JPS6142241B2 - - Google Patents

Info

Publication number
JPS6142241B2
JPS6142241B2 JP56013482A JP1348281A JPS6142241B2 JP S6142241 B2 JPS6142241 B2 JP S6142241B2 JP 56013482 A JP56013482 A JP 56013482A JP 1348281 A JP1348281 A JP 1348281A JP S6142241 B2 JPS6142241 B2 JP S6142241B2
Authority
JP
Japan
Prior art keywords
liquid
substrate
monomer
refractive index
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56013482A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57128301A (en
Inventor
Takashi Kurokawa
Shigeru Oikawa
Shigeo Nara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56013482A priority Critical patent/JPS57128301A/ja
Publication of JPS57128301A publication Critical patent/JPS57128301A/ja
Publication of JPS6142241B2 publication Critical patent/JPS6142241B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
JP56013482A 1981-01-31 1981-01-31 Manufacture for light conducting array Granted JPS57128301A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56013482A JPS57128301A (en) 1981-01-31 1981-01-31 Manufacture for light conducting array

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56013482A JPS57128301A (en) 1981-01-31 1981-01-31 Manufacture for light conducting array

Publications (2)

Publication Number Publication Date
JPS57128301A JPS57128301A (en) 1982-08-09
JPS6142241B2 true JPS6142241B2 (OSRAM) 1986-09-19

Family

ID=11834331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56013482A Granted JPS57128301A (en) 1981-01-31 1981-01-31 Manufacture for light conducting array

Country Status (1)

Country Link
JP (1) JPS57128301A (OSRAM)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2820682B2 (ja) * 1986-07-08 1998-11-05 ルーミナイト インターナショナル コーポレイション プラスチック光伝送体
US5462700A (en) * 1993-11-08 1995-10-31 Alliedsignal Inc. Process for making an array of tapered photopolymerized waveguides
JP3444352B2 (ja) * 1999-03-29 2003-09-08 株式会社豊田中央研究所 光伝送路の製造方法
US6703188B1 (en) 1999-03-29 2004-03-09 Kabushiki Kaisha Toyota Chuo Kenkyusho Method of fabricating optical waveguide structure
JP2002048924A (ja) * 2000-08-02 2002-02-15 Ricoh Co Ltd 画像拡大縮小用光学デバイス、その作製方法、画像拡大表示装置及び画像縮小読取装置
JP4169238B2 (ja) * 2000-06-30 2008-10-22 株式会社リコー 二次元拡大縮小光学デバイスおよびその製造方法
JP2002328247A (ja) * 2001-05-01 2002-11-15 Ibiden Co Ltd 光導波路の形成方法
JP4480307B2 (ja) * 2001-09-21 2010-06-16 イビデン株式会社 光導波路および光導波路の形成方法
JP4142568B2 (ja) * 2003-12-19 2008-09-03 インターナショナル・ビジネス・マシーンズ・コーポレーション 光学素子および該光学素子を用いるカラー表示装置

Also Published As

Publication number Publication date
JPS57128301A (en) 1982-08-09

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