JPS6141678B2 - - Google Patents

Info

Publication number
JPS6141678B2
JPS6141678B2 JP54057116A JP5711679A JPS6141678B2 JP S6141678 B2 JPS6141678 B2 JP S6141678B2 JP 54057116 A JP54057116 A JP 54057116A JP 5711679 A JP5711679 A JP 5711679A JP S6141678 B2 JPS6141678 B2 JP S6141678B2
Authority
JP
Japan
Prior art keywords
slit
pattern
projection lens
movable
laser processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54057116A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55149788A (en
Inventor
Takeoki Myauchi
Mikio Ppongo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5711679A priority Critical patent/JPS55149788A/ja
Publication of JPS55149788A publication Critical patent/JPS55149788A/ja
Publication of JPS6141678B2 publication Critical patent/JPS6141678B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Laser Beam Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP5711679A 1979-05-11 1979-05-11 Laser working apparatus of pattern projection system Granted JPS55149788A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5711679A JPS55149788A (en) 1979-05-11 1979-05-11 Laser working apparatus of pattern projection system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5711679A JPS55149788A (en) 1979-05-11 1979-05-11 Laser working apparatus of pattern projection system

Publications (2)

Publication Number Publication Date
JPS55149788A JPS55149788A (en) 1980-11-21
JPS6141678B2 true JPS6141678B2 (enrdf_load_stackoverflow) 1986-09-17

Family

ID=13046559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5711679A Granted JPS55149788A (en) 1979-05-11 1979-05-11 Laser working apparatus of pattern projection system

Country Status (1)

Country Link
JP (1) JPS55149788A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04258394A (ja) * 1991-02-05 1992-09-14 Fanuc Ltd レーザ加工機の加工ヘッド
WO2007086132A1 (ja) * 2006-01-27 2007-08-02 Hoya Candeo Optronics Corporation 可変スリット装置およびレーザー加工装置
KR100766300B1 (ko) 2006-07-12 2007-10-12 (주)미래컴퍼니 레이저 가공슬릿 및 가공장치

Also Published As

Publication number Publication date
JPS55149788A (en) 1980-11-21

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