JPS6148581B2 - - Google Patents
Info
- Publication number
- JPS6148581B2 JPS6148581B2 JP21981082A JP21981082A JPS6148581B2 JP S6148581 B2 JPS6148581 B2 JP S6148581B2 JP 21981082 A JP21981082 A JP 21981082A JP 21981082 A JP21981082 A JP 21981082A JP S6148581 B2 JPS6148581 B2 JP S6148581B2
- Authority
- JP
- Japan
- Prior art keywords
- boron
- layer
- substrate
- structural material
- coating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 52
- 229910052796 boron Inorganic materials 0.000 claims description 52
- 239000010410 layer Substances 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 26
- 229910052804 chromium Inorganic materials 0.000 claims description 22
- 239000011651 chromium Substances 0.000 claims description 22
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 21
- 239000011247 coating layer Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- 238000005229 chemical vapour deposition Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 10
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000010955 niobium Substances 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 238000001556 precipitation Methods 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 4
- 230000000873 masking effect Effects 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000001052 transient effect Effects 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- 229910001069 Ti alloy Inorganic materials 0.000 description 2
- 239000012814 acoustic material Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000007665 sagging Methods 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- -1 HCl Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 1
- 150000001638 boron Chemical class 0.000 description 1
- 229910010277 boron hydride Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21981082A JPS59110774A (ja) | 1982-12-14 | 1982-12-14 | 硼素構造材の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21981082A JPS59110774A (ja) | 1982-12-14 | 1982-12-14 | 硼素構造材の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59110774A JPS59110774A (ja) | 1984-06-26 |
| JPS6148581B2 true JPS6148581B2 (enrdf_load_stackoverflow) | 1986-10-24 |
Family
ID=16741385
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21981082A Granted JPS59110774A (ja) | 1982-12-14 | 1982-12-14 | 硼素構造材の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59110774A (enrdf_load_stackoverflow) |
-
1982
- 1982-12-14 JP JP21981082A patent/JPS59110774A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59110774A (ja) | 1984-06-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5391422A (en) | Diamond- or Diamond-like carbon-coated hard materials | |
| JP3590579B2 (ja) | ダイヤモンド被覆部材およびその製造方法 | |
| JPH0566358B2 (enrdf_load_stackoverflow) | ||
| KR910005238B1 (ko) | 경질의 미세립 비주상 텅스텐/탄소합금을 기질에 증착하는 방법 및 그 방법으로 제조된 제품 | |
| US5175929A (en) | Method for producing articles by chemical vapor deposition | |
| EP0416824A2 (en) | Ceramics coated cemented carbide tool with high fracture resistance | |
| EP0779940B1 (en) | Method for the deposition of a diamond film on an electroless-plated nickel layer | |
| JPS6148581B2 (enrdf_load_stackoverflow) | ||
| US5262202A (en) | Heat treated chemically vapor deposited products and treatment method | |
| AU601895B2 (en) | Heat treated chemically vapor deposited products and treatment method | |
| US4279691A (en) | Method of making boron cantilever | |
| US4382454A (en) | Boron cantilever pipe | |
| JPS6133703B2 (enrdf_load_stackoverflow) | ||
| JPH04507394A (ja) | Ｃｖｄにより成長した転移金属のカーバイドと窒化物のホイスカー | |
| JPH01165755A (ja) | 高温に敏感な製品を硬質層で被覆する方法および被覆製品 | |
| JPS6141846B2 (enrdf_load_stackoverflow) | ||
| JPS6149248B2 (enrdf_load_stackoverflow) | ||
| JPS6148580B2 (enrdf_load_stackoverflow) | ||
| JPS6012969B2 (ja) | 硼素構造材の製造方法 | |
| JPS6026828B2 (ja) | 硼素構造材の製造方法 | |
| JPS635328B2 (enrdf_load_stackoverflow) | ||
| JPS635327B2 (enrdf_load_stackoverflow) | ||
| JPS6141844B2 (enrdf_load_stackoverflow) | ||
| JPS6149247B2 (enrdf_load_stackoverflow) | ||
| JPS6054885B2 (ja) | 硼素構造材の製造方法 |