JPS6145908A - Observation instrument - Google Patents

Abstract

PURPOSE:To reduce fatigue and to improve operability of an observer by enabling displaying coordinates of an observation image being observed at present within the scope of a visual field of a microscope or at a part of a screen of a TV device. CONSTITUTION:A photomask 1 having a mask pattern 1a is fixed on an XY table 2 and displayed by enlarging as the observation image within the scope of the visual field by the microscope 3 incorporated with a light source 4, a condenser lens 5, an objective lens 6, half mirrors 7, 8, a prism 9 and an ocular lens 10 in a lens-barrel 11. Further, a length measuring machine 12 utilizing laser light or the like is arranged at one end of the table 2 and a detected XY coordinates signal is inputted to a control circuit 13 to make a digital numerical display on a coordinates display 14. Further, a numerical image displayed on the display 14 is synthesized in the observation image of a pattern image by a coordinates optical system 19 consisting of a light source 15, lenses 16, 17, a half mirror 18, etc.

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a pattern observation device, and more particularly to a device capable of simultaneously observing a pattern of an object to be observed and its coordinate position.

[Background technology]

For example, in the manufacturing technology of semiconductor devices such as ICs and LSIs, it is necessary to inspect patterns such as patterned photomasks and semiconductor wafers, and it is also necessary to inspect parts of the patterns, especially those where defects are thought to have occurred. must be visually observed. For such observation, a microscope or a TV device is used to enlarge the pattern at the relevant location so that it can be displayed within the field of view of the microscope or on the TV screen.

By the way, in the case of this type of observation, the approximate position of the part to be observed may be known in advance, and in this case, the approximate position is determined using the coordinate display of the XY table on which the photomask or wafer is placed. A method is adopted in which the desired pattern is found in the field of view or on the screen while searching. however,
In conventional observation devices of this type, the observation system such as a microscope or TV device and the coordinate display system are each provided independently, so the observer visually views the observation system and the coordinate display system alternately. While doing so, the position of the pattern and shape must be visually confirmed. For this reason, work efficiency is poor and workers (
This poses a problem in that the observer (observer) is greatly fatigued and the manufacturing efficiency of the entire semiconductor device is reduced.

An example of a detailed description of the observation device technology is given in Kogyo Kenkyukai, Electronic Materials, November 1982 Special Issue, November 15, 1982, p. 243-p. 247.

[Purpose of the invention]

SUMMARY OF THE INVENTION An object of the present invention is to provide an observation device that facilitates pattern observation, reduces observer fatigue and improves workability, and thereby improves the manufacturing efficiency of semiconductor devices as a whole. It is in.

The above and other objects and novel features of the present invention include:
It will become clear from the description of this specification and the accompanying drawings.

[Summary of the invention]

A brief overview of typical inventions disclosed in this application is as follows.

That is, by displaying the coordinates of the observed image on a part of the field of view of the microscope or the display surface of the TV device,
The observer can simultaneously check the coordinates of the current observed image while observing the observed image in the field of view or on the display surface, making observation work easier and reducing fatigue.9 Improved work efficiency. can.

[Example 1] Figures 1 and 2 show the application of the present invention to a microscope.

An example is shown below. A photomask 1 as an object to be observed is mounted and fixed at a predetermined position on an XY table 2, and a mask pattern 1a formed on the surface of the photomask 1 with a Cr film or the like is magnified and visually observed using a microscope 3. This microscope 3 is a so-called optical microscope, and has a light source 4. Condenser lens5. An objective lens 6, half mirrors 7 and 8, a prism 9, and an eyepiece 10 are housed in a lens barrel 11, and a part of the pattern of the photomask 1 is enlarged and displayed as an observation image within the visual field as shown in FIG. On the other hand, a length measuring device 12 using a laser beam or the like is disposed on one side of the XY table 2 to detect the XY coordinates of the XY table 2. This detection signal is input to the control circuit 13, and the control circuit 13 allows the coordinate display 14 to display each of the X and Y coordinates in digital numerical values. This coordinate display 14 includes a light source]5° lens 16.17. A coordinate optical system 19 consisting of a half mirror 18 and the like is attached, and the numerical image displayed on the coordinate display 14 is synthesized into the observed image of the pattern image 1a via the half mirror 7 in the microscope 3.

In this example, a coordinate numerical image 20 is displayed at the bottom of the visual field as shown in FIG.

Therefore, according to this microscope, if an observer moves the XY table 2 before observing the pattern of the photomask 1 using the microscope, the length measuring device 1
2. The control circuit 13 sequentially displays the coordinates of the XY table (represented by the amount of displacement with respect to the base yarn position) on the display 14, and this displayed numerical value is displayed within the field of view of the microscope 3 by the coordinate optical system 19, so that the observer The pattern can be visually observed and the X and Y coordinates of the field of view can be visually confirmed at the same time.

