JPS6158260A - 基板の冷却装置 - Google Patents
基板の冷却装置Info
- Publication number
- JPS6158260A JPS6158260A JP59178433A JP17843384A JPS6158260A JP S6158260 A JPS6158260 A JP S6158260A JP 59178433 A JP59178433 A JP 59178433A JP 17843384 A JP17843384 A JP 17843384A JP S6158260 A JPS6158260 A JP S6158260A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- substrate holder
- heat conductive
- holder
- cover
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59178433A JPS6158260A (ja) | 1984-08-29 | 1984-08-29 | 基板の冷却装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59178433A JPS6158260A (ja) | 1984-08-29 | 1984-08-29 | 基板の冷却装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6158260A true JPS6158260A (ja) | 1986-03-25 |
| JPH0228247B2 JPH0228247B2 (enExample) | 1990-06-22 |
Family
ID=16048424
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59178433A Granted JPS6158260A (ja) | 1984-08-29 | 1984-08-29 | 基板の冷却装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6158260A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62201936U (enExample) * | 1986-06-16 | 1987-12-23 | ||
| US5685363A (en) * | 1994-12-08 | 1997-11-11 | Nissin Electric Co., Ltd. | Substrate holding device and manufacturing method therefor |
-
1984
- 1984-08-29 JP JP59178433A patent/JPS6158260A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62201936U (enExample) * | 1986-06-16 | 1987-12-23 | ||
| US5685363A (en) * | 1994-12-08 | 1997-11-11 | Nissin Electric Co., Ltd. | Substrate holding device and manufacturing method therefor |
| EP0716441A3 (en) * | 1994-12-08 | 1998-02-25 | Nissin Electric Company, Limited | Substrate holding device and manufacturing method therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0228247B2 (enExample) | 1990-06-22 |
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