are required to process a large amount of information in order to digitize analog signals, and are required to have a higher recording density than conventional magnetic recording devices. For DAT, etc., the linear recording density of magnetic tape is
We are approaching the limit, and there is no hope that we will be able to dramatically improve this in the future. Therefore, in DλT and the like, thin film heads, which can easily achieve high track density, are beginning to be used instead of conventional bulk heads. However, the technology for forming a thin film conductive coil has not yet been established, and there is a drawback in that it causes magnetic flux disturbance in the upper core, which will be described below.

すなわち、薄膜ヘッドは、一般に第6図に示すように、
下部コアとなる基板1上に、磁気ギャップを形成するた
めの非磁性体薄膜2を形成しておき、その薄膜2上に数
回巻回する導電コイルパターン3と、薄膜2以外で基板
1と直接接合し、かつ絶縁層4を介してitコイルパタ
ーン3上へ乗り上げて鎖交する」部コアとなる強磁性体
薄膜5とを設けてし)る。この場合に、絶縁層4の上面
は、導電コイルレノぜターン3(1)有無によって凸凹
を生じる。すると、強磁性体薄膜5を形成する際に1段
差境界6,6.・・・・・。
That is, the thin film head generally has the following characteristics as shown in FIG.
A non-magnetic thin film 2 for forming a magnetic gap is formed on a substrate 1 serving as the lower core, and a conductive coil pattern 3 is wound several times on the thin film 2, and other parts other than the thin film 2 are connected to the substrate 1. A ferromagnetic thin film 5 is provided which is directly bonded to the IT coil pattern 3 and interlinks with the IT coil pattern 3 via the insulating layer 4. In this case, the upper surface of the insulating layer 4 is uneven depending on the presence or absence of the conductive coil renozzle turn 3 (1). Then, when forming the ferromagnetic thin film 5, one step boundaries 6, 6 .・・・・・・.

の段差部5/、5/、・・・・・・で磁束が乱れて、下
部コアに磁束が漏れてしまい、問題であったO 発明が解決しようとする問題点 このように1段差部5’、5’、・・・・・・で磁束〃
;不都合にも乱れるのは、絶縁層4によるフィル上面及
びエツジの段差の解消が著しく困難なことが原因ときれ
ている。しかもこの薄膜ヘッドは、PaMW己録を行わ
せるために、第6図に示したヘッドを数十個、マルチヘ
ッドに構成するので、発熱を考慮する必要があり、1個
分のヘッドの通t t 5Eを極力少くし、その代りに
、導電フィルの巻数を増す傾向にある。したがって、薄
膜へ・ノドけ、導電コイルにおける絶縁層4の段差解消
が極めて重要である。現状では、上述の薄膜ヘッドの段
差解消対策として、第6図に示すように、導電コイルレ
ノぐターン3、絶縁層4を形成する毎に、絶縁層4の側
面に、無機質や有機質の例えばナフトキノンジアジドス
ルホン酸とフェノール性OH基のポ1ツマとのニスチル
とアルカリ可溶性の7ポラ゛ツク樹脂で構成したレジス
ト等の段差解消剤7を塗布してし・るが、製作工程を複
雑にし、し力1も製作歩留力;低く、信頼性も乏しい弱
点があった。
The magnetic flux is disturbed at the stepped portions 5/, 5/, . . . , and the magnetic flux leaks to the lower core, which is a problem. ', 5', ...... magnetic flux
The reason for the inconvenient disturbance is that it is extremely difficult to eliminate the step difference on the top surface and edge of the fill due to the insulating layer 4. Moreover, in order to perform PaMW self-recording, this thin-film head is constructed into a multi-head configuration consisting of several dozen heads shown in Fig. 6, so it is necessary to take heat generation into consideration. There is a tendency to reduce t5E as much as possible and instead increase the number of turns of the conductive fill. Therefore, it is extremely important to eliminate the step difference in the insulating layer 4 in the conductive coil by cutting into the thin film. At present, as a measure to eliminate the step difference in the thin film head described above, as shown in FIG. A step eliminating agent such as a resist made of Nistyl containing sulfonic acid and a phenolic OH group and an alkali-soluble 7-polarity resin is applied, but it complicates the manufacturing process and is expensive. 1 also had the weaknesses of low manufacturing yield and poor reliability.

