JPS5429572A - Plasma unit - Google Patents
Plasma unitInfo
- Publication number
- JPS5429572A JPS5429572A JP9468677A JP9468677A JPS5429572A JP S5429572 A JPS5429572 A JP S5429572A JP 9468677 A JP9468677 A JP 9468677A JP 9468677 A JP9468677 A JP 9468677A JP S5429572 A JPS5429572 A JP S5429572A
- Authority
- JP
- Japan
- Prior art keywords
- plasma unit
- bridging
- perforated
- keeping
- potential
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Drying Of Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
Abstract
PURPOSE: To perform excellent plasma etching without sputtering effect, by providing a pair of perforated or meshed electrode plates parallelly through bridging the wafer holding plate and by keeping this as the same polarity and potential.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9468677A JPS5429572A (en) | 1977-08-09 | 1977-08-09 | Plasma unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9468677A JPS5429572A (en) | 1977-08-09 | 1977-08-09 | Plasma unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5429572A true JPS5429572A (en) | 1979-03-05 |
JPS6138608B2 JPS6138608B2 (en) | 1986-08-30 |
Family
ID=14117074
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9468677A Granted JPS5429572A (en) | 1977-08-09 | 1977-08-09 | Plasma unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5429572A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5687323A (en) * | 1979-12-19 | 1981-07-15 | Pioneer Electronic Corp | Substrate supporting device of plasma reaction tube |
JPS63143809A (en) * | 1986-12-08 | 1988-06-16 | Mitsui Toatsu Chem Inc | Equipment for forming thin film |
JPS63143807A (en) * | 1986-12-08 | 1988-06-16 | Mitsui Toatsu Chem Inc | Film forming equipment |
JPS63143808A (en) * | 1986-12-08 | 1988-06-16 | Mitsui Toatsu Chem Inc | Thin film forming equipment |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS511732U (en) * | 1974-06-19 | 1976-01-08 | ||
JPS5216482A (en) * | 1975-07-30 | 1977-02-07 | Toshiba Corp | Surface treatment apparatus using activated gas |
-
1977
- 1977-08-09 JP JP9468677A patent/JPS5429572A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS511732U (en) * | 1974-06-19 | 1976-01-08 | ||
JPS5216482A (en) * | 1975-07-30 | 1977-02-07 | Toshiba Corp | Surface treatment apparatus using activated gas |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5687323A (en) * | 1979-12-19 | 1981-07-15 | Pioneer Electronic Corp | Substrate supporting device of plasma reaction tube |
JPS63143809A (en) * | 1986-12-08 | 1988-06-16 | Mitsui Toatsu Chem Inc | Equipment for forming thin film |
JPS63143807A (en) * | 1986-12-08 | 1988-06-16 | Mitsui Toatsu Chem Inc | Film forming equipment |
JPS63143808A (en) * | 1986-12-08 | 1988-06-16 | Mitsui Toatsu Chem Inc | Thin film forming equipment |
Also Published As
Publication number | Publication date |
---|---|
JPS6138608B2 (en) | 1986-08-30 |
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