JPS6152568B2 - - Google Patents
Info
- Publication number
- JPS6152568B2 JPS6152568B2 JP2123377A JP2123377A JPS6152568B2 JP S6152568 B2 JPS6152568 B2 JP S6152568B2 JP 2123377 A JP2123377 A JP 2123377A JP 2123377 A JP2123377 A JP 2123377A JP S6152568 B2 JPS6152568 B2 JP S6152568B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- etching
- resist
- thickness
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 48
- 238000000992 sputter etching Methods 0.000 claims description 21
- 238000003486 chemical etching Methods 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 7
- 238000001020 plasma etching Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 description 20
- 239000010408 film Substances 0.000 description 10
- 239000010931 gold Substances 0.000 description 8
- 229910052737 gold Inorganic materials 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- WROUWQQRXUBECT-UHFFFAOYSA-N 2-ethylacrylic acid Chemical compound CCC(=C)C(O)=O WROUWQQRXUBECT-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002343 gold Chemical class 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2123377A JPS53105982A (en) | 1977-02-28 | 1977-02-28 | Micropattern formation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2123377A JPS53105982A (en) | 1977-02-28 | 1977-02-28 | Micropattern formation method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53105982A JPS53105982A (en) | 1978-09-14 |
| JPS6152568B2 true JPS6152568B2 (enrdf_load_stackoverflow) | 1986-11-13 |
Family
ID=12049304
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2123377A Granted JPS53105982A (en) | 1977-02-28 | 1977-02-28 | Micropattern formation method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS53105982A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60140725A (ja) * | 1983-12-28 | 1985-07-25 | Fujitsu Ltd | パタ−ン形成方法 |
| JPH0695503B2 (ja) * | 1983-12-26 | 1994-11-24 | 富士通株式会社 | パターン形成方法およびその実施に使用する装置 |
| JP5836846B2 (ja) * | 2011-03-11 | 2015-12-24 | 株式会社半導体エネルギー研究所 | 液晶表示装置の作製方法 |
-
1977
- 1977-02-28 JP JP2123377A patent/JPS53105982A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS53105982A (en) | 1978-09-14 |
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