この発明は、以上の技術的背景を考慮して検討の結果提
唱するもので、導電フ、イルノぜターン形成時に、絶縁
層艮不良段差が生じなし1ようにすることを目的として
し・る。
This invention has been proposed as a result of studies in consideration of the above technical background, and its purpose is to prevent the occurrence of uneven steps due to the formation of an insulating layer during the formation of a conductive film or an insulation layer.

問題点を解決するための手段 この発明は、誘導型薄膜磁気ヘッドの上記目的を達成す
るために1次の手段を採用するものである。
Means for Solving the Problems The present invention employs the first means to achieve the above object of an inductive thin film magnetic head.

すなわち下部コアとなる強磁性体基板上に、磁気ギャッ
プ形成用の非磁性体薄膜を形成する工程。
That is, a step of forming a nonmagnetic thin film for forming a magnetic gap on a ferromagnetic substrate that will become the lower core.

その非磁性体薄膜上に導電フィルパターンを設ける工程
、非磁性体薄膜以外で基板と直接接合し、かつ絶縁層を
介して導電コイルパターン上へ乗り上げて鎖交する」部
コアとなる強磁性体薄膜を形成する工程を備えた磁気ヘ
ッドの製造方法において、導電コイルパターンを設ける
に際して、予め導電膜を全面形成しておき、陽極酸化法
により部分的に酸化し導電コイルパターンを作ることを
特徴とするものである。したがって、この発明は、従来
導電フィル形成時には、予め全面形成した導電膜のコイ
ルに設定しない部分を、化学的又は物理的なユツチング
手段によって除去していた方法と異す、コイルに設定し
ない部分が被酸化部分として残る点に特色がある。
The process of providing a conductive fill pattern on the non-magnetic thin film, a ferromagnetic material that becomes the core of the part that is directly bonded to the substrate other than the non-magnetic thin film, and rides on and interlinks with the conductive coil pattern via an insulating layer. A method for manufacturing a magnetic head that includes a step of forming a thin film is characterized in that when providing a conductive coil pattern, a conductive film is formed on the entire surface in advance and is partially oxidized by an anodic oxidation method to form a conductive coil pattern. It is something to do. Therefore, this invention differs from the conventional method in which when forming a conductive film, the portion of the conductive film previously formed on the entire surface that is not to be set as a coil is removed by chemical or physical coupling means. It is distinctive in that it remains as an oxidized part.

作用 この発明け、上記の手段を採ることにより、導電フィル
パターン形成後に絶縁層を設けるに際して、段差がほぼ
解消されているので、従来必要であった段差解消剤は不
要となる。!!た、コイル形成後の導電膜は、コイル部
分と被酸化部分とはほぼ同じ高さ、つまり導電膜上面が
平坦化石れることになり、絶縁層形成も従来より容易と
なる。
Effect of the Invention By adopting the above-mentioned means, the step difference is almost eliminated when an insulating layer is provided after the conductive fill pattern is formed, so that the step remover, which was conventionally required, is no longer necessary. ! ! In addition, in the conductive film after the coil is formed, the coil portion and the oxidized portion are at approximately the same height, that is, the upper surface of the conductive film is flattened, making it easier to form an insulating layer than before.

実施例 第1図は、この発明の一実施例通りに実行の結果得られ
た誘導型薄膜磁気ヘッドの断面図である。
Embodiment FIG. 1 is a sectional view of an inductive thin film magnetic head obtained as a result of carrying out an embodiment of the present invention.

まず、基板1は従来と同様なMn−Znnフチイト等の
強磁性体で、下部コアとなる。薄膜2は、 5i02や
Al2O3等の絶縁性非磁性体膜で、スパッタリング法
により形成され、磁気ギャップスペーサ兼用の絶縁層と
なる。ざらに、8,8.・・・・・・は、アルミニウム
導電コイルパターン、10,10.・・・・・・は。
First, the substrate 1 is made of a ferromagnetic material such as Mn--Znn phthalate similar to the conventional one, and serves as a lower core. The thin film 2 is an insulating nonmagnetic film such as 5i02 or Al2O3, and is formed by sputtering, and serves as an insulating layer that also serves as a magnetic gap spacer. Zarani, 8,8. . . . is an aluminum conductive coil pattern, 10, 10. ······teeth.

