JPS6152973B2 - - Google Patents
Info
- Publication number
- JPS6152973B2 JPS6152973B2 JP8766879A JP8766879A JPS6152973B2 JP S6152973 B2 JPS6152973 B2 JP S6152973B2 JP 8766879 A JP8766879 A JP 8766879A JP 8766879 A JP8766879 A JP 8766879A JP S6152973 B2 JPS6152973 B2 JP S6152973B2
- Authority
- JP
- Japan
- Prior art keywords
- field
- area
- alignment
- marks
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 16
- 238000010894 electron beam technology Methods 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 description 13
- 238000010586 diagram Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8766879A JPS5612730A (en) | 1979-07-11 | 1979-07-11 | Electron beam exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8766879A JPS5612730A (en) | 1979-07-11 | 1979-07-11 | Electron beam exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5612730A JPS5612730A (en) | 1981-02-07 |
JPS6152973B2 true JPS6152973B2 (ko) | 1986-11-15 |
Family
ID=13921315
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8766879A Granted JPS5612730A (en) | 1979-07-11 | 1979-07-11 | Electron beam exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5612730A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0372631U (ko) * | 1989-11-16 | 1991-07-23 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5940008A (ja) * | 1982-08-31 | 1984-03-05 | ダイキン工業株式会社 | 締め付け具 |
JPS63148627A (ja) * | 1986-12-12 | 1988-06-21 | Hitachi Ltd | 電子線描画装置の描画方法 |
-
1979
- 1979-07-11 JP JP8766879A patent/JPS5612730A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0372631U (ko) * | 1989-11-16 | 1991-07-23 |
Also Published As
Publication number | Publication date |
---|---|
JPS5612730A (en) | 1981-02-07 |
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