JPS6138608B2 - - Google Patents

Info

Publication number
JPS6138608B2
JPS6138608B2 JP52094686A JP9468677A JPS6138608B2 JP S6138608 B2 JPS6138608 B2 JP S6138608B2 JP 52094686 A JP52094686 A JP 52094686A JP 9468677 A JP9468677 A JP 9468677A JP S6138608 B2 JPS6138608 B2 JP S6138608B2
Authority
JP
Japan
Prior art keywords
plasma
wafer
wafer holding
holding plate
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52094686A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5429572A (en
Inventor
Daijiro Kudo
Akira Abiru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9468677A priority Critical patent/JPS5429572A/ja
Publication of JPS5429572A publication Critical patent/JPS5429572A/ja
Publication of JPS6138608B2 publication Critical patent/JPS6138608B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP9468677A 1977-08-09 1977-08-09 Plasma unit Granted JPS5429572A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9468677A JPS5429572A (en) 1977-08-09 1977-08-09 Plasma unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9468677A JPS5429572A (en) 1977-08-09 1977-08-09 Plasma unit

Publications (2)

Publication Number Publication Date
JPS5429572A JPS5429572A (en) 1979-03-05
JPS6138608B2 true JPS6138608B2 (enrdf_load_stackoverflow) 1986-08-30

Family

ID=14117074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9468677A Granted JPS5429572A (en) 1977-08-09 1977-08-09 Plasma unit

Country Status (1)

Country Link
JP (1) JPS5429572A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5687323A (en) * 1979-12-19 1981-07-15 Pioneer Electronic Corp Substrate supporting device of plasma reaction tube
JPS63143808A (ja) * 1986-12-08 1988-06-16 Mitsui Toatsu Chem Inc 薄膜形成装置
JPS63143807A (ja) * 1986-12-08 1988-06-16 Mitsui Toatsu Chem Inc 成膜装置
JPS63143809A (ja) * 1986-12-08 1988-06-16 Mitsui Toatsu Chem Inc 薄膜形成用装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS511732U (enrdf_load_stackoverflow) * 1974-06-19 1976-01-08
JPS5216482A (en) * 1975-07-30 1977-02-07 Toshiba Corp Surface treatment apparatus using activated gas

Also Published As

Publication number Publication date
JPS5429572A (en) 1979-03-05

Similar Documents

Publication Publication Date Title
US4452828A (en) Production of amorphous silicon film
JPS6138608B2 (enrdf_load_stackoverflow)
JPH05226258A (ja) プラズマ発生装置
JPH03501138A (ja) プラズマで高めた化学蒸着ウエーハ保持固定具
JPS63190173A (ja) プラズマ処理方法
JP2002531695A (ja) 薄膜製造装置
JPH0573051B2 (enrdf_load_stackoverflow)
JPH0338730B2 (enrdf_load_stackoverflow)
JPS6358920A (ja) プラズマ電極
JPS639744B2 (enrdf_load_stackoverflow)
JP2793821B2 (ja) プラズマ処理装置
JP2547035B2 (ja) プラズマ処理装置
JPS6337614A (ja) プラズマ電極
JP3273978B2 (ja) 両面同時エッチング装置
JPS5843508A (ja) 量産型成膜装置
JPH03255626A (ja) 半導体製造装置
JPH0513004Y2 (enrdf_load_stackoverflow)
JP4580503B2 (ja) フィルム状基板のプラズマエッチング装置
JPH0556853B2 (enrdf_load_stackoverflow)
JPS63207134A (ja) プラズマ処理装置
JPH03214723A (ja) プラズマcvd装置
JPS61259526A (ja) ドライエツチング装置
JPS6366910B2 (enrdf_load_stackoverflow)
JPS6014101B2 (ja) スパッタリング処理方法及び処理装置
JP4676097B2 (ja) 吸着装置