JPS5763463A - Wafer for measuring diameter of electron beam and beam current - Google Patents

Wafer for measuring diameter of electron beam and beam current

Info

Publication number
JPS5763463A
JPS5763463A JP55138469A JP13846980A JPS5763463A JP S5763463 A JPS5763463 A JP S5763463A JP 55138469 A JP55138469 A JP 55138469A JP 13846980 A JP13846980 A JP 13846980A JP S5763463 A JPS5763463 A JP S5763463A
Authority
JP
Japan
Prior art keywords
semiconductor layer
wafer
type semiconductor
layer
detecting area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55138469A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6138829B2 (enrdf_load_stackoverflow
Inventor
Bunro Komatsu
Yasuo Matsuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP55138469A priority Critical patent/JPS5763463A/ja
Publication of JPS5763463A publication Critical patent/JPS5763463A/ja
Publication of JPS6138829B2 publication Critical patent/JPS6138829B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/29—Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Measurement Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
JP55138469A 1980-10-03 1980-10-03 Wafer for measuring diameter of electron beam and beam current Granted JPS5763463A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55138469A JPS5763463A (en) 1980-10-03 1980-10-03 Wafer for measuring diameter of electron beam and beam current

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55138469A JPS5763463A (en) 1980-10-03 1980-10-03 Wafer for measuring diameter of electron beam and beam current

Publications (2)

Publication Number Publication Date
JPS5763463A true JPS5763463A (en) 1982-04-16
JPS6138829B2 JPS6138829B2 (enrdf_load_stackoverflow) 1986-09-01

Family

ID=15222769

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55138469A Granted JPS5763463A (en) 1980-10-03 1980-10-03 Wafer for measuring diameter of electron beam and beam current

Country Status (1)

Country Link
JP (1) JPS5763463A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1104002A1 (en) * 1999-11-29 2001-05-30 Ushiodenki Kabushiki Kaisha Electron beam measurement method and electron beam irradiation processing device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5130762A (ja) * 1974-09-09 1976-03-16 Nippon Telegraph & Telephone Denshibiimurokoniokeru biimukeisokuteihoho
JPS5321952A (en) * 1976-08-11 1978-02-28 Fujitsu Ltd Measurement of electron beam diameter

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5130762A (ja) * 1974-09-09 1976-03-16 Nippon Telegraph & Telephone Denshibiimurokoniokeru biimukeisokuteihoho
JPS5321952A (en) * 1976-08-11 1978-02-28 Fujitsu Ltd Measurement of electron beam diameter

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1104002A1 (en) * 1999-11-29 2001-05-30 Ushiodenki Kabushiki Kaisha Electron beam measurement method and electron beam irradiation processing device
US6657212B2 (en) 1999-11-29 2003-12-02 Ushiodenki Kabushiki Kaisha Electron beam measurement method and electron beam irradiation processing device

Also Published As

Publication number Publication date
JPS6138829B2 (enrdf_load_stackoverflow) 1986-09-01

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