JPS6152971B2 - - Google Patents

Info

Publication number
JPS6152971B2
JPS6152971B2 JP56062566A JP6256681A JPS6152971B2 JP S6152971 B2 JPS6152971 B2 JP S6152971B2 JP 56062566 A JP56062566 A JP 56062566A JP 6256681 A JP6256681 A JP 6256681A JP S6152971 B2 JPS6152971 B2 JP S6152971B2
Authority
JP
Japan
Prior art keywords
single crystal
crystal
substrate
semiconductor
grown
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56062566A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57178317A (en
Inventor
Yukinobu Shinoda
Nobuo Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56062566A priority Critical patent/JPS57178317A/ja
Publication of JPS57178317A publication Critical patent/JPS57178317A/ja
Publication of JPS6152971B2 publication Critical patent/JPS6152971B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/2921—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/029—Graded interfaces
    • H10P14/24—
    • H10P14/3411—

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Recrystallisation Techniques (AREA)
JP56062566A 1981-04-27 1981-04-27 Manufacture of semiconductor single crystal Granted JPS57178317A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56062566A JPS57178317A (en) 1981-04-27 1981-04-27 Manufacture of semiconductor single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56062566A JPS57178317A (en) 1981-04-27 1981-04-27 Manufacture of semiconductor single crystal

Publications (2)

Publication Number Publication Date
JPS57178317A JPS57178317A (en) 1982-11-02
JPS6152971B2 true JPS6152971B2 (OSRAM) 1986-11-15

Family

ID=13203961

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56062566A Granted JPS57178317A (en) 1981-04-27 1981-04-27 Manufacture of semiconductor single crystal

Country Status (1)

Country Link
JP (1) JPS57178317A (OSRAM)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59104119A (ja) * 1982-12-07 1984-06-15 Fujitsu Ltd 半導体装置の製造方法
JP2695778B2 (ja) * 1987-03-18 1998-01-14 株式会社東芝 薄膜形成方法

Also Published As

Publication number Publication date
JPS57178317A (en) 1982-11-02

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