Al2O3の被酸化部である。そして、11は、従来と
同等な絶縁層、12け、バー゛マロイ等の強磁性体薄膜
で、上部コアとなるものである。
This is the oxidized portion of Al2O3. Reference numeral 11 is an insulating layer equivalent to the conventional one, and 12 is a ferromagnetic thin film such as vermalloy, which serves as the upper core.

以上説明した誘導型薄膜磁気ヘッドを製造するには、次
に述べるような諸工程を経ることになる。
To manufacture the inductive thin film magnetic head described above, the following steps are required.

すなわち、まず、第2図に示す通り、基板l上の一端側
に寄せて、薄膜3を一端側で全面に形成し、断面から離
れた位置なので図面には表われないが。
That is, as shown in FIG. 2, first, the thin film 3 is formed on the entire surface of the substrate l toward one end side, although it is not shown in the drawing because it is located away from the cross section.

数箇所スルーホールを設けておく。つぎにそれらのスル
ーホールを含めて、薄膜2上Kkgの導電膜81を形成
する。したがって、導電膜8′は、スルーホールにて基
板1と電気的に導通していることになる。その後、第3
図に示すように、導電フィル8/中のコイルパターン形
成予定部B # 、 Bl、・・・・・・上に、後述す
る@極酸化液f不溶なレジス) 9,9゜・・・・・を
塗布する。それから、第4図に示すように、エチレング
リコールとホウ酸アンモニウムとからなる@極酸化液中
に、第3図に示した基板1の構体を浸漬し、基板1を陽
極とし、陽極酸化液を陰極とし通電し、導電膜81のレ
ジス)9,9.・・・・・・で覆われていない部分10
,10.・・・・・・を陽極酸化する。
Make through holes in several places. Next, a conductive film 81 having a thickness of K kg is formed on the thin film 2 including those through holes. Therefore, the conductive film 8' is electrically connected to the substrate 1 through the through hole. Then the third
As shown in the figure, on the coil pattern formation planned portions B#, Bl, . . . in the conductive film 8/, there is a resist (insoluble in polar oxidation liquid f) described later) 9, 9° . . .・Apply. Then, as shown in FIG. 4, the structure of the substrate 1 shown in FIG. 9,9. Part 10 not covered by...
,10. ...... is anodized.

以上のようにして、AJ303の被酸化部10 、10
 。
As described above, the oxidized parts 10, 10 of AJ303
.

・・・・・・が形成される場合、これらは、体積がやや
膨張するが1元の導電膜8′の上面よりも高さが10%
程上昇・形成される程度である。それから、第5図のよ
うに、レジスト9,9.・・・・・・を剥離・除去して
、導電コイルパターン8,8.・・・・・・及び被酸化
部10,10.・・・・・・上に絶縁層11を形成して
おき、強磁性体薄膜12を形成する。
When .
This is the extent to which it rises and forms. Then, as shown in FIG. 5, resists 9, 9. . . . is peeled off and removed to form conductive coil patterns 8, 8. . . . and the oxidized portions 10, 10. . . . An insulating layer 11 is formed thereon, and a ferromagnetic thin film 12 is formed thereon.

よって、この実施例では、絶縁層11を、はぼ平坦な導
電フイルパよ一ン8,8.・・・・・・及び被酸化部1
0.10.・・・・・・上に形成すればよく、従来の絶
縁層4及び段差解消剤7の形成よりも、作業工数、作業
性がいずれも優れている。
Therefore, in this embodiment, the insulating layer 11 is formed by using substantially flat conductive film lines 8, 8 . ...and oxidized part 1
0.10. . . . can be formed on top of the insulating layer 4 and the step remover 7, and both the number of man-hours and the workability are superior to the conventional formation of the insulating layer 4 and the step remover 7.