Therefore, when observing a pattern whose approximate position is known in advance, the XY table 2 can be moved without visually checking the field of view of the microscope 3.
It is not necessary to look at the coordinate display 14 alternately. Therefore, it is possible to facilitate and speed up the work, improve work efficiency, and reduce observer fatigue.

[Embodiment 2] FIGS. 3 and 4 show an example in which the present invention is applied to a TV device 33. In the figure, ■ is a photomask placed on the XY table 2, and the pattern formed on the top surface is imaged by an ITV camera 30 etc.
After that, the pattern image 1a is displayed on the display surface of the display 32 as shown in FIG. Further, a laser length measuring device 12 is disposed on one side of the XY table 2 to detect the coordinates of the XY table 2. The detected coordinate signals are input in the form of electrical signals to the TV circuit 31, where they are processed into image signals and displayed on the display 32 as X and Y coordinate values 20.

Therefore, in this embodiment as well, the coordinates of the pattern can be confirmed by visually checking the coordinate values 20 while observing the pattern on the display screen of the TV device 33, so that it is possible to improve work efficiency and reduce fatigue. .

In this example, a numerical display may be provided on the front surface of the display 32 (similar to the display 14 in the previous example), and the X and Y coordinates may be displayed there. .

〔effect〕

(1) It is configured so that the coordinates can be displayed together with the image of the object to be observed on the field of view or display surface of the microscope or TV device, so the coordinates can be visually recognized at the same time as the observed image. This makes it possible to observe the required coordinates of the object to be observed and its observed image just by looking at the field of view or display screen, and there is no need to alternately look at the observed image and coordinates as in the past, improving work efficiency. and fatigue can be reduced.

(2) Since the coordinate numerical image of the coordinate display device is optically synthesized within the optical system of the observation image of the microscope, it can be configured by only partially changing the optical system of the existing microscope, making the device inexpensive. Can be configured.

(Since the observation image is displayed on the display screen of the 31 TV device, and the seat rod numerical value is also displayed on or near this display screen, it is possible to partially change the electric circuit or add an indicator to the display.) It can be configured with modifications and is extremely easy to configure.

Although the invention made by the present inventor has been specifically explained above based on examples, it is to be understood that the present invention is not limited to the above-mentioned examples, and can be modified in various ways without departing from the gist of the invention. Not even. For example, numerical values indicating the magnification and dimensions of the observed image may be displayed on the field of view or on the display surface, and furthermore, a target indicating the position of the coordinates to be displayed may be displayed. Further, the present invention can be similarly constructed in a structure in which a microscope and a TV device are integrated, or in an electron microscope@.

[Application field]

In the above explanation, the invention made by the present inventor is mainly applied to an apparatus for observing photomask patterns used in the manufacture of semiconductor devices, which is the background field of application, but the present invention is not limited to this. It can be applied not only to the observation of a single wafer pattern, but also to the observation of various patterns and shapes.

[Brief explanation of the drawing]

Fig. 1 is an overall block diagram of an embodiment in which the present invention is applied to a microscope, Fig. 2 is a field view thereof, Fig. 3 is an overall block diagram of an embodiment in which the present invention is applied to a TV device, and Fig. 4 is its view. It is a figure of a display surface. 1... Photomask (object to be observed), 1a... Pattern, 1a... Hattern image, 2... XY table, 3
... Microscope, 12 ... Length measuring device, ]4 ... Coordinate display device, 19 Coordinate optical system, 20 ... Coordinate numerical image, 3
o...ITV camera, 31...TV circuit, 32...
display. Figure 1 Figure 2 Figure 3 Figure 4

Claims (1)

[Scope of Claims] 1. An observation device such as a microscope or a TV device that magnifies and visually confirms an object to be observed, wherein the currently observed object is displayed within the field of view of the microscope or in a part of the display surface of the TV device. An observation device characterized in that it is configured to display the coordinates of an observed image. 2. An observation device according to claim 1, which is configured to optically or electrically add a coordinate signal of an XY table on which an object to be observed is placed to an observation system signal of a microscope or a TV device. 3. An observation device according to claim 2, wherein an optical image of a display displaying coordinates of an XY table is optically synthesized with an observation image of a microscope. 4. The observation device according to claim 2, wherein the coordinates of the XY table are taken into the TV device as electrical signals, and the coordinate signals are displayed as visible numbers or patterns on the TV screen together with the observation image.