JPS6138829B2 - - Google Patents
Info
- Publication number
- JPS6138829B2 JPS6138829B2 JP55138469A JP13846980A JPS6138829B2 JP S6138829 B2 JPS6138829 B2 JP S6138829B2 JP 55138469 A JP55138469 A JP 55138469A JP 13846980 A JP13846980 A JP 13846980A JP S6138829 B2 JPS6138829 B2 JP S6138829B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- measuring
- electron
- current
- insulating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/29—Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electron Beam Exposure (AREA)
- Measurement Of Radiation (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55138469A JPS5763463A (en) | 1980-10-03 | 1980-10-03 | Wafer for measuring diameter of electron beam and beam current |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55138469A JPS5763463A (en) | 1980-10-03 | 1980-10-03 | Wafer for measuring diameter of electron beam and beam current |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5763463A JPS5763463A (en) | 1982-04-16 |
| JPS6138829B2 true JPS6138829B2 (enrdf_load_stackoverflow) | 1986-09-01 |
Family
ID=15222769
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55138469A Granted JPS5763463A (en) | 1980-10-03 | 1980-10-03 | Wafer for measuring diameter of electron beam and beam current |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5763463A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW464947B (en) | 1999-11-29 | 2001-11-21 | Ushio Electric Inc | Measuring apparatus of electron beam quantity and processing apparatus of electron beam irradiation |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5130762A (ja) * | 1974-09-09 | 1976-03-16 | Nippon Telegraph & Telephone | Denshibiimurokoniokeru biimukeisokuteihoho |
| JPS5819041B2 (ja) * | 1976-08-11 | 1983-04-15 | 富士通株式会社 | 電子ビ−ム径の測定方法 |
-
1980
- 1980-10-03 JP JP55138469A patent/JPS5763463A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5763463A (en) | 1982-04-16 |
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