尚、以上の実施例では、R/ W用の誘導型薄膜磁気ヘ
ッドについて説明したが、この発明は、その他に再生専
用のMRヘッドと組合せた複合型薄膜磁気ヘッドにも適
用することができる〇発゛明の効果 この発明によれば、従来使用されていた段差解消剤が不
要となり、しかも導電フィルと被酸化部との上面が平坦
化されるので、導電コイルパターン形成作業工数低減、
作業性向上が同時艮達成できる。しかも、この発明では
、導電コイルに設定しない被酸化部をそのまま残し、エ
ツチング除去の必要がないので、エツチング除去不良に
よる製造歩留り低下を招く恐れもなく、極めて信頼性が
向上する〇
In the above embodiments, an inductive thin film magnetic head for R/W has been described, but the present invention can also be applied to a composite thin film magnetic head combined with a read-only MR head. Effects of the invention According to the present invention, the level difference eliminating agent used conventionally is not required, and the upper surfaces of the conductive film and the oxidized portion are flattened, so that the number of man-hours for forming the conductive coil pattern can be reduced.
Improved work efficiency can be achieved at the same time. Moreover, in this invention, the oxidized parts that are not set as conductive coils are left as they are, and there is no need to remove them by etching, so there is no risk of lowering the manufacturing yield due to poor etching removal, and reliability is extremely improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、この発明の一実施例に係る薄膜磁気ヘッドの
断面図、第2図〜・第5図は、その各製造工程における
断面図、第6図は、従来の薄膜磁気ヘッドの断面図であ
る。 l・・・基板、 2・・・非磁性体薄膜、 8@・・導電コイルパターン。 10・・・被醇化部、 11・・・絶縁層、 12・・・強磁性体薄膜。 第2図 第3図
FIG. 1 is a sectional view of a thin film magnetic head according to an embodiment of the present invention, FIGS. 2 to 5 are sectional views of each manufacturing process, and FIG. 6 is a sectional view of a conventional thin film magnetic head. It is a diagram. l... Substrate, 2... Non-magnetic thin film, 8@... Conductive coil pattern. 10... Part to be oxidized, 11... Insulating layer, 12... Ferromagnetic thin film. Figure 2 Figure 3

Claims (1)

【特許請求の範囲】[Claims] 下部コアとなる強磁性体基板上に、磁気ギャップ形成用
の非磁性体薄膜を形成する工程、上記非磁性体薄膜上に
導電コイルパターンを設ける工程、上記非磁性体薄膜以
外で基板と直接接合し、かつ絶縁層を介して導電コイル
パターン上へ乗り上げて鎖交する上部コアとなる強磁性
体薄膜を形成する工程を備えた磁気ヘッドの製造方法に
おいて、上記導電コイルパターンを設けるに際して、予
め導電膜を全面形成しておき、陽極酸化法により部分的
に酸化し導電コイルパターンを作ることを特徴とする薄
膜磁気ヘッドの製造方法。
A process of forming a non-magnetic thin film for forming a magnetic gap on a ferromagnetic substrate that will become the lower core, a process of providing a conductive coil pattern on the non-magnetic thin film, and a process of directly bonding to the substrate other than the above-mentioned non-magnetic thin film. In a method for manufacturing a magnetic head, the method includes the step of forming a ferromagnetic thin film that becomes an upper core and interlinks with the conductive coil pattern by riding on the conductive coil pattern via an insulating layer. A method for manufacturing a thin film magnetic head, characterized in that a film is formed on the entire surface and partially oxidized by an anodic oxidation method to form a conductive coil pattern.
JP18321784A 1984-08-31 1984-08-31 Manufacture of thin film magnetic head Pending JPS6161218A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18321784A JPS6161218A (en) 1984-08-31 1984-08-31 Manufacture of thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18321784A JPS6161218A (en) 1984-08-31 1984-08-31 Manufacture of thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS6161218A true JPS6161218A (en) 1986-03-29

Family

ID=16131830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18321784A Pending JPS6161218A (en) 1984-08-31 1984-08-31 Manufacture of thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS6161218A (en)

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