JPS53112669A - Plasma etching unit - Google Patents

Plasma etching unit

Info

Publication number
JPS53112669A
JPS53112669A JP2696877A JP2696877A JPS53112669A JP S53112669 A JPS53112669 A JP S53112669A JP 2696877 A JP2696877 A JP 2696877A JP 2696877 A JP2696877 A JP 2696877A JP S53112669 A JPS53112669 A JP S53112669A
Authority
JP
Japan
Prior art keywords
electrode
plasma etching
etching unit
concentricly
accommodation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2696877A
Other languages
Japanese (ja)
Other versions
JPS6058578B2 (en
Inventor
Toshiro Ichikawa
Shuzo Oshio
Yoshihiko Kitahara
Junichi Kai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2696877A priority Critical patent/JPS6058578B2/en
Publication of JPS53112669A publication Critical patent/JPS53112669A/en
Publication of JPS6058578B2 publication Critical patent/JPS6058578B2/en
Expired legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To increase the capability of accommodation, by constituting the sputtering electrode through arrangement concentricly of the polygonal electrode having parallel surfaces to the opposing direction to the electrode in the plasma space taken place with the electrode.
COPYRIGHT: (C)1978,JPO&Japio
JP2696877A 1977-03-14 1977-03-14 plasma etching equipment Expired JPS6058578B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2696877A JPS6058578B2 (en) 1977-03-14 1977-03-14 plasma etching equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2696877A JPS6058578B2 (en) 1977-03-14 1977-03-14 plasma etching equipment

Publications (2)

Publication Number Publication Date
JPS53112669A true JPS53112669A (en) 1978-10-02
JPS6058578B2 JPS6058578B2 (en) 1985-12-20

Family

ID=12207945

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2696877A Expired JPS6058578B2 (en) 1977-03-14 1977-03-14 plasma etching equipment

Country Status (1)

Country Link
JP (1) JPS6058578B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04102320A (en) * 1990-08-22 1992-04-03 Fujitsu Ltd Manufacture of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04102320A (en) * 1990-08-22 1992-04-03 Fujitsu Ltd Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS6058578B2 (en) 1985-12-20

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