JPS6156278A - 成膜方法 - Google Patents

成膜方法

Info

Publication number
JPS6156278A
JPS6156278A JP17586784A JP17586784A JPS6156278A JP S6156278 A JPS6156278 A JP S6156278A JP 17586784 A JP17586784 A JP 17586784A JP 17586784 A JP17586784 A JP 17586784A JP S6156278 A JPS6156278 A JP S6156278A
Authority
JP
Japan
Prior art keywords
substrate
plasma
gas
discharge
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17586784A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0530909B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Yasuo Tarui
垂井　康夫
Koichi Kamisako
浩一 上迫
Katsumi Aota
克己 青田
Tatsumi Hiramoto
立躬 平本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Citizen Watch Co Ltd
Original Assignee
Ushio Denki KK
Ushio Inc
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc, Citizen Watch Co Ltd filed Critical Ushio Denki KK
Priority to JP17586784A priority Critical patent/JPS6156278A/ja
Publication of JPS6156278A publication Critical patent/JPS6156278A/ja
Publication of JPH0530909B2 publication Critical patent/JPH0530909B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP17586784A 1984-08-25 1984-08-25 成膜方法 Granted JPS6156278A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17586784A JPS6156278A (ja) 1984-08-25 1984-08-25 成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17586784A JPS6156278A (ja) 1984-08-25 1984-08-25 成膜方法

Publications (2)

Publication Number Publication Date
JPS6156278A true JPS6156278A (ja) 1986-03-20
JPH0530909B2 JPH0530909B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-05-11

Family

ID=16003586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17586784A Granted JPS6156278A (ja) 1984-08-25 1984-08-25 成膜方法

Country Status (1)

Country Link
JP (1) JPS6156278A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03211283A (ja) * 1989-06-15 1991-09-17 Asea Brown Boveri Ag 被覆装置
JP2008121115A (ja) * 2006-11-09 2008-05-29 Applied Materials Inc Ｐｅｃｖｄ放電処理において電磁放射線を制御するためのシステム及び方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03211283A (ja) * 1989-06-15 1991-09-17 Asea Brown Boveri Ag 被覆装置
JP2008121115A (ja) * 2006-11-09 2008-05-29 Applied Materials Inc Ｐｅｃｖｄ放電処理において電磁放射線を制御するためのシステム及び方法

Also Published As

Publication number Publication date
JPH0530909B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-05-11

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